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Substrate treating device and method, and exposure device and method 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G03B-027/62
  • G03B-027/42
  • G03D-005/00
  • G06F-007/08
  • B65H-001/00
출원번호 US-0671481 (2000-09-27)
우선권정보 JP-0090464 (1998-04-02)
발명자 / 주소
  • Hirakawa, Shinichi
출원인 / 주소
  • Nikon Corporation
대리인 / 주소
    Oliff & Berridge PLC
인용정보 피인용 횟수 : 13  인용 특허 : 20

초록

The mask guiding device of the present invention has a mask guiding device that guides a substrate received from the outside. The mask guiding device is provided with a plurality of receiving portions that receives said mask from the outside.

대표청구항

The mask guiding device of the present invention has a mask guiding device that guides a substrate received from the outside. The mask guiding device is provided with a plurality of receiving portions that receives said mask from the outside. l electrode has a substantially zigzag shape and a substa

이 특허에 인용된 특허 (20)

  1. Nakahara Kanefumi (Yokohama JPX), Apparatus for and method of carrying a substrate.
  2. Takahashi Tetsuo (Akita JPX) Miyauchi Eisaku (Akita JPX) Miyajima Toshihiko (Saku JPX) Watanabe Hideaki (Akita JPX), Apparatus for clean transfer of objects.
  3. Murata Masanao,JPX ; Tsubaki Tatsuo,JPX ; Kawano Hitoshi,JPX, Automated guided vehicle.
  4. Murata Masanao (Ise JPX) Tanaka Tsuyoshi (Ise JPX) Morita Teruya (Ise JPX) Kawano Hitoshi (Ise JPX), Automatic transferring system using portable closed container.
  5. Masujima Sho,JPX ; Miyauchi Eisaku,JPX ; Miyajima Toshihiko,JPX ; Watanabe Hideaki,JPX, Clean transfer method and apparatus therefor.
  6. Nakahara Kanefumi (Yokohama JPX) Nakajima Masao (Yokohama JPX) Tsuruya Toshinori (Kawasaki JPX), Exposure apparatus.
  7. Russel Shirley ; Michael R. Conboy ; Horace Paul Bowser, Jr., Mask identification database server.
  8. Bonora Anthony C. ; Neads Michael A. ; Oen Joshua T., Method and apparatus for vertical transfer of a semiconductor wafer cassette.
  9. Wooding Michael J. (Sunnyvale CA) Cardema Rudolfo S. (San Jose CA) Ramiller Charles L. (Santa Clara CA), Method and system for loading wafers.
  10. Yoshitake Shusuke,JPX ; Itoh Masamitsu,JPX ; Takigawa Tadahiro,JPX, Pattern transfer apparatus, an operation management system thereof, and an operation management system for a semiconduct.
  11. Hasegawa Takayuki,JPX ; Fujioka Hidehiko,JPX ; Yoneyama Yoshito,JPX, Processing System and semiconductor device production method using the same including air conditioning control in opera.
  12. Mizosaki Kengo (Kumamoto JPX), Processing apparatus.
  13. Taniguchi Tetsuo,JPX, Projection exposure method and apparatus.
  14. Iizuka Kazuo (Yokohama JPX), Reticle conveying device.
  15. Iwasaki Junji,JPX ; Katsube Junichi,JPX ; Itami Yasushi,JPX, Semiconductor wafer cassette transportation apparatus and stocker used therein.
  16. Hasebe Keizo,JPX ; Nagashima Shinji,JPX ; Semba Norio,JPX ; Akimoto Masami,JPX ; Kimura Yoshio,JPX ; Iida Naruaki,JPX ; Harada Kouji,JPX ; Ueda Issei,JPX ; Konishi Nobuo,JPX, Substrate processing system.
  17. Inoue Isamu,JPX ; Kotera Koichi,JPX ; Matsunaga Osamu,JPX ; Kitagawa Kiyohiko,SGX ; Taguchi Takayuki,JPX, Substrate transfer method and substrate transfer cassette.
  18. Kitano Junichi,JPX ; Shinya Hiroshi,JPX ; Katano Takayuki,JPX ; Yaegashi Hidetami,JPX ; Kawakami Yasunori,JPX ; Kawano Fumihiko,JPX, Substrate treating system and substrate treating method.
  19. Kato Shigekazu,JPX ; Nishihata Kouji,JPX ; Tsubone Tsunehiko,JPX ; Itou Atsushi,JPX, Vacuum processing apparatus for substate wafers.
  20. Kato Shigekazu (Kudamatsu JPX) Tamura Naoyuki (Kudamatsu JPX) Nishihata Kouji (Tokuyama JPX) Tsubone Tsunehiko (Hikari JPX) Itou Atsushi (Kudamatsu JPX) Nakata Kenji (Hikari JPX) Ogawa Yoshifumi (Hik, Vacuum processing system.

이 특허를 인용한 특허 (13)

  1. Lim,Jong Go; Jeong,Jae Gyu, Aligning apparatus.
  2. Lim,Jong Go; Jeong,Jae Gyu, Aligning apparatus.
  3. Schaefer, Wolf-Hasso, Intermediate storage unit for the intermediate storage of objects to be painted.
  4. Wakker, Remko; Smeets, Erik Marie Jose, Lithographic apparatus and method for masking a substrate.
  5. Ogura, Hiroyuki; Mitsuhashi, Tsuyoshi; Fukutomi, Yoshiteru; Morinishi, Kenya; Kawamatsu, Yasuo; Nagashima, Hiromichi, Multi-story substrate treating apparatus with flexible transport mechanisms and vertically divided treating units.
  6. Ogura, Hiroyuki; Mitsuhashi, Tsuyoshi; Fukutomi, Yoshiteru; Morinishi, Kenya; Kawamatsu, Yasuo; Nagashima, Hiromichi, Multi-story substrate treating apparatus with flexible transport mechanisms and vertically divided treating units.
  7. Fukutomi, Yoshiteru; Mitsuhashi, Tsuyoshi; Ogura, Hiroyuki; Morinishi, Kenya; Kawamatsu, Yasuo; Nagashima, Hiromichi, Substrate treating apparatus.
  8. Fukutomi, Yoshiteru; Mitsuhashi, Tsuyoshi; Ogura, Hiroyuki; Morinishi, Kenya; Kawamatsu, Yasuo; Nagashima, Hiromichi, Substrate treating apparatus using horizontal treatment cell arrangements with parallel treatment lines.
  9. Ogura, Hiroyuki; Mitsuhashi, Tsuyoshi; Fukutomi, Yoshiteru; Morinishi, Kenya; Kawamatsu, Yasuo; Nagashima, Hiromichi, Substrate treating apparatus with inter-unit buffers.
  10. Ogura, Hiroyuki; Morinishi, Kenya; Mitsuhashi, Tsuyoshi; Kawamatsu, Yasuo; Fukutomi, Yoshiteru; Nagashima, Hiromichi, Substrate treating apparatus with inter-unit buffers.
  11. Ogura, Hiroyuki; Mitsuhashi, Tsuyoshi; Fukutomi, Yoshiteru; Morinishi, Kenya; Kawamatsu, Yasuo; Nagashima, Hiromichi, Substrate treating apparatus with parallel substrate treatment lines simultaneously treating a plurality of substrates.
  12. Ogura, Hiroyuki; Mitsuhashi, Tsuyoshi; Fukutomi, Yoshiteru; Morinishi, Kenya; Kawamatsu, Yasuo; Nagashima, Hiromichi, Substrate treating apparatus with substrate reordering.
  13. Fukutomi, Yoshiteru; Mitsuhashi, Tsuyoshi; Ogura, Hiroyuki; Morinishi, Kenya; Kawamatsu, Yasuo; Nagashima, Hiromichi, Substrate treating apparatus with vertical treatment arrangement including vertical blowout and exhaust units.
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