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Method and apparatus for mitigating cross-contamination between liquid dispensing jets in close proximity to a surface 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B05C-005/00
  • B05B-004/03
  • B05B-007/08
  • B05B-001/00
  • H01L-021/30
출원번호 US-0265203 (2002-10-03)
발명자 / 주소
  • Nguyen, Andrew
출원인 / 주소
  • ASML Holdings, N.V.
대리인 / 주소
    Blakely, Sokoloff, Taylor & Zafman LLP
인용정보 피인용 횟수 : 17  인용 특허 : 43

초록

Methods and apparatus for delivering a variety of processing fluids onto a semiconductor wafer substrate with a multi-port nozzle: The nozzle is formed with plurality of longitudinal liquid manifolds and gas manifolds. Each manifold is positioned within the nozzle body so they are in fluid communica

대표청구항

Methods and apparatus for delivering a variety of processing fluids onto a semiconductor wafer substrate with a multi-port nozzle: The nozzle is formed with plurality of longitudinal liquid manifolds and gas manifolds. Each manifold is positioned within the nozzle body so they are in fluid communica

이 특허에 인용된 특허 (43)

  1. Inada Hiroichi (Kumamoto JPX) Tsunematsu Kunie (Kumamoto JPX), Apparatus and method for developing resist coated on a substrate.
  2. Konishi Nobuo,JPX ; Hirose Keizo,JPX, Apparatus and method for forming liquid film.
  3. Park Sung-hyeon,KRX ; Kim Sung-il,KRX, Apparatus for coating a semiconductor wafer with a photoresist.
  4. Samuels Gerard (Paoli PA), Apparatus for spraying a liquid on a spinning surface.
  5. Lee Gyu-myeung,KRX ; Jang Ill-jin,KRX, Apparatus for spraying photoresist.
  6. Yonaha Shinya,JPX, Coater.
  7. Akimoto Masami,JPX, Coating apparatus.
  8. Fujimoto Akihiro,JPX, Coating apparatus and coating method.
  9. Motoda Kimio,JPX ; Tateyama Kiyohisa,JPX, Coating apparatus and method therefor.
  10. Kinose Kazuo,JPX ; Yonezawa Takeshi,JPX ; Oketani Taimi,JPX ; Yamamoto Tomoo,JPX, Coating device with movable fluid supply nozzle and rotatable substrate holder.
  11. Tateyama Kiyohisa,JPX ; Motoda Kimio,JPX ; Anai Noriyuki,JPX, Coating method and apparatus for semiconductor process.
  12. Kutsuzawa Junji,JPX ; Sago Hiroyoshi,JPX ; Shimai Futoshi,JPX ; Miyamoto Hidenori,JPX, Coating nozzle and coating device having coating nozzle.
  13. Yuji Matsuyama JP; Shuichi Nagamine JP, Developing method and developing unit.
  14. Nakagawa Seiji,JPX ; Ito Yasushi,JPX, Developing treatment apparatus used in the process for manufacturing a semiconductor device, and method for the develop.
  15. Morine Richard L. (95 Windward Island Clearwater FL 33515) Hokes James J. (4313 Carrollwood Village Dr. Tampa FL 33624), Dispensing apparatus.
  16. Hosogaya Ryuji (Saku JPX) Tsunoda Eizo (Komoro JPX) Hatakeyama Akira (Saku JPX) Osawa Yoshihisa (Miyota-machi JPX) Tanaka Hideki (Saku JPX) Tobisawa Seiichi (Hino JPX), Extrusion type coating head.
  17. Colton Douglas E. (Salinas CA), Hot-melt sputtering apparatus.
  18. Hasebe Keizo (Kofu JPX) Tateyama Kiyohisa (Kumamoto JPX) Yoshimoto Yuji (Shisui JPX) Matsuyama Yuji (Oozu JPX) Nakahara Tetsuro (Mashiki JPX) Kimura Yoshio (Koshi JPX), Liquid coating system.
  19. Cardinali Thomas J. (Burlington VT) Lin Burn J. (Scarsdale NY), Material-saving resist spinner and process.
  20. Hall William B. (Dallas PA), Megasonic jet cleaner apparatus.
  21. Hillman Gary (Livingston NJ) Mohondro Robert D. (Pleasanton CA), Method and apparatus for applying a layer of a fluid material on a semiconductor wafer.
  22. Ha Vinh Van ; Trublowski John ; Nation Brenda Joyce ; Lin Jeff ; Perng Chin-Yuan, Method and apparatus for dispensing viscous material.
  23. Sugimoto Kenji (Kyoto JPX) Sugimoto Hiroaki (Kyoto JPX) Kitagawa Masaru (Kyoto JPX), Method and apparatus for drying a substrate having a resist film with a miniaturized pattern.
  24. Courtenay Robert William, Method and apparatus for improved coating of a semiconductor wafer.
  25. Choinski Edward J. (Wayland MA), Method and apparatus for patch coating printed circuit boards.
  26. Semba Norio,JPX, Method for developing treatment.
  27. Kuwabara Takasi (Sakado JPX) Yoshiji Takeo (Sakado JPX) Tegawa Masao (Ohmiya JPX), Method of and apparatus for automatically coating a workpiece.
  28. Neoh Soon E. (Singapore SGX), Method of dispensing fluid onto a wafer.
  29. Hasebe Keizo (Kofu JPX) Fujimoto Akihiro (Kumamoto-ken JPX) Inada Hiroichi (Kumamoto JPX) Iino Hiroyuki (Nirasaki JPX) Kitamura Shinzi (Kumamoto-ken JPX) Deguchi Masatoshi (Kumamoto JPX) Nambu Mitsuh, Method of forming coating film and apparatus therefor.
  30. Hasebe Keizo,JPX ; Fujimoto Akihiro,JPX ; Inada Hiroichi,JPX ; Iino Hiroyuki,JPX ; Kitamura Shinzi,JPX ; Deguchi Masatoshi,JPX ; Nambu Mitsuhiro,JPX, Method of forming coating film and apparatus therefor.
  31. Ikeda Tokuzou (Saitama-ken JPX) Atsumi Akihiro (Saitama-ken JPX) Saito Makoto (Saitama-ken JPX), Method of producing a reinforcing fiber sheet.
  32. Fujimoto Akihiro,JPX, Method of removing coated film from substrate edge surface and apparatus for removing coated film.
  33. Takagi Motoshi,JPX ; Nishioka Tadashi,JPX, Photoresist coating apparatus.
  34. Chen Yung-Hsiang,TWX ; Chen Yung-Dar,TWX, Photoresist development method with reduced cycle time and improved performance.
  35. Sakai Mitsuhiro,JPX ; Nomura Masafumi,JPX ; Tsunoda Kazuaki,JPX, Processing apparatus and processing method.
  36. Hua Chang-Hwang (Palo Alto CA) Day Ding Y. S. (Sunnyvale CA), Rapid wafer thinning process.
  37. Ikeda Rikio (Kanagawa JPX), Resist film developing method and an apparatus for carrying out the same.
  38. Hasebe Keizo,JPX ; Iino Hiroyuki,JPX ; Semba Norio,JPX ; Kimura Yoshio,JPX, Resist processing apparatus.
  39. Okuda Seiichiro,JPX ; Sugimoto Kenji,JPX ; Yoshii Hiroshi,JPX, Substrate spin treating method and apparatus.
  40. Akimoto Masami (Kikuyo JPX), Supply nozzle for applying liquid resist to a semiconductor wafer.
  41. Tateyama Kiyohisa (Kumamoto JPX) Hasebe Keizo (Kofu JPX), System and method for applying a liquid.
  42. Sada Tetsuya,JPX ; Uchihira Norio,JPX ; Sakai Mitsuhiro,JPX ; Yamaguchi Kiyomitsu,JPX, Treatment device.
  43. Gurer Emir ; Lee Ed C. ; Krishna Murthy ; Reynolds Reese ; Salois John ; Cherry Royal, Yield and line width performance for liquid polymers and other materials.

이 특허를 인용한 특허 (17)

  1. Englhardt, Eric A.; Rice, Michael R.; Hudgens, Jeffrey C.; Hongkham, Steve; Pinson, Jay D.; Salek, Mohsen; Carlson, Charles; Weaver, William T; Armer, Helen R., Cartesian cluster tool configuration for lithography type processes.
  2. Rice, Mike; Hudgens, Jeffrey; Carlson, Charles; Weaver, William Tyler; Lowrance, Robert; Englhardt, Eric; Hruzek, Dean C.; Silvetti, Dave; Kuchar, Michael; Katwyk, Kirk Van; Hoskins, Van; Shah, Vinay, Cartesian robot cluster tool architecture.
  3. Ishikawa, Tetsuya; Roberts, Rick J.; Armer, Helen R.; Volfovski, Leon; Pinson, Jay D.; Rice, Michael; Quach, David H.; Salek, Mohsen S.; Lowrance, Robert; Backer, John A.; Weaver, William Tyler; Carlson, Charles; Wang, Chongyang; Hudgens, Jeffrey; Herchen, Harald; Lu, Brian, Cluster tool architecture for processing a substrate.
  4. Ishikawa, Tetsuya; Roberts, Rick J.; Armer, Helen R.; Volfovski, Leon; Pinson, Jay D.; Rice, Michael; Quach, David H.; Salek, Mohsen S.; Lowrance, Robert; Backer, John A.; Weaver, William Tyler; Carlson, Charles; Wang, Chongyang; Hudgens, Jeffrey; Herchen, Harald; Lue, Brian, Cluster tool architecture for processing a substrate.
  5. Ishikawa,Tetsuya; Roberts,Rick J.; Armer,Helen R.; Volfovski,Leon; Pinson,Jay D.; Rice,Michael; Quach,David H.; Salek,Mohsen S.; Lowrance,Robert; Backer,John A.; Weaver,William Tyler; Carlson,Charles; Wang,Chongyang; Hudgens,Jeffrey; Herchen,Harald; Lue,Brian, Cluster tool architecture for processing a substrate.
  6. Volfovski, Leon; Ishikawa, Tetsuya, Cluster tool substrate throughput optimization.
  7. Schwartz, David Eric; Rao, Ranjeet Balakrishna, Co-extruded microchannel heat pipes.
  8. Schwartz, David Eric; Rao, Ranjeet Balakrishna, Co-extruded microchannel heat pipes.
  9. Lim, Gregory; Francis, Aaron; Williams, Kenneth; Mariserla, Sandeep, Ex-situ cleaning assembly.
  10. Kawamoto, Tomokazu, Manufacturing method of semiconductor device.
  11. Kahlon, Satbir; Francis, Aaron T.; Lang, Chi-I; Lim, Gregory P.; Lowe, Jeffrey Chih-Hou; Sculac, Robert Anthony, Methods and systems for dispensing different liquids for high productivity combinatorial processing.
  12. Cobb, Corie Lynn; Solberg, Scott E., Micro-extrusion printhead with offset orifices for generating gridlines on non-square substrates.
  13. Yoo,Hong Suk; Oh,Tae Young, Printing device and method of coating a printing roll and fabricating a LCD device using the printing device.
  14. Rice, Mike; Hudgens, Jeffrey; Carlson, Charles; Weaver, William Tyler; Lowrance, Robert; Englhardt, Eric; Hruzek, Dean C.; Silvetti, Dave; Kuchar, Michael; Katwyk, Kirk Van; Hoskins, Van; Shah, Vinay, Substrate processing sequence in a cartesian robot cluster tool.
  15. Gurer, Emir; Lee, Ed C.; Krishna, Murthy; Reynolds, Reese; Salois, John; Cherry, Royal, Yield and line width performance for liquid polymers and other materials.
  16. Gurer,Emir; Lee,Ed C.; Krishna,Murthy; Reynolds,Reese; Salois,John; Cherry,Royal, Yield and line width performance for liquid polymers and other materials.
  17. Gurer,Emir; Lee,Ed C.; Krishna,Murthy; Reynolds,Reese; Salois,John; Cherry,Royal, Yield and line width performance for liquid polymers and other materials.
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