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Hardware assembly for CVI/CVD processes 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • C23C-016/26
출원번호 US-0933465 (2001-08-20)
발명자 / 주소
  • Daws, David E.
  • Rudolph, James W.
  • Zeigler, Dary
  • Bazshushtari, Afshin
출원인 / 주소
  • Goodrich Corporation
대리인 / 주소
    Brinks Hofer Gilson & Lione
인용정보 피인용 횟수 : 15  인용 특허 : 27

초록

A hardware assembly is provided for controlling a first portion of gas and a second portion of gas in a furnace. The first portion of the gas is introduced to a center opening region of a stack of porous structures. The second portion of the gas is introduced to an outer region of the stack of porou

대표청구항

A hardware assembly is provided for controlling a first portion of gas and a second portion of gas in a furnace. The first portion of the gas is introduced to a center opening region of a stack of porous structures. The second portion of the gas is introduced to an outer region of the stack of porou

이 특허에 인용된 특허 (27)

  1. Ishihara Shunichi (Ebina JPX) Hanna Jun-ichi (Yokohama JPX) Shimizu Isamu (Yokohama JPX) Hirooka Masaaki (Toride JPX), Apparatus for forming deposited film.
  2. Drowley Clifford I. (Phoenix AZ) Turner John E. (Woodside CA), Apparatus for forming shallow electrical junctions.
  3. Vaudel Serge (Teuillac FRX), Apparatus for preheating a flow of gas in an installation for chemical vapor infiltration, and a densification method us.
  4. Higashiyama Kazutoshi (Hitachi) Ushida Takahisa (Nagoya) Hirabayashi Izumi (Nagoya) Tanaka Shoji (Tokyo JPX), Apparatus for producing superconducting oxide film.
  5. Rudolph James W. (Colorado Springs CO) Purdy Mark J. (Akron OH) Bok Lowell D. (Anna OH), Apparatus for use with CVI/CVD processes.
  6. Fisher Ronald (Rugby GB2) Smith Norman (Rugby GB2), Apparatus for vapor deposition on tubular substrate.
  7. Chareire Jean-Louis (Levallois-Perret FRX) Dupupet Guy (Ermont FRX), Brake disc of carbon-carbon composite material.
  8. Caputo Anthony J. (Knoxville TN) Devore Charles E. (Knoxville TN) Lowden Richard A. (Powell TN) Moeller Helen H. (Concord VA), CVD apparatus and process for the preparation of fiber-reinforced ceramic composites.
  9. Miyazaki Shinji (Yokohama JPX), Chemical vapor growth apparatus having an exhaust device including trap.
  10. Kanai Masahiro (Tokyo JPX) Hirooka Masaaki (Toride JPX) Hanna Junichi (Yokohama JPX) Shimizu Isamu (Yokohama JPX) Takeuchi Eiji (Yokohama JPX), Device for forming a deposited film.
  11. Bauer Dieter W. (Whittier CA), Fiber reinforced composite product.
  12. Weaver John Victor (Water Orton EN) Fisher Ronald (Hillmorton Rugby EN), Friction member.
  13. Goldman Jon C. (Orange CA) Rappaport Robert E. (Westminster CA), Gas control system for chemical vapor deposition system.
  14. Stauffer Craig M. (3066 Scott Blvd. Santa Clara CA 95054), Integrated delivery system for chemical vapor from non-gaseous sources for semiconductor processing.
  15. Fisher Ronald (Rugby GB2) Smith Norman (Rugby GB2), Method for the production of carbon/carbon composite material.
  16. Bernard Bruno C. (Eusines FRX) Brosse Christian B. (Le Haillan FRX) Cavalier Jean-Claude (Le Pian Medoc FRX), Method of densifying a porous substrate by means of a matrix containing carbon.
  17. Golecki Ilan (Parsippany NJ) Morris Robert C. (Ledgewood NJ) Narasimhan Dave (Flemington NJ), Method of rapidly densifying a porous structure.
  18. Fujii Atsuhiro (Itami JPX), Method of treating a substrate wherein the flow rates of the treatment gases are equal.
  19. Nishikawa Yukinobu (Tokyo JPX) Hashizume Yoshinori (Tokyo JPX) Kimura Takako (Tokyo JPX), Mixed gas supply system with a backup supply system.
  20. Rudolph James W. ; Purdy Mark J., Pressure gradient CVI/CVD apparatus process and product.
  21. Rudolph James W. ; Purdy Mark J., Pressure gradient CVI/CVD apparatus, process and product.
  22. Okamura Ryuji (Shiga JPX) Otoshi Hirokazu (Nagahama JPX) Takei Tetsuya (Nagahama JPX), Process and apparatus for microwave plasma chemical vapor deposition.
  23. Lackey ; Jr. Walter J. (Oak Ridge TN) Caputo Anthony J. (Knoxville TN), Process for the preparation of fiber-reinforced ceramic composites by chemical vapor deposition.
  24. Maeda Kazuo (Tokyo JPX) Ohira Kouichi (Tokyo JPX) Hirose Mitsuo (Tokyo JPX), Semiconductor fabrication equipment.
  25. Fisher Ronald (Rugby GB2) Fennell Thomas G. (Coventry GB2) Evans Maurice J. (Lichfield GB2), Toughened carbon composite brake discs.
  26. Christin Fran.cedilla.ois,FRX ; Daubigny Pierre,FRX ; Delaurens Pierre,FRX ; Leluan Jean-Luc,FRX, Vapour phase chemical infiltration process for densifying porous substrates disposed in annular stacks.
  27. Anderson Roger N. (San Jose CA) Lindstrom Paul R. (Aptos CA) Johnson Wayne (Phoenix AZ), Variable rate distribution gas flow reaction chamber.

이 특허를 인용한 특허 (15)

  1. Arico,Alan A.; Parker,David E.; Waghray,Akshay; Miller,Brian; Shaw,David W., Chemical vapor deposition method.
  2. Swank,John P.; Steele,Leslie; Bianco,Robert, Chromium-nickel stainless steel alloy article having oxide coating formed from the base metal suitable for brake apparatus.
  3. Delperier, Bernard; Domblides, Jean-Luc; Richard, Jean-Philippe; Delaurens, Pierre, Densifying hollow porous substrates by chemical vapor infiltration.
  4. Jonnalagadda, Rajanikant; Miller, Brian J., Gas port sealing for CVD/CVI furnace hearth plates.
  5. Jonnalagadda, Rajanikant; Miller, Brian J., Gas port sealing for CVD/CVI furnace hearth plates.
  6. Miller, Brian J.; Arico, Alan A.; Waghray, Akshay; Menzie, Todd M.; Cress, James Jay, Gas preheater for chemical vapor processing furnace.
  7. Cress, James Jay; Miller, Brian J., Gas preheater for chemical vapor processing furnace having circuitous passages.
  8. Hegermann, Rainer; Goetz, Philipp, Method for the chemical vapor infiltration of refractive substances.
  9. Lamouroux, Franck; Bertrand, Sébastien; Goujard, Stéphane; Caillaud, Alain; Bagilet, Francis; Mazereau, Stéphane, Method of densifying thin porous substrates by chemical vapor infiltration, and a loading device for such substrates.
  10. Lamouroux, Franck; Bertrand, Sébastien; Goujard, Stéphane; Caillaud, Alain; Bagilet, Francis; Mazereau, Stéphane, Method of densifying thin porous substrates by chemical vapor infiltration, and a loading device for such substrates.
  11. Rudolph, James W.; Fry, Vincent, Non-pressure gradient single cycle CVI/CVD apparatus and method.
  12. Rudolph, James W.; Fry, Vincent R., Non-pressure gradient single cycle CVI/CVD apparatus and method.
  13. Ikejiri, Takashi, Surface treatment apparatus and surface treatment method.
  14. Gurary, Alex; Armour, Eric A.; Hoffman, Richard; Cruel, Jonathan, System and method for varying wafer surface temperature via wafer-carrier temperature offset.
  15. Sung, Su-Jen, Systems and methods for uniform gas flow in a deposition chamber.
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