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Method and apparatus for cleaning an exhaust line in a semiconductor processing system

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B09B-003/00
출원번호 US-0608577 (2000-06-30)
발명자 / 주소
  • Pang, Ben
  • Cheung, David
  • Taylor, Jr., William N.
  • Raoux, Sebastion
  • Fodor, Mark
출원인 / 주소
  • Applied Materials Inc.
대리인 / 주소
    Townsend and Townsend and Crew
인용정보 피인용 횟수 : 25  인용 특허 : 16

초록

An apparatus for preventing particulate matter and residue build-up within a vacuum exhaust line of a semiconductor processing device. The apparatus uses RF energy to form excite the constituents of particulate matter exhausted from a semiconductor processing chamber into a plasma state such that th

대표청구항

An apparatus for preventing particulate matter and residue build-up within a vacuum exhaust line of a semiconductor processing device. The apparatus uses RF energy to form excite the constituents of particulate matter exhausted from a semiconductor processing chamber into a plasma state such that th

이 특허에 인용된 특허 (16)

  1. Sherman Robert C. (Austin TX), Baffle/settling chamber for a chemical vapor deposition equipment.
  2. Krogh Ole D. (110 Point Lobos Ave. San Francisco CA 94121), ECR plasma source for gas abatement.
  3. Obuchi Akira (Tsukuba JPX) Yoshiyama Hidenori (Tsukuba JPX) Ohi Akihiko (Tsukuba JPX) Aoyama Hyogoro (Tsukuba JPX) Ohuchi Hideo (Tsukuba JPX) Ogata Atsushi (Tsukuba JPX) Mizuno Koichi (Ibaraki JPX) M, Exhaust gas cleaner.
  4. Pollock James F. (Old Windsor GBX), Exhaust particulate filter.
  5. Kurokawa Takashi (Yokohama JPX), Exhaust system for chemical vapor deposition apparatus.
  6. Maeba Yoshiyasu (Samukawa JPX) Toyoda Satoru (Chigasaki JPX) Naruse Humio (Yokohama JPX), Fine particle collector trap for vacuum evacuating system.
  7. Pang Ben ; Cheung David ; Taylor ; Jr. William N. ; Raoux Sebastien ; Fodor Mark, Method and apparatus for cleaning a vacuum line in a CVD system.
  8. Gu Youfan, Method and apparatus for reducing build-up of material on inner surface of tube downstream from a reaction furnace.
  9. Chiu Kin-Chung R. (Scotts Valley CA), Method and system for vapor extraction from gases.
  10. Kelly Eugene P. (Spring Valley CA) Russell Stephen D. (San Diego CA) Sexton Douglas A. (San Diego CA), Method of rapid sample handling for laser processing.
  11. Raoux Sebastien ; Tanaka Tsutomu ; Kelkar Mukul ; Ponnekanti Hari ; Fairbairn Kevin ; Cheung David, Microwave apparatus for in-situ vacuum line cleaning for substrate processing equipment.
  12. Russell Stephen D. (San Diego CA) Sexton Douglas A. (San Diego CA), Photon controlled decomposition of nonhydrolyzable ambients.
  13. Lee Young H. (Somers NY), Plasma reactor for processing substrates.
  14. Blalock Guy T. (Boise ID), Removal of carbon-based polymer residues with ozone, useful in the cleaning of plasma reactors.
  15. Kanter Ira E. (Monroeville PA) Hundstad Richard L. (Forest Hills Boro PA), Stack gas emissions control system.
  16. Wang David N. (Cupertino) White John M. (Hayward) Law Kam S. (Union City) Leung Cissy (Union City) Umotoy Salvador P. (Pittsburg) Collins Kenneth S. (San Jose) Adamik John A. (San Ramon) Perlov Ilya , Thermal CVD/PECVD reactor and use for thermal chemical vapor deposition of silicon dioxide and in-situ multi-step planar.

이 특허를 인용한 특허 (25)

  1. Park, Jun-Sig, Apparatus and method for producing a semiconductor device including a byproduct control system.
  2. Cox, Michael S.; Dickinson, Colin John, Apparatus for treating an exhaust gas in a foreline.
  3. Hosch, Jimmy W.; Goeckner, Matthew J.; Whelan, Mike; Kueny, Andrew Weeks; Harvey, Kenneth C.; Thamban, P.L. Stephan, Electron beam exciter for use in chemical analysis in processing systems.
  4. Cheung, David; Fang, Haoquan; Kuo, Jack; Kalinovski, Ilia; Li, Ted; Yao, Andrew, Enhanced passivation process to protect silicon prior to high dose implant strip.
  5. Goto, Haruhiro Harry; Cheung, David, High dose implantation strip (HDIS) in H2 base chemistry.
  6. Goto, Haruhiro Harry; Cheung, David, High dose implantation strip (HDIS) in H2 base chemistry.
  7. Goto, Haruhiro Harry; Cheung, David, High dose implantation strip (HDIS) in H2 base chemistry.
  8. Carlson, David K., In situ cleaning of CVD System exhaust.
  9. Cheung, David; Li, Ted; Guha, Anirban; Ostrowski, Kirk, Low damage photoresist strip method for low-K dielectrics.
  10. Chen, David L.; Su, Yuh-Jia; Chiu, Eddie Ka Ho; Pozzoli, Maria Paola; Li, Senzi; Colangelo, Giuseppe; Alba, Simone; Petroni, Simona, Method for post-etch cleans.
  11. Chen, David; Goto, Haruhiro Harry; Martina, Martina; Greer, Frank; Alokozai, Shamsuddin, Methods for stripping photoresist and/or cleaning metal regions.
  12. Chen, David; Goto, Haruhiro Harry; Su, Martina; Greer, Frank; Alokozai, Shamsuddin, Methods for stripping photoresist and/or cleaning metal regions.
  13. Petrov,Igor; Krivts (Krayvitz),Igor; Kidron,Eitan; Eitan,Guy; Ben Dayan,Igal, Particle trap for electrostatic chuck.
  14. Thedjoisworo, Bayu Atmaja; Jacobs, Bradley Jon; Berry, Ivan; Cheung, David, Peroxide-vapor treatment for enhancing photoresist-strip performance and modifying organic films.
  15. Goto, Haruhiro Harry; Kalinovski, Ilia; Mohamed, Khalid, Photoresist strip method for low-k dielectrics.
  16. Shaviv, Roey; Ostrowski, Kirk; Cheung, David; Park, Joon; Thedjoisworo, Bayu; Lord, Patrick J., Photoresist strip processes for improved device integrity.
  17. Cheung, David; Ostrowski, Kirk J, Plasma based photoresist removal system for cleaning post ash residue.
  18. Cheung, David; Ostrowski, Kirk J., Plasma based photoresist removal system for cleaning post ash residue.
  19. Hur, Min; Kang, Woo Seok; Lee, Jae Ok, Plasma reactor for abatement of hazardous material.
  20. Tamata,Shin; Yabutani,Takashi, Process for treating perfluorides.
  21. Goto, Haruhiro Harry; Cheung, David, Simultaneous front side ash and backside clean.
  22. Nguyen, Andrew; Cheng, Wing Lau; Hanawa, Hiroji; Kats, Semyon; Ramaswamy, Kartik; Ye, Yan; Wong, Kwok Manus; Hoffman, Daniel J.; Ishikawa, Tetsuya; Lue, Brian C., Substrate support having fluid channel.
  23. Nguyen, Andrew; Cheng, Wing Lau; Hanawa, Hiroji; Kats, Semyon L.; Ramaswamy, Kartik; Ye, Yan; Wong, Kwok Manus; Hoffman, Daniel J.; Ishikawa, Tetsuya; Lue, Brian C., Substrate support having heat transfer system.
  24. Maehara,Kazutoshi; Sivaramakrishnan,Visweswaren; Wada,Kentaro; Fodor,Mark A.; Kaszuba,Andrzei, Substrate support with clamping electrical connector.
  25. Cheung, David; Fang, Haoquan; Kuo, Jack; Kalinovski, Ilia; Li, Zhao; Yao, Guhua; Guha, Anirban; Ostrowski, Kirk J., Ultra low silicon loss high dose implant strip.
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