IPC분류정보
국가/구분 |
United States(US) Patent
등록
|
국제특허분류(IPC7판) |
|
출원번호 |
US-0187892
(2002-07-03)
|
우선권정보 |
JP-0203777 (2001-07-04); JP-0357600 (2001-11-22) |
발명자
/ 주소 |
- Miyake, Yasushi
- Kataoka, Naoki
- Ikeda, Masataka
|
출원인 / 주소 |
- Asahi Kasei Kabushiki Kaisha
|
대리인 / 주소 |
Finnegan, Henderson, Farabow, Garrett & Dunner, L.L.P.
|
인용정보 |
피인용 횟수 :
3 인용 특허 :
5 |
초록
▼
The present invention provides a warp knitted fabric containing a latent crimp fiber but no elastic fiber, and showing a stretchability of 60% or more in both the warp and weft directions, and a residual strain at 60% elongation recovery of 15% or less in both the warp and weft directions. The warp
The present invention provides a warp knitted fabric containing a latent crimp fiber but no elastic fiber, and showing a stretchability of 60% or more in both the warp and weft directions, and a residual strain at 60% elongation recovery of 15% or less in both the warp and weft directions. The warp knitted fabric of the present invention shows little lowering of the stretchable functions during dyeing at high temperature, repeated washing, repeated stretching, or the like treatment, and is excellent in elongation recovery due to the high stretchability, surface smoothness and shape retention.
대표청구항
▼
The present invention provides a warp knitted fabric containing a latent crimp fiber but no elastic fiber, and showing a stretchability of 60% or more in both the warp and weft directions, and a residual strain at 60% elongation recovery of 15% or less in both the warp and weft directions. The warp
The present invention provides a warp knitted fabric containing a latent crimp fiber but no elastic fiber, and showing a stretchability of 60% or more in both the warp and weft directions, and a residual strain at 60% elongation recovery of 15% or less in both the warp and weft directions. The warp knitted fabric of the present invention shows little lowering of the stretchable functions during dyeing at high temperature, repeated washing, repeated stretching, or the like treatment, and is excellent in elongation recovery due to the high stretchability, surface smoothness and shape retention. 00, Harrington et al.; US-4867918, 19890900, Kiyonaga et al.; US-4885084, 19891200, Doyle; US-4906359, 19900300, Cox, Jr.; US-4911838, 19900300, Tanaka; US-4911849, 19900300, Labesque et al.; US-4930993, 19900600, Han; US-4931225, 19900600, Cheng; US-4956080, 19900900, Josefik; US-4961400, 19901000, Lapray; US-5011369, 19910400, Mine et al.; US-5013429, 19910500, Krofta; US-5045202, 19910900, Stearns et al.; US-5057230, 19911000, Race; US-5080802, 19920100, Cairo, Jr. et al.; US-5084167, 19920100, Beard et al.; US-5087377, 19920200, Josefik; US-5096386, 19920300, Kassel; US-5110741, 19920500, Ohi et al.; US-5116501, 19920500, House; US-5116506, 19920500, Williamson et al.; US-5118415, 19920600, Weis et al.; US-5133876, 19920700, Tharp; US-5152888, 19921000, Koyama; US-5160459, 19921100, Guarnaschelli et al.; US-5167806, 19921200, Wang et al.; US-5167878, 19921200, Arbisi et al.; US-5185085, 19930200, Borgren; US-5194144, 19930300, Blough; US-5200080, 19930400, Bergman, Jr. et al.; US-5211916, 19930500, Cheng; US-5238253, 19930800, Sieghartner; US-5252229, 19931000, Rojey et al.; US-5256282, 19931000, Chang et al.; US-5262051, 19931100, Iwatsuka; US-5264130, 19931100, Etlin; US-5294340, 19940300, Stog; US-5302286, 19940400, Semprini et al.; US-5314621, 19940500, Rogalla; US-5330639, 19940700, Murphree; US-5352369, 19941000, Heinig, Jr.; US-5356600, 19941000, Kiyonaga et al.; US-5362400, 19941100, Martinelli; US-5380471, 19950100, Ban et al.; US-5391328, 199
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