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Method of fabrication of low dielectric constant porous metal silicate films 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • H01L-021/31
  • H01L-021/469
출원번호 US-0323988 (2002-12-17)
발명자 / 주소
  • Morris, Michael A.
  • Ryan, Kevin M.
  • Holmes, Justin D.
  • Lawton, Willie J.
출원인 / 주소
  • Intel Corporation
대리인 / 주소
    Wheeler, Cyndi M.
인용정보 피인용 횟수 : 59  인용 특허 : 8

초록

The present provides a method for forming a porous metal silicate dielectric layer having a dielectric constant of less than 2.0. The porous metal silicate dielectric formed by embodiments of the present invention is suitable for integration into the microelectric device manufacturing process. By ca

대표청구항

The present provides a method for forming a porous metal silicate dielectric layer having a dielectric constant of less than 2.0. The porous metal silicate dielectric formed by embodiments of the present invention is suitable for integration into the microelectric device manufacturing process. By ca

이 특허에 인용된 특허 (8)

  1. Berry, III, Ivan Louis; Chung, Kyuha; Han, Qingyuan; Liu, Youfan; Moyer, Eric Scott; Spaulding, Michael John, High modulus, low dielectric constant coatings.
  2. Leung Roger Yu-Kwan ; Case Suzanne, Low dielectric constant porous films.
  3. Beck Jeffrey S. (Princeton NJ), Method for synthesizing mesoporous crystalline material.
  4. Smith Douglas M. ; Johnston Gregory P. ; Ackerman William C. ; Jeng Shin-Puu, Nanoporous dielectric thin film surface modification.
  5. Berry, III, Ivan L.; Bridgewater, Todd; Chen, Wei; Han, Qingyuan; Moyer, Eric S.; Spaulding, Michael J.; Waldfried, Carlo, Plasma curing process for porous silica thin film.
  6. Brinker C. Jeffrey ; Anderson Mark T. ; Ganguli Rahul ; Lu Yunfeng, Process to form mesostructured films.
  7. Chu Cynthia T. (Princeton Junction NJ) Kresge Charles T. (West Chester PA) Simmons Kenneth G. (Williamstown NJ), Synthesis of mesoporous aluminosilicate.
  8. Kresge Charles T. (West Chester PA) Leonowicz Michael E. (Medford Lakes NJ) Roth Wieslaw J. (Sewell NJ) Vartuli James C. (West Chester PA), Synthetic mesoporous crystaline material.

이 특허를 인용한 특허 (59)

  1. Millward, Dan B.; Westmoreland, Donald; Sandhu, Gurtej, Alternating self-assembling morphologies of diblock copolymers controlled by variations in surfaces.
  2. Millward, Dan B.; Westmoreland, Donald; Sandhu, Gurtej, Alternating self-assembling morphologies of diblock copolymers controlled by variations in surfaces.
  3. Millward, Dan B.; Westmoreland, Donald; Sandhu, Gurtej, Alternating self-assembling morphologies of diblock copolymers controlled by variations in surfaces.
  4. Kloster, Grant M.; Leu, Jihperng, Bonding a metal component to a low-k dielectric material.
  5. Wai, Chien M.; Ohde, Hiroyuki; Kramer, Stephen J., Compositions comprising supercritical carbon dioxide and metallic compounds.
  6. Millward, Dan B., Crosslinkable graft polymer non preferentially wetted by polystyrene and polyethylene oxide.
  7. Millward, Dan B., Crosslinkable graft polymer non-preferentially wetted by polystyrene and polyethylene oxide.
  8. Millward, Dan B., Crosslinkable graft polymer non-preferentially wetted by polystyrene and polyethylene oxide.
  9. Millward, Dan B., Extensions of self-assembled structures to increased dimensions via a “bootstrap” self-templating method.
  10. Millward, Dan B., Extensions of self-assembled structures to increased dimensions via a “bootstrap” self-templating method.
  11. Millward, Dan B., Extensions of self-assembled structures to increased dimensions via a “bootstrap” self-templating method.
  12. Wai, Chien M.; Ohde, Hiroyuki; Kramer, Stephen J., Formation of insulator oxide films with acid or base catalyzed hydrolysis of alkoxides in supercritical carbon dioxide.
  13. Millward, Dan B.; Westmoreland, Donald, Graphoepitaxial self-assembly of arrays of downward facing half-cylinders.
  14. Millward, Dan B.; Westmoreland, Donald, Graphoepitaxial self-assembly of arrays of downward facing half-cylinders.
  15. Goodner, Michael D., Low-k dielectric layer formed from aluminosilicate precursors.
  16. Kiryu, Hideki; Aoyama, Shintaro; Takahashi, Tsuyoshi; Shinriki, Hiroshi, Method of forming a dielectric film.
  17. Millward, Dan B.; Sandhu, Gurtej S., Method to produce nanometer-sized features with directed assembly of block copolymers.
  18. Navrotsky, Alexandra; Parikh, Atul Navinchandra, Methods for removing organic compounds from nano-composite materials.
  19. Millward, Dan B.; Quick, Timothy A., Methods of forming a nanostructured polymer material including block copolymer materials.
  20. Millward, Dan B., Methods of forming a stamp and a stamp.
  21. Millward, Dan B., Methods of forming an array of openings in a substrate, and related methods of forming a semiconductor device structure.
  22. Millward, Dan B.; Sills, Scott E., Methods of forming block copolymers, and block copolymer compositions.
  23. Hendricks, Nicholas; Olson, Adam L.; Brown, William R.; Eom, Ho Seop; Chen, Xue; Jain, Kaveri; Schuldenfrei, Scott, Methods of forming nanostructures including metal oxides.
  24. Sills, Scott E.; Millward, Dan B., Methods of forming semiconductor device structures.
  25. Millward, Dan B.; Quick, Timothy A.; Greeley, J. Neil, Methods of forming semiconductor device structures including metal oxide structures.
  26. Khurana, Ranjan; Lugani, Gurpreet S.; Millward, Dan B., Methods of forming semiconductor device structures, and related semiconductor device structures.
  27. Sills, Scott E.; Millward, Dan B., Methods of forming semiconductor device structures, and related structures.
  28. Regner, Jennifer Kahl, Methods of improving long range order in self-assembly of block copolymer films with ionic liquids.
  29. Regner, Jennifer Kahl, Methods of improving long range order in self-assembly of block copolymer films with ionic liquids.
  30. Regner, Jennifer Kahl, Methods of improving long range order in self-assembly of block copolymer films with ionic liquids and materials produced therefrom.
  31. Wai, Chien M.; Ohde, Hiroyuki; Kramer, Stephen J., Methods of increasing the solubility of materials in supercritical carbon dioxide.
  32. Marsh, Eugene P.; Millward, Dan B., Methods of patterning a substrate including multilayer antireflection coatings.
  33. Millward, Dan B., Multi-layer method for formation of registered arrays of cylindrical pores in polymer films.
  34. Millward, Dan B.; Stuen, Karl, One-dimensional arrays of block copolymer cylinders and applications thereof.
  35. Millward, Dan B.; Stuen, Karl, One-dimensional arrays of block copolymer cylinders and applications thereof.
  36. Millward, Dan B., Polymer materials for formation of registered arrays of cylindrical pores.
  37. Millward, Dan B.; Westmoreland, Donald L., Polymeric materials in self-assembled arrays and semiconductor structures comprising polymeric materials.
  38. Millward, Dan B.; Westmoreland, Donald L., Polymeric materials in self-assembled arrays and semiconductor structures comprising polymeric materials.
  39. Fujii, Nobutoshi; Nakayama, Takahiro; Kohmura, Kazuo; Tanaka, Hirofumi, Precursor composition for porous thin film, method for preparation of the precursor composition, porous thin film, method for preparation of the porous thin film, and semiconductor device.
  40. Flores Sanchez, Patricia; Dominguez Esquivel, Jose Manuel; Aburto Anell, Jorge Arturo, Process for obtaining adsorbent material based on porous silicates for reduction of sulfur and nitrogen in oil fractions.
  41. Millward, Dan B.; Marsh, Eugene P., Registered structure formation via the application of directed thermal energy to diblock copolymer films.
  42. Millward, Dan B.; Marsh, Eugene P., Registered structure formation via the application of directed thermal energy to diblock copolymer films.
  43. Hendricks, Nicholas; Olson, Adam L.; Brown, William R.; Eom, Ho Seop; Chen, Xue; Jain, Kaveri; Schuldenfrei, Scott, Self-assembled nanostructures including metal oxides and semiconductor structures comprised thereof.
  44. Chikaki, Shinichi; Nakayama, Takahiro, Semiconductor device and method of manufacturing semiconductor device.
  45. Millward, Dan B.; Quick, Timothy A.; Greeley, J. Neil, Semiconductor device structures including metal oxide structures.
  46. Millward, Dan B.; Quick, Timothy A.; Greeley, J. Neil, Semiconductor structures including polymer material permeated with metal oxide.
  47. Millward, Dan B.; Sandhu, Gurtej S., Stamps and methods of forming a pattern on a substrate.
  48. Millward, Dan B., Sub-10 NM line features via rapid graphoepitaxial self-assembly of amphiphilic monolayers.
  49. Millward, Dan B., Sub-10 NM line features via rapid graphoepitaxial self-assembly of amphiphilic monolayers.
  50. Millward, Dan B., Sub-10 nm line features via rapid graphoepitaxial self-assembly of amphiphilic monolayers.
  51. Millward, Dan B., Sub-10 nm line features via rapid graphoepitaxial self-assembly of amphiphilic monolayers.
  52. Millward, Dan B.; Westmoreland, Donald L.; Sandhu, Gurtej S., Templates including self-assembled block copolymer films.
  53. Millward, Dan B.; Quick, Timothy, Thermal anneal of block copolymer films with top interface constrained to wet both blocks with equal preference.
  54. Millward, Dan B.; Quick, Timothy, Thermal anneal of block copolymer films with top interface constrained to wet both blocks with equal preference.
  55. Millward, Dan B.; Quick, Timothy A., Thermal anneal of block copolymer films with top interface constrained to wet both blocks with equal preference.
  56. Mahmood, Kifah Kamil; Lee, Gangok; Pugliese, Vincent Joseph Alfred, Thick film dielectric structure for thick dielectric electroluminescent displays.
  57. Millward, Dan B., Two-dimensional arrays of holes with sub-lithographic diameters formed by block copolymer self-assembly.
  58. Millward, Dan B., Two-dimensional arrays of holes with sub-lithographic diameters formed by block copolymer self-assembly.
  59. Boyanov,Boyan; Kloster,Grant M.; Goodner,Michael D., Using zeolites to improve the mechanical strength of low-k interlayer dielectrics.
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