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Delivery of solid chemical precursors 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • A01G-013/06
출원번호 US-0976176 (2001-10-11)
발명자 / 주소
  • Sandhu, Gurtej S.
출원인 / 주소
  • Micron Technology, Inc.
대리인 / 주소
    Dinsmore & Shohl LLP
인용정보 피인용 횟수 : 19  인용 특허 : 22

초록

Systems and methods are provided for delivering solid precursors in deposition processes. A flow monitor is used to measure and regulate the flow of vaporized solid precursor material from a vaporization chamber to a deposition chamber. The flow monitor chokes the supply of vapor into deposition cha

대표청구항

Systems and methods are provided for delivering solid precursors in deposition processes. A flow monitor is used to measure and regulate the flow of vaporized solid precursor material from a vaporization chamber to a deposition chamber. The flow monitor chokes the supply of vapor into deposition cha

이 특허에 인용된 특허 (22)

  1. Sapru Krishna (Troy MI) Krisko Annette J. (Highland MI) Beglau David (Oxford MI) Chao Benjamin S. (Troy MI), Apparatus for microwave plasma enhanced physical/chemical vapor deposition.
  2. Miyake Koji,JPX ; Kuwahara Hajime,JPX ; Hayashi Tsukasa,JPX, Apparatus for vaporizing liquid raw material and method of cleaning CVD apparatus.
  3. Hsu Sheng Teng ; Peng Chien Hsiung ; Lee Jong Jan, Chemical vapor deposition of PB5GE3O11 thin film for ferroelectric applications.
  4. Lang Chi-I ; Ma Yeming Jim ; Chang Fong ; Lee Peter Wai-Man ; Jeng Shin-Puu,TWX ; Cheung David, Chemical vapor deposition of a copolymer of p-xylylene and a multivinyl silicon/oxygen comonomer.
  5. Sekimoto Eiichi,JPX ; Tanoue Mitsuhiro,JPX, Heating apparatus for heating an object to be processed.
  6. Wen Cheng P. (Mission Viejo CA) Rolph Randy K. (Palos Verdes Estates CA) Zielinski Timothy T. (Torrance CA), MOCVD reactor system for indium antimonide epitaxial material.
  7. Horne Craig R. ; Kumar Sujeet ; Buckley James P. ; Bi Xiangxin, Medal vanadium oxide particles.
  8. Paz de Araujo Carlos A. ; McMillan Larry D. ; Solayappan Narayan ; Bacon Jeffrey W., Method and apparatus for preparing integrated circuit thin films by chemical vapor deposition.
  9. Senateur Jean-Pierre,FRX ; Madar Roland,FRX ; Weiss Francois,FRX ; Thomas Olivier,FRX ; Abrutis Adulfas,FRX, Method and device for introducing precursors into chamber for chemical vapor deposition.
  10. Loan James F. ; Salerno Jack P., Method for chemical vapor deposition of a material on a substrate.
  11. Shinagawa Keisuke,JPX ; Fujimura Shuzo,JPX ; Matoba Yuuji,JPX ; Nakano Yoshimasa,JPX ; Takeuchi Tatsuya,JPX ; Miyanaga Takeshi,JPX, Method for controlling apparatus for supplying steam for ashing process.
  12. Ricco Antonio J. ; Manginell Ronald P. ; Huber Robert J., Method for localized deposition of noble metal catalysts with control of morphology.
  13. Visser Jan (Eindhoven NLX), Method of providing a substrate with a surface layer from a vapor.
  14. Partus Fred Paul, Methods of and systems for vapor delivery control in optical preform manufacture.
  15. Roeder Jeffrey ; Van Buskirk Peter C., Multiple vaporizer reagent supply system for chemical vapor deposition utilizing dissimilar precursor compositions.
  16. Loan James ; LeFavour John ; Lischer D. Jeffrey ; Sullivan Laura A. ; Planchard David, Pressure-based mass flow controller.
  17. Atwell David R., Solid precursor injector apparatus.
  18. Atwell David R., Solid precursor injector apparatus and method.
  19. Hinkle Luke D. ; Lischer D. Jeffrey, System for delivering a substantially constant vapor flow to a chemical process reactor.
  20. Partus Fred P. (Cobbs County GA), Vapor delivery control system and method.
  21. Partus Fred P. (Atlanta GA), Vapor delivery system and method.
  22. Atwell David R. (Boise ID) Westmoreland Donald L. (Boise ID), Vapor delivery system for solid precursors and method regarding same.

이 특허를 인용한 특허 (19)

  1. Chu, Schubert S.; Marcadal, Christophe; Ganguli, Seshadri; Nakashima, Norman M.; Wu, Dien-Yeh, Ampoule with a thermally conductive coating.
  2. Danner, Guy M.; Tarasov, Vladimir S.; Kane, Peter E.; Madden, Peter G.; Gates, Holly G.; Sachs, Emanuel M., Apparatus for depositing a thin layer of polymer resist on a substrate.
  3. Nakashima, Norman; Marcadal, Christophe; Ganguli, Seshadri; Ma, Paul; Chu, Schubert S., Chemical delivery apparatus for CVD or ALD.
  4. Nakashima, Norman; Marcadal, Christophe; Ganguli, Seshadri; Ma, Paul; Chu, Schubert S., Chemical delivery apparatus for CVD or ALD.
  5. Horsky, Thomas N.; Milgate, III, Robert W., Controlling the flow of vapors sublimated from solids.
  6. Woelk, Egbert; DiCarlo, Ronald L., Evaporation vessel apparatus and method.
  7. Gregg, John N.; Battle, Scott L.; Banton, Jeffrey I.; Naito, Donn K.; Laxman, Ravi, Method and apparatus to help promote contact of gas with vaporized material.
  8. Gregg, John N.; Battle, Scott L.; Banton, Jeffrey I.; Naito, Donn K.; Laxman, Ravi K., Method and apparatus to help promote contact of gas with vaporized material.
  9. Gregg, John N.; Battle, Scott L.; Banton, Jeffrey I.; Naito, Donn K.; Laxman, Ravi K., Method and apparatus to help promote contact of gas with vaporized material.
  10. Gregg, John N.; Battle, Scott L.; Banton, Jeffrey I.; Naito, Donn K.; Laxman, Ravi K., Method and apparatus to help promote contact of gas with vaporized material.
  11. Gregg, John N.; Battle, Scott L.; Banton, Jeffrey I.; Naito, Donn K.; Laxman, Ravi K., Method and apparatus to help promote contact of gas with vaporized material.
  12. Suzuki,Kenji, Method and integrated system for purifying and delivering a metal carbonyl precursor.
  13. Leusink, Gerrit J., Method and system for depositing a layer from light-induced vaporization of a solid precursor.
  14. Suzuki,Kenji; Leusink,Gerrit J.; McFeely,Fenton R., Method and system for refurbishing a metal carbonyl precursor.
  15. Faguet,Jacques, Method for precursor delivery.
  16. Suzuki,Kenji, Method for purifying a metal carbonyl precursor.
  17. Chaubey, Trapti; Xu, Mindi, Solid precursor sublimator.
  18. Cleary, John M.; Arno, Jose I.; Hendrix, Bryan C.; Naito, Donn; Battle, Scott; Gregg, John N.; Wodjenski, Michael J.; Xu, Chongying, Solid precursor-based delivery of fluid utilizing controlled solids morphology.
  19. Amano, Hideaki, Vacuum processing apparatus.
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