IPC분류정보
국가/구분 |
United States(US) Patent
등록
|
국제특허분류(IPC7판) |
|
출원번호 |
US-0304379
(2002-11-26)
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우선권정보 |
JP-0343029 (1999-12-02); JP-0374383 (1999-12-28) |
발명자
/ 주소 |
- Suzuki, Satoshi
- Ohkouchi, Naoki
|
출원인 / 주소 |
|
대리인 / 주소 |
Gilster, Peter S.Greensfelder, Hemker & Gale, P.C.
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인용정보 |
피인용 횟수 :
34 인용 특허 :
4 |
초록
▼
The present invention provides a solid-state image sensor wherein the color shading is decreased, and/or a solid-state image sensor wherein the shading effect is outstanding. Moreover, the invention provides a digital camera having the solid-state image sensor. The solid-state image sensor of the pr
The present invention provides a solid-state image sensor wherein the color shading is decreased, and/or a solid-state image sensor wherein the shading effect is outstanding. Moreover, the invention provides a digital camera having the solid-state image sensor. The solid-state image sensor of the present invention has color filters and/or apertures of a light blocking layer, and the center of the color filters and/or the center of the apertures of the light blocking layer is offset with respect to the center of a light-receiving part, in the direction to the center of a valid cell area. In each photodetecting cell of a preferred solid-state image sensor, micro-lenses are further placed on the light-receiving side of the solid-state image sensor, and preferably, the center of the micro-lens is similarly offset with respect to the center of the light-receiving part. Also, the digital camera is mounted with an above-described solid-state image sensor.
대표청구항
▼
1. A solid-state image sensor comprising: a plurality of photovoltaics arrayed on the main side of a semiconductor substrate, to form a valid cell area made of a plurality of valid cells; and penetration adjusting means, for adjusting the optical penetrating amount of said incident lights accord
1. A solid-state image sensor comprising: a plurality of photovoltaics arrayed on the main side of a semiconductor substrate, to form a valid cell area made of a plurality of valid cells; and penetration adjusting means, for adjusting the optical penetrating amount of said incident lights according to the position of said photovoltaics in said valid cell area, placed on the incident side of the photovoltaics. 2. The solid-state image sensor according to claim 1, wherein said penetration adjusting means is a layer made of organic materials formed in the top part of the photovoltaics, and formed so that the optical penetrating rate is different according to the position in the valid cell area. 3. The solid-state image sensor according to claim 2, further comprising micro-lenses formed on the incident side of said photovoltaics, configured to have different optical penetrating rates which change from the peripheral part to the central part of said valid cell, due to said layer made of organic material. 4. The solid-state image sensor according to claim 2, further comprising micro-lenses placed above said photovoltaics, and wherein said layer made of organic materials is a flattening layer between said photovoltaics and said micro-lenses. 5. The solid-state image sensor according to claim 1, wherein: said valid cell area is divided into a plurality of blocks such as concentric rectangles, concentric circles or strips; and said penetration adjusting means adjusting the optical penetrating amount of light reaching the same block to be uniform, and to have a grater optical penetrating amount, the closer to the outermost part of said valid cell area the block is. 6. The solid-state image sensor according to claim 1, wherein: said penetrating adjusting means is positioned on the incident side of said valid cell area, and is optical penetrating rate controlling means capable of controlling the optical penetrating rate. 7. The solid-state image sensor according to claim 6, wherein said optical penetrating rate controlling means controls the optical penetrating rate based on a signal from a brightness sensor mounted around said valid cell area. 8. The solid-state image sensor according to claim 6, wherein said optical penetrating rate controlling means is a layer using electro-chromic elements. 9. The solid-state image sensor according to claim 1, wherein said penetration adjusting means respectively adjusts the optical penetrating amount for each photodetecting cell. 10. A digital camera comprising a solid-state image sensor, having: a plurality of photovoltaics arrayed on the main side of a semiconductor substrate, to form a valid cell area made of a plurality of valid cells; and penetration adjusting means, for adjusting the optical penetrating amount of the said incident light according to the position of said photovoltaics in said valid cell area, placed on the incident side of said photovoltaics. 11. A digital camera comprising: a camera lens; and a solid-state image sensor, having: a plurality of photovoltaics arrayed on the main side of a semiconductor substrate, to form a valid cell area made of a plurality of valid cells; and penetration adjusting means, for adjusting the optical penetrating amount of the said incident light according to the position of said photovoltaics in said valid cell area, placed on the incident side of said photovoltaics, and placed between said solid-state image sensor and said camera lens.
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