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Optical arrangement for symmetrizing the radiation of two-dimensional arrays of laser diodes 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G02B-027/12
  • G02B-027/10
출원번호 US-0926076 (2001-08-24)
우선권정보 DE-0014755 (1999-03-31)
국제출원번호 PCT/EP00/02708 (2000-03-28)
국제공개번호 WO00/60399 (2000-10-12)
발명자 / 주소
  • Goring, Rolf
  • Possner, Torsten
  • Schreiber, Peter
출원인 / 주소
  • Fraunhofer-Gesellschaft zur Foerderung der Angewandten Forschung E.V.
대리인 / 주소
    Greenblum & Bernstein, P.L.C.
인용정보 피인용 횟수 : 49  인용 특허 : 5

초록

An optical arrangement for symmetrizing beams which includes a plurality of laser diodes arranged next to one another. The plurality of laser diodes emit beams which are asymmetrical relative to a first direction and a second direction, with the second direction being perpendicular to the first dire

대표청구항

An optical arrangement for symmetrizing beams which includes a plurality of laser diodes arranged next to one another. The plurality of laser diodes emit beams which are asymmetrical relative to a first direction and a second direction, with the second direction being perpendicular to the first dire

이 특허에 인용된 특허 (5)

  1. Du Keming,DEX ; Loosen Peter,DEX, Arrangement for guiding and shaping beams from a rectilinear laser diode array.
  2. Feke Gilbert T. (Stoneham MA) Delori Francois (Lincoln MA) Webb Robert H. (Lincoln MA), Beam steering optical system and method and ophthalmic apparatus using same having spaced apart irradiation and observat.
  3. Rolf Goering DE; Peter Schreiber DE; Stefan Heinemann ; Ulrich Roellig DE; Michael Nickel DE, Optical arrangement for balancing the beam of one or more high power diode lasers arranged one above another.
  4. Ullmann Christopher,DEX ; Krause Volker,DEX ; Kosters Arnd,DEX, Optical arrangement for use in a laser diode system.
  5. Goering Rolf,DEX ; Schreiber Peter,DEX ; Possner Torsten,DEX, Optical array for symmetrization of laser diode beams.

이 특허를 인용한 특허 (49)

  1. Anikitchev,Serguei G.; Austin,R. Russel, Apparatus for reducing spacing of beams delivered by stacked diode-laser bars.
  2. Anikitchev,Serguei G.; Austin,R. Russel, Apparatus for reducing spacing of beams delivered by stacked diode-laser bars.
  3. Sevigny, Benoit, Collimated beam channel with four lens optical surfaces.
  4. Koek, Wouter Dick; Bleeker, Arno Jan; Loopstra, Erik Roelof; Mulder, Heine Melle; Van Zwet, Erwin John; Smeets, Dries; Ebeling, Robert Paul, Device, lithographic apparatus, method for guiding radiation and device manufacturing method.
  5. Sipes, Jr., Donald L.; Schulz, Daniel Scott, Efficient generation of intense laser light from multiple laser light sources using misaligned collimating optical elements.
  6. Kanskar, Manoj, High brightness multijunction diode stacking.
  7. Kanskar, Manoj; Price, Raymond Kirk; Small, Jay; Hemenway, David Martin; Chen, Zhigang, High brightness multijunction diode stacking.
  8. Govorkov, Sergei V.; Anthon, Douglas William, High power and high brightness diode-laser array for material processing applications.
  9. Govorkov, Sergei V.; DiJaili, Sol Peter; Anthon, Douglas William; Spinelli, Luis A., High power and high brightness diode-laser array for material processing applications.
  10. Guo, James Yonghong; Skidmore, Jay A.; Xu, Lei; Cheng, Jane, High-brightness spatial-multiplexed multi-emitter pump with tilted collimated beam.
  11. Price, R. Kirk; Lerner, Scott A., Laser diode apparatus utilizing out of plane combination.
  12. Faybishenko, Victor, Laser diode assemblies.
  13. Faybishenko, Victor, Laser diode assemblies.
  14. Faybishenko, Victor, Laser diode combiner modules.
  15. Bleeker, Arno Jan; De Winter, Laurentius Cornelius, Lithographic apparatus and device manufacturing method.
  16. Butler, Hans; Bleeker, Arno Jan; Hennus, Pieter Renaat Maria; Hoeks, Martinus Hendricus Henricus; Hol, Sven Antoin Johan; Van Der Schoot, Harmen Klaas; Slaghekke, Bernardus Antonius; Tinnemans, Patricius Aloysius Jacobus; Van Der Wijst, Marc Wilhelmus Maria; Zaal, Koen Jacobus Johannes Maria; Cadee, Theodorus Petrus Maria; Beerens, Ruud Antonius Catharina Maria; Fischer, Olof Martinus Josephus; Aangenent, Wilhelmus Henricus Theodorus Maria; Bosch, Niels Johannes Maria, Lithographic apparatus and device manufacturing method.
  17. Mulder, Heine Melle, Lithographic apparatus and device manufacturing method.
  18. Onvlee, Johannes; De Jager, Pieter Willem Herman; Van Zwet, Erwin John, Lithographic apparatus and device manufacturing method.
  19. Tinnemans, Patricius Aloysius Jacobus; Bleeker, Arno Jan, Lithographic apparatus and device manufacturing method.
  20. Van Dijsseldonk, Antonius Johannes Josephus; Bleeker, Arno Jan, Lithographic apparatus and device manufacturing method.
  21. Van Zwet, Erwin John; De Jager, Pieter Willem Herman; Onvlee, Johannes; De Man, Hendrik, Lithographic apparatus and device manufacturing method.
  22. Van Zwet, Erwin John; De Jager, Pieter Willem Herman; Onvlee, Johannes; Fritz, Erik Christiaan, Lithographic apparatus and device manufacturing method.
  23. Van Zwet, Erwin John; De Jager, Pieter Willem Herman; Onvlee, Johannes; Fritz, Erik Christiaan, Lithographic apparatus and device manufacturing method.
  24. Van Zwet, Erwin John; De Jager, Pieter Willem Herman; Onvlee, Johannes; Fritz, Erik Christiaan, Lithographic apparatus and device manufacturing method.
  25. Tinnemans, Patricius Aloysius Jacobus; Bleeker, Arno Jan; Loopstra, Erik Roelof, Lithographic apparatus, device manufacturing method and computer program.
  26. Bleeker, Arno Jan; Hoeks, Martinus Hendricus Henricus; Cadee, Theodorus Petrus Maria, Lithographic apparatus, method for maintaining a lithographic apparatus and device manufacturing method.
  27. De Jager, Pieter Willem Herman; Banine, Vadim Yevgenyevich; Benschop, Jozef Petrus Henricus; Gui, Cheng-Qun; Onvlee, Johannes; Van Zwet, Erwin John, Lithographic apparatus, programmable patterning device and lithographic method.
  28. De Jager, Pieter Willem Herman; Banine, Vadim Yevgenyevich; Benschop, Jozef Petrus Henricus; Gui, Cheng-Qun; Onvlee, Johannes; Van Zwet, Erwin John, Lithographic apparatus, programmable patterning device and lithographic method.
  29. De Jager, Pieter Willem Herman; Banine, Vadim Yevgenyevich; Onvlee, Johannes; Stevens, Lucas Henricus Johannes; Wuister, Sander Frederik; Iosad, Nikolay Nikolaevich, Lithographic apparatus, programmable patterning device and lithographic method.
  30. Loopstra, Erik Roelof; Hoeks, Martinus Hendricus, Lithography apparatus, an apparatus for providing setpoint data, a device manufacturing method, a method for providing setpoint data and a computer program.
  31. Tinnemans, Patricius Aloysius Jacobus; Mulckhuyse, Wouter Frans Willem, Lithography apparatus, an apparatus for providing setpoint data, a device manufacturing method, a method of calculating setpoint data and a computer program.
  32. Peeters, Felix Godfried Peter; Benschop, Jozef Petrus Henricus; Renkens, Michael Jozef Mathijs; Van Baars, Gregor Edward; Dekkers, Jeroen, Measurement of the position of a radiation beam spot in lithography.
  33. Anikitchev,Serguei G.; Rekow,Mathew N., Method and apparatus for coupling radiation from a stack of diode-laser bars into a single-core optical fiber.
  34. Retterath, James E., Methods and apparatus for an active pulsed 4D camera for image acquisition and analysis.
  35. Retterath, Jamie E.; Laumeyer, Robert A., Methods and apparatus for array based LiDAR systems with reduced interference.
  36. Retterath, James E.; Laumeyer, Robert A., Methods and apparatus for increased precision and improved range in a multiple detector LiDAR array.
  37. Retterath, James E.; Laumeyer, Robert A., Methods and apparatus for object detection and identification in a multiple detector lidar array.
  38. Schulte, Derek E.; Yan, Yu; Martinsen, Robert J.; Hodges, Aaron L.; Karlsen, Scott R., Modular diode laser assembly.
  39. Schulte, Derek E.; Yan, Yu; Martinsen, Robert J.; Hodges, Aaron L.; Karlsen, Scott R., Modular diode laser assembly.
  40. Schulte,Derek E.; Yan,Yu; Martinsen,Robert J.; Hodges,Aaron L.; Karlsen,Scott R., Modular diode laser assembly.
  41. Schulte,Derek E.; Yan,Yu; Martinsen,Robert J.; Hodges,Aaron L.; Karlsen,Scott R., Modular diode laser assembly.
  42. Schulte,Derek E.; Yan,Yu; Martinsen,Robert J.; Hodges,Aaron L.; Karlsen,Scott R., Modular diode laser assembly.
  43. Hemenway, David Martin; Dawson, David C.; Urbanek, Wolfram, Passively aligned single element telescope for improved package brightness.
  44. Smeets, Dries; Bleeker, Arno Jan; Lee, Christopher James; De Jager, Pieter Willem Herman; Mulder, Heine Melle; Pellens, Rudy Jan Maria, Radiation modulator for a lithography apparatus, a lithography apparatus, a method of modulating radiation for use in lithography, and a device manufacturing method.
  45. Hemenway, David Martin; Dawson, David C.; Urbanek, Wolfram; Farrow, Roger L.; Kliner, Dahv A. V., Spectrally multiplexing diode pump modules to improve brightness.
  46. Buckman, Lisa A.; Peters, Frank H.; Lemoff, Brian E., Structure and apparatus for a very short haul, free space, and fiber optic interconnect and data link.
  47. Onvlee, Johannes; Munnig Schmidt, Robert-Han, Substrate handling apparatus and lithographic apparatus.
  48. Sipes, Jr., Donald L., System and method for generating intense laser light from laser diode arrays.
  49. Sipes, Jr., Donald L., System and method for generating intense laser light from laser diode arrays.
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