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Template for room temperature, low pressure micro-and nano-imprint lithography 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G03C-001/76
  • G03F-007/00
  • B41M-005/00
출원번호 US-0976681 (2001-10-12)
발명자 / 주소
  • Bailey, Todd
  • Choi, Byung J.
  • Colburn, Matthew
  • Sreenivasan, S. V.
  • Willson, C. Grant
  • Ekerdt, John
출원인 / 주소
  • Board of Regents, The University of Texas System
대리인 / 주소
    Brooks, Kenneth C.
인용정보 피인용 횟수 : 263  인용 특허 : 67

초록

Described are imprint lithography templates, methods of forming and using the templates, and a template holder device. An imprint lithography template may include a body with a plurality of recesses on a surface of the body. The body may be of a material that is substantially transparent to activati

대표청구항

Described are imprint lithography templates, methods of forming and using the templates, and a template holder device. An imprint lithography template may include a body with a plurality of recesses on a surface of the body. The body may be of a material that is substantially transparent to activati

이 특허에 인용된 특허 (67)

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이 특허를 인용한 특허 (263)

  1. Hyde,Roderick A.; Myhrvold,Nathan P., Active mask lithography.
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  12. Cherala,Anshuman; Sreenivasan,Sidlgata V.; Schumaker,Norman E., Applying imprinting material to substrates employing electromagnetic fields.
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