초록 ▼

A fire suppression sprinkler system (10), and method for installing a sprinkler system (10)in new and existing buildings. The system includes a manifold (12) that supplies fire-suppression fluid to a set of wall-mounted sprinkler heads (14) via flexible sprinkler head conduits (16) through an unobst

A fire suppression sprinkler system (10), and method for installing a sprinkler system (10)in new and existing buildings. The system includes a manifold (12) that supplies fire-suppression fluid to a set of wall-mounted sprinkler heads (14) via flexible sprinkler head conduits (16) through an unobstructed path (18). The installation and retrofit methods include determining the location of the sprinkler head (14), installing the manifold (12), making sure that there is an unobstructed path (18) between the manifold (12) and the sprinkler head location, running the conduit (16) through the path (18) by snaking it where necessary through the wall (50) to which the sprinkler head (14) is mounted, connecting the conduit (16) to the manifold (12) and sprinkler head (14), and then mounting the sprinkler head (14).

대표청구항 ▼

A fire suppression sprinkler system (10), and method for installing a sprinkler system (10)in new and existing buildings. The system includes a manifold (12) that supplies fire-suppression fluid to a set of wall-mounted sprinkler heads (14) via flexible sprinkler head conduits (16) through an unobst

A fire suppression sprinkler system (10), and method for installing a sprinkler system (10)in new and existing buildings. The system includes a manifold (12) that supplies fire-suppression fluid to a set of wall-mounted sprinkler heads (14) via flexible sprinkler head conduits (16) through an unobstructed path (18). The installation and retrofit methods include determining the location of the sprinkler head (14), installing the manifold (12), making sure that there is an unobstructed path (18) between the manifold (12) and the sprinkler head location, running the conduit (16) through the path (18) by snaking it where necessary through the wall (50) to which the sprinkler head (14) is mounted, connecting the conduit (16) to the manifold (12) and sprinkler head (14), and then mounting the sprinkler head (14). ., 370/206; US-5113445, 19920500, Wang, 380/051; US-5146457, 19920900, Veldhuis et al., 370/523; US-5181786, 19930100, Hujink, 400/061; US-5200822, 19930400, Bronfin et al., 725/022; US-5213337, 19930500, Sherman, 463/040; US-5259025, 19931100, Monroe, 705/075; US-5280537, 19940100, Sugiyama et al., 370/529; US-5288976, 19940200, Citron, 235/375; US-5295203, 19940300, Krause et al., 382/248; US-5315098, 19940500, Tow, 235/494; US-5374976, 19941200, Spannenburg, 399/366; US-5379345, 19950100, Greenberg, 455/002.01; US-5416307, 19950500, Danek et al., 235/449; US-5428607, 19950600, Hiller et al., 370/352; US-5428731, 19950600, Powers, 707/501.1; US-5463209, 19951000, Figh, 235/383; US-5469222, 19951100, Sprague, 348/580; US-5469506, 19951100, Berson et al., 713/186; US-5493677, 19960200, Balogh et al., 707/104.1; US-5495581, 19960200, Tsai, 707/526; US-5496071, 19960300, Walsh, 283/070; US-5502576, 19960300, Ramsay et al., 358/403; US-5521722, 19960500, Colvill et al., 358/500; US-5530759, 19960600, Braudaway et al., 380/054; US-5530852, 19960600, Meske, Jr. et al., 709/206; US-5568550, 19961000, Ur, 382/306; US-5572433, 19961100, Falconer et al., 700/127; US-5594226, 19970100, Steger, 235/379; US-5598526, 19970100, Daniel et al., 345/540; US-5613004, 19970300, Cooperman et al., 380/028; US-5617119, 19970400, Briggs et al., 358/001.1; US-5636292, 19970600, Rhoads, 382/232; US-5638443, 19970600, Stefik, 705/054; US-5640193, 19970600, Wellner, 725/100; US-5646999, 19970700, Saito, 705/054; US-5652626, 19970700, Kawakami et al., 348/463; US-5659164, 19970800, Schmid, 235/375; US-5664018, 19970900, Leighton, 380/054; US-5665951, 19970900, Newman et al., 235/375; US-5668636, 19970900, Beach et al., 358/296; US-5671282, 19970900, Wolff et al., 713/179; US-5673316, 19970900, Auerbach et al., 705/051; US-5687236, 19971100, Moskowitz et al., 380/028; US-5710636, 19980100, Curry, 358/003.28; US-5719939, 19980200, Tel, 713/179; US-5721788, 19980200, Powell et al., 382/100; US-5727092, 19980300, Sandford, II et al., 382/235; US-5735547, 19980400, Morelle et al., 283/067; US-5740244, 19980400, Indeck et al., 713/176; US-5742845, 19980400, Wagner, 395/821; US-5745604, 19980400, Rhoads, 382/232; US-5761686, 19980600, Bloomberg, 382/232; US-5768426, 19980600, Rhoads, 382/232; US-5778102, 19980700, Sandford et al., 382/239; US-5790693, 19980800, Graves et al., 382/135; US-5790697, 19980800, Munro et al., 382/135; US-5804803, 19980900, Cragun et al., 235/375; US-5809317, 19980900, Kogan et al., 767/501.1; US-5817205, 19981000, Kaule, 382/294; US-5818441, 19981000, Throckmorton et al., 345/717; US-5819289, 19981000, Sanford, II et al., 707/104.1; US-5825871, 19981000, Mark, 379/357.03; US-5825892, 19981000, Braudaway et al., 380/051; US-5838458, 19981100, Tsai, 358/402; US-5841978, 19981100, Rhoads, 709/217; US-5848144, 19981200, Ahrens, 379/219; US-5848155, 19981200, Cox, 380/004; US-5848413, 19981200, Wolff, 707/010; US-5852673, 19981200, Young, 382/164; US-5857038, 19990100, Owada et al., 382/284; US-5862218, 19990100, Steinberg, 713/176; US-5869819, 19990200, Knowles et al., 235/375; US-5871615, 19990200, Harris, 162/140; US-5872589, 19990200, Morales, 725/024; US-5875249, 19990200, Mintzer et al., 380/054; US-5893101, 19990400, Balogh et al., 707/100; US-5898779, 19990400, Squilla et al., 713/176; US-5900608, 19990500, Iida, 235/381; US-5902353, 19990500, Reber et al., 709/219; US-5903729, 19990500, Reber et al., 709/219; US-5905248, 19990500, Russell et al., 235/462.15; US-5905251, 19990500, Knowles, 235/472.01; US-5905810, 19990500, Jones et al., 382/135; US-5913210, 19990600, Call, 707/004; US-5915027, 19990600, Cox et al., 380/054; US-5930767, 19990700, Reber et al., 705/026; US-5932863, 19990800, Rathus et al., 235/462.15; US-5933798, 19990800, Linnartz, 702/191; US-5933829, 19990800, Durst et al., 707/010; US-5938726, 19990800, Reber et al., 709/217; US-5938727, 19990800, Ikeda, 709/218; US-5939695, 19990800, Nelson, 235/383; US-5940595 , 19990800, Reber et al., 709/227; US-5949055, 19990900, Fleet et al., 235/469; US-5950173, 19990900, Perkowski, 705/026; US-5963916, 19991000, Kaplan, 705/026; US-5971277, 19991000, Cragun et al., 235/462.01; US-5974141, 19991000, Saito, 705/052; US-5974548, 19991000, Adams, 713/200; US-5978773, 19991100, Hudetz et al., 705/023; US-5979757, 19991100, Tracy et al., 235/383; US-5983218, 19991100, Syeda-Mahmoo, 707/003; US-5991426, 19991100, Cox et al., 382/100; US-6005501, 19991200, Wolosewicz, 341/052; US-6035177, 20000300, Moses et al., 725/022; US-6052486, 20000400, Knowlton et al., 382/232; US-6069914, 20000500, Cox, 375/150; US-6122403, 20000900, Rhoads, 382/233; US-6324574, 20000900, Rhoads, 709/218; US-6166750, 20001200, Negishi, 347/131; US-6181802, 20010100, Todd, 382/100; US-6226387, 20010500, Tewfik et al., 382/100; US-6240121, 20010500, Senoh, 375/130; US-6263087, 20010700, Miller, 375/242; US-6266430, 20010700, Rhoads, 382/100; US-6272176, 20010800, Srinivasan, 375/240; US-6311214, 20011000, Rhoads, 709/217; US-6400826, 20020600, Chen et al., 382/100 � of the asphaltenes of said mixture therefrom; and predicting directly the flocculation threshold from the solubility index of the asphaltenes of said mixture and from a thermodynamic equilibrium model. 2. A method as claimed in claim 1, characterized in that the variation of refraction index (nA) is determined by extrapolation from measured refraction index values obtained for several solutions of relatively low concentration of these asphaltenes in solvents. 3. A device for predicting the flocculation threshold of asphaltenes contained in a given hydrocarbon mixture, characterized in that it comprises a refractometer (2) and a system (1, 3) suited to experimentally determine, under predetermined thermodynamic conditions, the refraction index (nA) of asphaltenes, to determine the variations of solubility index (δ) in connection with variations of the refraction index of known hydrocarbon constituents including light hydrocarbons and of several known reference asphaltenes, to deduce therefrom a correlation relation modelling these variations of solubility index (δ), and to apply this correlation relation to a thermodynamic equilibrium model to directly predict the flocculation threshold of the asphaltenes contained in said hydrocarbon mixture. 4. A device as claimed in claim 3, characterized in that the system comprises a programmed computer (3). 5. A device as claimed in claim 3, characterized in that the system comprises a programmed computer (3) and a device (1) for bringing asphaltenes into solution in a solvent at variable concentrations. is arranged on the mounting surface and a second portion is arranged on the column. 7. The exposure apparatus according to claim 6, wherein concentrations of light-absorbing substance in the illumination system and the projection system are set to be lower than those in the first and second stage chambers. 8. The exposure apparatus according to claim 6, further comprising a first transport system which transports the first object into the first stage chamber, a first transport chamber in which the first transport system is accommodated and which is connected to the first stage chamber, a second transport system which transports the second object into the second stage chamber, a second transport chamber in which the second transport system is accommodated and which is connected to the second stage chamber, and a sub-frame to which the first and second transport chambers are detachably installed respectively and which is provided apart from the frame. 9. The exposure apparatus according to claim 8, further comprising a temperature-adjusting unit which adjusts the temperature of the second object before the second object is transported into the second stage chamber. 10. The exposure apparatus according to claim 8, wherein concentrations of light-absorbing substance in the first and second stage chambers are set to be lower than those in the first and second transport chambers. 11. The exposure apparatus according to claim 2, wherein the projection system is detachably installed to the frame independently of the first and second stage chambers. 12. The exposure apparatus according to claim 2, wherein the second stage system has a plurality of movable members which hold different second objects respectively and which are movable independently, and wherein the exposure apparatus comprises an interferometer system which measures positional information for the respective movable members independently at a first position in which the second object is exposed with the exposure light beam via the first object and at a second position in which a mark of the second object is detected. 13. The exposure apparatus according to claim 1, wherein: when the first object and the second object are synchronously moved in order to scanning-expose the second object with the exposure light beam via the first object, one of the first stage system and the second stage system moves the one of the first object and the second object at a scanning velocity which is determined by a control system so that exposure time is substantially shortest depending on a rate of acceleration during movement of the one of the first object and the second object. 14. The exposure apparatus according to claim 13, wherein when LY represents a width of a rectangle area in a scanning direction to be illuminated with the exposure light beam during the scanning exposure for the first object or the second object, D represents a width of an illumination area in the scanning direction to be exposed with the exposure light beam for the first object or the second object, α represents the rate of acceleration, and V represents the scanning velocity, the scanning velocity V is determined so that a value of ΔT, which is given by ΔT=2·V/α+(LY+D)/V, is substantially minimum. 15. A method for producing a device, comprising the step of transferring a mask pattern onto a workpiece by using the exposure apparatus as defined in claim 1. 16. An exposure apparatus for exposing a second object with an exposure light beam passing through a first object, the exposure apparatus comprising: a frame; a first stage chamber which accommodates a first stage system which carries the first object while holding the first object, the first stage chamber being detachably installed to the frame; a second stage chamber which accommodates a second stage system which carries the second object while holding the second object, the second stage chamber being detachably installed to the frame; a projec tion system which projects an image of a pattern on the first object onto the second object, the projection system being installed to the frame; a gas supply apparatus which supplies a gas for transmitting the exposure light beam therethrough, to the inside of the first stage chamber, the second stage chamber, and the projection system respectively; a first covering member which seals space between the first stage chamber and the projection system; and a second covering member which seals space between the projection system and the second stage chamber. 17. The exposure apparatus according to claim 16, wherein the second stage system moves the different second objects independently, and wherein the frame comprises a base member on which the second stage system is placed, and a column which is arranged on a mounting surface on which the base member is mounted via a vibration-preventive mechanism and to which the projection system is installed. 18. The exposure apparatus according to claim 17, further comprising an illumination system which illuminates the first object with the exposure light beam and of which a first portion is arranged on the mounting surface and a second portion is arranged on the column. 19. The exposure apparatus according to claim 18, wherein concentrations of light-absorbing substance in the illumination system and the projection system are set to be lower than those in the first and second stage chambers. 20. The exposure apparatus according to claim 16, wherein the first and second stage chambers are detachably installed to the frame independently. 21. An exposure apparatus for exposing a second object with an exposure light beam passing through a first object, the exposure apparatus comprising: a frame; a first stage chamber which accommodates a first stage system which carries the first object while holding the first object, the first stage chamber being detachably installed to the frame; a second stage chamber which accommodates a second stage system which carries the second object while holding the second object, the second stage chamber being detachably installed to the frame; a transport system which transports the second object into the second stage chamber; a transport chamber in which the transport system is accommodated; and a gas supply apparatus which supplies a gas for transmitting the exposure light beam therethrough, to the inside of the first stage chamber, the second stage chamber, and the transport chamber respectively. 22. The exposure apparatus according to claim 21, wherein the gas supply apparatus supplies the gas so that a concentration of the gas in the second stage chamber is higher than that in the transport chamber. 23. The exposure apparatus according to claim 22, further comprising gas supply tubes which connect the first stage chamber, the second stage chamber, and the transport chamber to the gas supply apparatus respectively, solenoid-operated valves which are provided for the respective gas supply tubes, and a gas control system which controls operation of the solenoid-operated valves. 24. The exposure apparatus according to claim 22, further comprising a sensor which measures a concentration of a light-absorbing substance in the first stage chamber, the second stage chamber, and the transport chamber, wherein the gas supply apparatus supplies the gas to the first stage chamber, the second stage chamber, and the transport chamber on the basis of the concentration of the light-absorbing substance measured by the sensor. 25. The exposure apparatus according to claim 21, wherein the transport chamber comprises a closeable opening through which the second object passes in addition to an opening through which the second object is carried into or from the second stage chamber. 26. The exposure apparatus according to claim 21, wherein the transport chamber comprises a first chamber which communicates with the second stage chamber via a first opening and a second chamber which communicates with the first chamber via a second opening which is different than the first opening, wherein the transport system transports the second object via the first and second openings. 27. The exposure apparatus according to claim 26, further comprising an opening/closing unit which controls the first opening and the second opening independently so as to prevent the first opening and the second opening from opening simultaneously. 28. The exposure apparatus according to claim 26, further comprising an opening/closing unit which controls the first opening and the second opening respectively so that the first opening has a narrower opening area than that of the second opening when the second object passes through the first opening and the second opening. 29. The exposure apparatus according to claim 21, wherein the first and second stage chambers are detachably installed to the frame independently. 30. An exposure apparatus for exposing a second object with an exposure light beam passing through a first object, the exposure apparatus comprising: a frame; a first stage chamber which accommodates a first stage system which carries the first object while holding the first object, the first stage chamber being detachably installed to the frame; a second stage chamber which accommodates a second stage system which carries the second object while holding the second object, the second stage chamber being detachably installed to the frame; a first transport system which transports the first object into the first stage chamber; a first transport chamber in which the first transport system is accommodated and which is connected to the first stage chamber; a second transport system which transports the second object into the second stage chamber; a second transport chamber to which the second transport system is accommodated and which is connected to the second stage chamber; and a sub-frame in which the first and second transport chambers are detachably installed respectively and which is provided apart from the frame. 31. The exposure apparatus according to claim 30, further comprising a gas supply apparatus which supplies a gas, of which the transmissivity with respect to the exposure light beam is higher than that of the atmospheric air, into the first and second stage chambers and the first and second transport chambers, respectively. 32. The exposure apparatus according to claim 31, wherein a concentration of light-absorbing substance in the first stage chamber is set to be lower than that in the first transport chamber and a pressure in the first stage chamber is set to be higher than that in the first transport chamber, and a concentration of light-absorbing substance in the second stage chamber is set to be lower than that in the second transport chamber and a pressure in the second stage chamber is set to be higher than that in the second transport chamber. 33. The exposure apparatus according to claim 30, wherein the second stage system independently moves different second objects respectively, and wherein the frame comprises a base member on which the second stage system is placed, and a column which is arranged on a mounting surface on which the base member is mounted via a vibration-preventive mechanism and to which the projection system is installed. 34. The exposure apparatus according to claim 33, further comprising an illumination system which illuminates the first object with the exposure light beam and of which a first portion is arranged on the mounting surface and a second portion is arranged on the column. 35. The exposure apparatus according to claim 34, wherein concentrations of light-absorbing substance in the illumination system and the projection system are set to be lower than those in the first and second stage chambers. 36. The exposure apparatus according to claim 30, wherein the first and second stage chambers are detachably installed to the frame independently. 37. The exp