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A method of manufacturing an optical element including the steps of: forming a through hole in a semiconductor element which has an optical section and an electrode electrically connected to the optical section; and forming a conductive layer extending from a first surface of the semiconductor eleme

A method of manufacturing an optical element including the steps of: forming a through hole in a semiconductor element which has an optical section and an electrode electrically connected to the optical section; and forming a conductive layer extending from a first surface of the semiconductor element on which the optical section is formed, through an inner wall surface of the through hole, to a second surface opposite to the first surface.

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1. An optical element comprising a semiconductor chip, the semiconductor chip having a first surface including an optical section and an electrode electrically connected to the optical section, the semiconductor chip having a second surface opposite to the first surface, wherein the semiconductor

1. An optical element comprising a semiconductor chip, the semiconductor chip having a first surface including an optical section and an electrode electrically connected to the optical section, the semiconductor chip having a second surface opposite to the first surface, wherein the semiconductor chip includes a through hole and a conductive layer electrically connected to the electrode, the conductive layer extending from the first surface through the through hole to the second surface for mounting of the optical element without wire bonding. 2. The optical element as defined in claim 1, further comprising: an external electrode formed on the second surface of the semiconductor chip, and electrically connected to the conductive layer. 3. The optical element as defined in claim 1, further comprising a stress relieving layer formed on the second surface of the semiconductor chip, wherein the conductive layer is formed over the stress relieving layer. 4. The optical element as defined in claim 2, further comprising a stress relieving layer formed on the second surface of the semiconductor chip, wherein the conductive layer is formed over the stress relieving layer; and wherein the external electrode is formed in a position on the second surface corresponding to the stress relieving layer. 5. The optical element as defined in claim 1, further comprising: a light-transmitting member provided on the first surface of the semiconductor chip. 6. The optical element as defined in claim 5, wherein the light-transmitting member is of substantially the same shape as the semiconductor chip. 7. The optical element as defined in claim 5, wherein the light-transmitting member is an optical glass. 8. The optical element as defined in claim 1, further comprising a color filter provided on the first surface of the semiconductor chip. 9. The optical element as defined in claim 1, further comprising a microlens provided on the first surface of the semiconductor chip. 10. An electronic instrument comprising an optical element which includes a semiconductor chip having a first surface including an optical section and an electrode electrically connected to the optical section, the semiconductor chip having a second surface opposite to the first surface, wherein the semiconductor chip has a through hole and a conductive layer electrically connected to the electrode, the conductive layer formed from the first surface through the through hole to the second surface for mounting of the optical element without wire bonding. 11. The electronic instrument as defined in claim 10, further comprising a display section which displays an image based on a signal from the optical element.