IPC분류정보
국가/구분 |
United States(US) Patent
등록
|
국제특허분류(IPC7판) |
|
출원번호 |
US-0910942
(2001-07-24)
|
우선권정보 |
TW-90201007 (2001-01-18) |
발명자
/ 주소 |
- Gerschefske, Kevin
- Horvath, Juliu
- San-Ping, Lee
- Brugman, Marjolein
|
출원인 / 주소 |
|
대리인 / 주소 |
|
인용정보 |
피인용 횟수 :
30 인용 특허 :
30 |
초록
▼
A storable exercise apparatus for home use. The apparatus includes an upright tower, a base structure, a bench frame, and a bench attached to the bench frame. A set of flexible pull lines coupled to a resilient spring system are carried within the tower structure. The user exercises by pulling the p
A storable exercise apparatus for home use. The apparatus includes an upright tower, a base structure, a bench frame, and a bench attached to the bench frame. A set of flexible pull lines coupled to a resilient spring system are carried within the tower structure. The user exercises by pulling the pull lines against the bias of the spring system. The grips for the pull lines are mounted at the top of the tower and generate significant tipping force on the tower when the apparatus is in use. To prevent tipping, the bench frame has pivotal and load-transmitting connections with the tower structure; the tower is stabilized by the weight of the user on the bench. The bench may be placed in either a raised or lowered position, and can be stored by collapsing and pivoting it so that it abuts the tower vertically.
대표청구항
▼
A storable exercise apparatus for home use. The apparatus includes an upright tower, a base structure, a bench frame, and a bench attached to the bench frame. A set of flexible pull lines coupled to a resilient spring system are carried within the tower structure. The user exercises by pulling the p
A storable exercise apparatus for home use. The apparatus includes an upright tower, a base structure, a bench frame, and a bench attached to the bench frame. A set of flexible pull lines coupled to a resilient spring system are carried within the tower structure. The user exercises by pulling the pull lines against the bias of the spring system. The grips for the pull lines are mounted at the top of the tower and generate significant tipping force on the tower when the apparatus is in use. To prevent tipping, the bench frame has pivotal and load-transmitting connections with the tower structure; the tower is stabilized by the weight of the user on the bench. The bench may be placed in either a raised or lowered position, and can be stored by collapsing and pivoting it so that it abuts the tower vertically. llenge [online] Dec. 31, 1998 [retrieved on Oct. 10, 2002]. Retrieved from the internet: .* h the first coupling part and including a portion extending into the receptacle means, and a quick disconnect screw lock mechanism is provided for the coupling parts. 12. The chuck means of claim 11, wherein the second coupling part has a first vertically movable portion which cooperates with the first coupling part, the first portion being biased towards the chuck plate by a spring, and secured a second portion wherein the first portion is supported for rotational movement and against axial movement, the first portion being supported in the housing such that in a lower position it is secured against rotation and in an upper position is freely rotatable, and a flexible conduit is connected to the second portion which in turn is connected to an axial passage in the spindle. s measured at the nozzle, onto a polishing pad at acute angles to the surface of the polishing pad. The nozzles can spray downward and outward toward the perimeter of the pad to facilitate the debris removal therefrom. The system can include a pressure source to produce a sufficient fluid pressure substantially higher than the typical fluid pressure available from a facility installation. in claim 1 wherein providing an optical fluoride crystal comprises providing a lithium fluoride crystal. 14. A method as claimed in claim 1 wherein providing an optical fluoride crystal final polishing solution includes providing a slurry having a plurality of non-agglomerated solid sphere fused silica soot particles with a particle size distribution between 30 nm and 300 nm. 15. A method as claimed in claim 1 wherein providing an optical fluoride crystal final polishing solution includes providing high purity fused silica soot particles. 16. A method as claimed in claim 1 wherein providing an optical fluoride crystal final polishing solution includes providing doped fused silica glass soot particles. 17. A method as claimed in claim 1 wherein providing an optical fluoride crystal final polishing solution includes providing Ti doped fused silica glass soot particles. 18. A method as claimed in claim 1 wherein providing an optical fluoride crystal final polishing solution includes providing Ge doped fused silica glass soot particles. 19. A method as claimed in claim 1 wherein providing an optical fluoride crystal final polishing solution includes providing Al doped fused silica glass soot particles. 20. A method as claimed in claim 1 wherein providing an optical fluoride crystal final polishing solution includes providing B doped fused silica glass soot particles. 21. A method as claimed in claim 1 wherein providing an optical fluoride crystal final polishing solution includes providing P doped fused silica glass soot particles. 22. A method as claimed in claim 1 wherein providing an optical fluoride crystal final polishing solution includes providing Zr doped fused silica glass soot particles. 23. A method as claimed in claim 1 wherein providing an optical fluoride crystal final polishing solution includes providing Er doped fused silica glass soot particles. 24. A method as claimed in claim 1 wherein providing an optical fluoride crystal final polishing solution includes providing Ce doped fused silica glass soot particles. 25. A method as claimed in claim 1 wherein providing an optical fluoride crystal final polishing solution includes providing periodic table of elements lanthanide series metal doped fused silica glass soot particles. 26. A method as claimed in claim 1 wherein providing an optical fluoride crystal final polishing solution includes providing soot particles having a mean particle size in the range of 0.3 to 0.5 μm. 27. A method as claimed in claim 1 wherein providing an optical fluoride crystal final polishing solution includes providing soot particles having a particle surface area less than 100 m2/gram. 28. A method as claimed in claim 1 wherein providing an optical fluoride crystal final polishing solution includes providing soot particles having a particle surface area no greater than 50 m2/gram. 29. A method as claimed in claim 1 wherein providing an optical fluoride crystal final polishing solution includes providing soot particles having a particle surface area no greater than 20 m2/gram. 30. A method as claimed in claim 1 wherein providing an optical fluoride crystal final polishing solution includes providing soot particles having a particle surface area in the range of about 10 to 20 m2/gram. 31. A method as claimed in claim 14 wherein providing an optical fluoride crystal final polishing solution wherein said slurry has a stabilized dispersion viscosity. 32. A method as claimed in claim 1 wherein providing an optical fluoride crystal final polishing solution includes providing soot particles wherein said soot have a surface activity ≥1.5×10-5moles/meter. 33. A method as claimed in claim 1 wherein providing an optical fluoride crystal final polishing solution includes providing soot particles, wherein said soot have an intrinsic pKa1of 0.0±0.2 and an intrinsic pKa2of 7.0±0.1. 34. A method as claimed in claim 1 wherein providing an optical fluoride crystal final polishing solution includes providing soot particles, wherein said soot particles have an isoelectric point (pHIEP) of 3.5±0.1. 35. A method as claimed in claim 1 wherein providing an optical fluoride crystal final polishing solution includes providing soot particles, wherein said soot have an intrinsic pKa1of 0.0±0.1 and an intrinsic pKa2of 5.0±0.2. 36. A method as claimed in claim 1 wherein providing an optical fluoride crystal final polishing solution includes providing soot particles, wherein said soot have an isoelectric point (pHIEP) of 2.5±0.1. 37. A method as claimed in claim 1 wherein providing an optical fluoride crystal final polishing solution includes providing soot particles, wherein said colloidal silica soot has an insolution stability with said particles agglomeration resistant. 38. A method as claimed in claim 1 wherein providing an optical fluoride crystal final polishing solution includes providing soot particles, wherein said colloidal silica soot has an insolution stability with said particles gellation resistant. 39. A method as claimed in claim 1 wherein providing an optical fluoride crystal final polishing solution includes providing soot particles, wherein said colloidal silica soot has an insolution stability with said particles in said slurry having a stabilized viscosity. 40. A method as claimed in claim 1 wherein providing an optical fluoride crystal final polishing solution includes providing an aqueous slurry with a pH in the range of 2-12. 41. A method as claimed in claim 1 wherein providing an optical fluoride crystal final polishing solution includes providing an aqueous slurry with a pH in the range of 9-12. 42. A method as claimed in claim 1 wherein providing an optical fluoride crystal final polishing solution includes providing a non-aqueous solvent. 43. A method as claimed in claim 42 wherein said non-aqueous solvent is comprised of ethylene glycol. 44. A method as claimed in claim 42 wherein said non-aqueous solvent is comprised of kerosene. 45. A method of polishing an optical fluoride crystal, said method comprising: providing an optical fluoride crystal having an optical transmission surface, providing a final polishing fused silica soot solution, said final polishing solution comprised of a slurry having a plurality of non-agglomerated solid sphere fused silica soot particles with a particle size distribution between 30 nm and 300 nm, said slurry having a stabilized dispersion viscosity, polishing said optical fluoride crystal optical transmission surface with said final polishing colloidal solid sphere doped fused silica soot solution to provide a polished optical fluoride crystal optical transmission surface. 46. A method of polishing an optical fluoride crystal, said method comprising: providing an optical fluoride crystal having an optical transmission surface, providing a final polishing fused silica soot solution, said final polishing solution comprised of a plurality of particulate abrasive agent colloidal solid sphere doped fused silica glass soot particles, having a surface activity ≥1.5×10-5moles/meter, polishing said optical fluoride crystal optical transmission surface with said final polishing colloidal solid sphere doped fused silica soot solution to provide a polished optical fluoride crystal optical transmission surface. 47. A method of polishing an optical fluoride crystal, said method comprising: providing an optical fluoride crystal having an optical transmission surface, providing a final polishing fused silica soot solution, said final polishing solution comprised of a plurality of particulate abrasive agent colloidal solid sphere doped fused silica glass soot particles, having an intrinsic pKa1of 0.0±0.2 and an intrinsic pKa2of 7.0±0.1, polishing said optical fluoride crystal optical transmission surface with said f
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