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Semiconductor chip and production process therefor 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • H01L-023/28
  • H01L-023/48
  • H01L-023/52
출원번호 US-0504874 (2000-02-16)
우선권정보 JP-0040399 (1999-02-18); JP-0045211 (1999-02-23)
발명자 / 주소
  • Kumamoto, Nobuhisa
  • Samejima, Katsumi
출원인 / 주소
  • Rohm Co., Ltd.
대리인 / 주소
    Rabin & Berdo, P.C.
인용정보 피인용 횟수 : 91  인용 특허 : 10

초록

A semiconductor chip including a bump projecting from a surface protective film thereof and a surface interconnection having a smaller height than the bump. The surface interconnection may project from the surface protective film or may be flush with the surface protective film. The surface intercon

대표청구항

1. A semiconductor chip, comprising: a substrate; at least one internal interconnection connected to the substrate; a surface protective film covering the substrate and partially covering the at least one internal interconnection to form a partially exposed portion of the at least one internal

이 특허에 인용된 특허 (10)

  1. Shenoy Jayarama N. ; Wheeler Richard L., Apparatus for equalizing signal parameters in flip chip redistribution layers.
  2. Shizuki Yasushi,JPX ; Konno Mitsuo,JPX, MMIC module using flip-chip mounting.
  3. Chen I-Ming,TWX, Method for mounting a semiconductor chip on a substrate, and semiconductor device adapted for mounting on a substrate.
  4. Thiele Alan G. (San Diego CA) Williams Ronald L. (San Marcos CA), Secure circuit structure.
  5. Kitano Makoto,JPX ; Kohno Ryuji,JPX ; Tanaka Naotaka,JPX ; Yaguchi Akihiro,JPX ; Kumazawa Tetsuo,JPX ; Anjoh Ichiro,JPX ; Tanaka Hideki,JPX ; Nishimura Asao,JPX ; Eguchi Shuji,JPX ; Nagai Akira,JPX ;, Semiconductor device.
  6. Higgins ; III Leo M., Semiconductor device having a sub-chip-scale package structure and method for forming same.
  7. Uda Takayuki (Ohme JPX) Hiramoto Toshiro (Ohme JPX) Tamba Nobuo (Ohme JPX) Ishida Hisashi (Higashiyamato JPX) Akimoto Kazuhiro (Akishima JPX) Odaka Masanori (Kodaira JPX) Tanaka Tasuku (Hamura JPX) H, Semiconductor integrated circuit device and methods for production thereof.
  8. Nishiyama Kazuo,JPX, Semiconductor part and fabrication method thereof, and structure and method for mounting semiconductor part.
  9. Farnworth Warren M. ; Wood Alan G., Standardized bonding location process and apparatus.
  10. Yoshida Takayuki,JPX ; Otsuka Takashi,JPX ; Fujimoto Hiroaki,JPX ; Mimura Tadaaki,JPX ; Yamane Ichiro,JPX ; Yamashita Takio,JPX ; Matsuki Toshio,JPX ; Kasuga Yoshiaki,JPX, Structure of chip on chip mounting preventing from crosstalk noise.

이 특허를 인용한 특허 (91)

  1. Lee, Jin-Yuan; Lo, Hsin-Jung, Chip assembly with interconnection by metal bump.
  2. Scheucher, Heimo, Chip having two groups of chip contacts.
  3. Lee, Jin-Yuan; Huang, Ching-Cheng; Lin, Mou-Shiung, Chip package.
  4. Lin, Mou-Shiung; Lin, I, Shih-Hsiung, Chip package having a chip combined with a substrate via a copper pillar.
  5. Chen, Ke-Hung; Lin, Shih-Hsiung; Lin, Mou-Shiung, Chip package with dam bar restricting flow of underfill.
  6. Lin, Mou-Shiung; Chou, Chiu-Ming, Chip structure.
  7. Lin, Mou-Shiung; Chou, Chiu-Ming, Chip structure.
  8. Lin, Mou-Shiung; Chou, Chiu-Ming; Chou, Chien-Kang; Lo, Hsin-Jung, Chip structure.
  9. Kuo, Nick; Chou, Chiu-Ming; Chou, Chien-Kang; Lin, Chu-Fu, Chip structure with bumps and testing pads.
  10. Lin,Mou Shiung, Chip structure with redistribution traces.
  11. Lee, Jin-Yuan; Chou, Chien-Kang; Lin, Shih-Hsiung; Kuo, Hsi-Shan, Cylindrical bonding structure and method of manufacture.
  12. Pang, Mengzhi; Kaufmann, Matthew, Enhanced bump pitch scaling.
  13. Lee, Jin-Yuan; Lin, Mou-Shiung; Huang, Ching-Cheng, Low fabrication cost, fine pitch and high reliability solder bump.
  14. Lee, Jin-Yuan; Lin, Mou-Shiung; Huang, Ching-Cheng, Low fabrication cost, fine pitch and high reliability solder bump.
  15. Lee, Jin-Yuan; Lei, Ming-Ta; Huang, Ching-Cheng; Lin, Chuen-Jye, Low fabrication cost, high performance, high reliability chip scale package.
  16. Lee, Jin-Yuan; Lei, Ming-Ta; Huang, Ching-Cheng; Lin, Chuen-Jye, Low fabrication cost, high performance, high reliability chip scale package.
  17. Lee, Jin-Yuan; Lei, Ming-Ta; Huang, Ching-Cheng; Lin, Chuen-Jye, Low fabrication cost, high performance, high reliability chip scale package.
  18. Lee,Jin Yuan; Lei,Ming Ta; Huang,Ching Cheng; Lin,Chuen Jye, Low fabrication cost, high performance, high reliability chip scale package.
  19. Lee,Jin Yuan; Lei,Ming Ta; Huang,Ching Cheng; Lin,Chuen Jye, Low fabrication cost, high performance, high reliability chip scale package.
  20. Lin, Mou-Shiung, Metallization structure over passivation layer for IC chip.
  21. Lee, Jin-Yuan; Chou, Chien-Kang; Lin, Shih-Hsiung; Kuo, Hsi-Shan, Method for fabricating circuit component.
  22. Lee, Jin-Yuan; Huang, Ching-Cheng; Lin, Mou-Shiung, Method of fabricating chip package.
  23. Lin, Shih-Hsiung; Lin, Mou-Shiung, Method of joining chips utilizing copper pillar.
  24. Lin, Shih-Hsiung; Lin, Mou-Shiung, Method of joining chips utilizing copper pillar.
  25. Lee, Jin-Yuan; Chen, Ying-Chih; Lin, Mou-Shiung, Method of wire bonding over active area of a semiconductor circuit.
  26. Lee, Jin-Yuan; Chen, Ying-Chih; Lin, Mou-Shiung, Method of wire bonding over active area of a semiconductor circuit.
  27. Lee, Jin-Yuan; Chen, Ying-Chih; Lin, Mou-Shiung, Method of wire bonding over active area of a semiconductor circuit.
  28. Lee, Jin-Yuan; Chen, Ying-Chih; Lin, Mou-Shiung, Method of wire bonding over active area of a semiconductor circuit.
  29. Lee, Jin-Yuan; Chen, Ying-Chih; Lin, Mou-Shiung, Method of wire bonding over active area of a semiconductor circuit.
  30. Lee, Jin-Yuan; Chen, Ying-chih, Method of wire bonding over active area of a semiconductor circuit.
  31. Lin, Mou-Shiung; Peng, Bryan, Multiple chips bonded to packaging structure with low noise and multiple selectable functions.
  32. Lin, Mou-Shiung; Chou, Chiu-Ming; Chou, Chien-Kang, Post passivation interconnection process and structures.
  33. Lin, Mou-Shiung; Chou, Chiu-Ming; Chou, Chien-Kang, Post passivation interconnection schemes on top of the IC chips.
  34. Lin, Mou-Shiung; Chou, Chiu-Ming; Chou, Chien-Kang, Post passivation interconnection schemes on top of the IC chips.
  35. Lin,Mou Shiung; Chou,Chiu Ming; Chou,Chien Kang, Post passivation interconnection schemes on top of the IC chips.
  36. Lin,Mou Shiung; Chou,Chiu Ming; Chou,Chien Kang, Post passivation interconnection schemes on top of the IC chips.
  37. Lin,Mou Shiung; Chou,Chiu Ming; Chou,Chien Kang, Post passivation interconnection schemes on top of the IC chips.
  38. Lin, Mou-Shiung; Chou, Chiu-Ming; Chou, Chien-Kang, Post passivation interconnection structures.
  39. Lin,Mou Shiung; Lee,Jin Yuan, Post passivation method for semiconductor chip or wafer.
  40. Lin, Mou-Shiung; Chou, Chien-Kang; Chen, Ke-Hung, Post passivation structure for a semiconductor device and packaging process for same.
  41. Lin,Mou Shiung; Lee,Jin Yuan, Post passivation structure for semiconductor chip or wafer.
  42. Lin, Mou-Shiung; Lin, Shih Hsiung; Lo, Hsin-Jung, Process of bonding circuitry components.
  43. Huang, Ching-Cheng; Lin, Chuen-Jye; Lei, Ming-Ta; Lin, Mou-Shiung, Reliable metal bumps on top of I/O pads after removal of test probe marks.
  44. Ueda,Shigeyuki, Semiconductor chip and method of producing the same.
  45. Lin, Mou-Shiung; Lee, Jin-Yuan, Semiconductor chip structure.
  46. Lee, Wen-Chieh; Lin, Mou-Shiung; Chou, Chien-Kang; Liu, Yi-Cheng; Chou, Chiu-Ming; Lee, Jin-Yuan, Semiconductor chip with coil element over passivation layer.
  47. Lee, Wen-Chieh; Lin, Mou-Shiung; Chou, Chien-Kang; Liu, Yi-Cheng; Chou, Chiu-Ming; Lee, Jin-Yuan, Semiconductor chip with coil element over passivation layer.
  48. Chou, Chiu-Ming; Chou, Chien-Kang; Lin, Ching-San; Lin, Mou-Shiung, Semiconductor chip with passivation layer comprising metal interconnect and contact pads.
  49. Lin, Mou-Shiung; Lo, Hsin-Jung; Chou, Chien-Kang; Chou, Chiu-Ming; Lin, Ching-San, Semiconductor chip with post-passivation scheme formed over passivation layer.
  50. Lin, Mou-Shiung; Lo, Hsin-Jung; Chou, Chien-Kang; Chou, Chiu-Ming; Lin, Ching-San, Semiconductor chip with post-passivation scheme formed over passivation layer.
  51. Miyata, Osamu; Morifuji, Tadahiro, Semiconductor chip, method of manufacturing semiconductor chip, and semiconductor device.
  52. Lin, Mou-Shiung, Solder interconnect on IC chip.
  53. Lin, Mou-Shiung; Lin, Shih-Hsiung; Lo, Hsin-Jung; Chen, Ying-Chih; Chou, Chiu-Ming, Stacked chip package with redistribution lines.
  54. Lin, Mou-Shiung; Lin, Shih-Hsiung; Lo, Hsin-Jung; Chen, Ying-Chih; Chou, Chiu-Ming, Stacked chip package with redistribution lines.
  55. Lee, Jin-Yuan; Huang, Ching-Cheng; Lin, Mou-Shiung, Structure and manufacturing method of chip scale package.
  56. Lee, Jin-Yuan; Huang, Ching-Cheng; Lin, Mou-Shiung, Structure and manufacturing method of chip scale package.
  57. Chou, Chiu-Ming; Lin, Mou-Shiung, Structure of gold bumps and gold conductors on one IC die and methods of manufacturing the structures.
  58. Lee, Jin-Yuan; Lin, Mou-Shiung, Structure of high performance combo chip and processing method.
  59. Lin, Mou-Shiung, Top layers of metal for high performance IC's.
  60. Lin, Mou-Shiung, Top layers of metal for high performance IC's.
  61. Lin, Mou-Shiung, Top layers of metal for high performance IC's.
  62. Lin, Mou-Shiung, Top layers of metal for high performance IC's.
  63. Lin, Mou-Shiung, Top layers of metal for high performance IC's.
  64. Lin, Mou-Shiung, Top layers of metal for high performance IC's.
  65. Lin, Mou-Shiung, Top layers of metal for high performance IC's.
  66. Lin, Mou-Shiung; Lee, Jin-Yuan, Top layers of metal for high performance IC's.
  67. Lin, Mou-Shiung; Lee, Jin-Yuan, Top layers of metal for high performance IC's.
  68. Lin, Mou-Shiung; Lee, Jin-Yuan, Top layers of metal for high performance IC's.
  69. Lin,Mou Shiung, Top layers of metal for high performance IC's.
  70. Lin,Mou Shiung, Top layers of metal for high performance IC's.
  71. Lin,Mou Shiung, Top layers of metal for high performance IC's.
  72. Lin,Mou Shiung, Top layers of metal for high performance IC's.
  73. Lin,Mou Shiung, Top layers of metal for high performance IC's.
  74. Lin,Mou Shiung, Top layers of metal for high performance IC's.
  75. Lin,Mou Shiung, Top layers of metal for high performance IC's.
  76. Lin,Mou Shiung, Top layers of metal for high performance IC's.
  77. Lin,Mou Shiung, Top layers of metal for high performance IC's.
  78. Lin,Mou Shiung, Top layers of metal for high performance IC's.
  79. Lin,Mou Shiung, Top layers of metal for high performance IC's.
  80. Lin,Mou Shiung, Top layers of metal for high performance IC's.
  81. Lin,Mou Shiung, Top layers of metal for high performance IC's.
  82. Lin,Mou Shiung, Top layers of metal for high performance IC's.
  83. Lin,Mou Shiung, Top layers of metal for high performance IC's.
  84. Lin,Mou Shiung, Top layers of metal for high performance IC's.
  85. Lin,Mou Shiung, Top layers of metal for high performance IC's.
  86. Lin,Mou Shiung, Top layers of metal for high performance IC's.
  87. Lin,Mou Shiung, Top layers of metal for high performance IC's.
  88. Lin,Mou Shiung, Top layers of metal for high performance IC's.
  89. Lin, Mou-Shiung; Chou, Chiu-Ming; Chou, Chien-Kang, Top layers of metal for integrated circuits.
  90. Lin,Mou Shiung; Chou,Chiu Ming; Chou,Chien Kang, Top layers of metal for integrated circuits.
  91. Chou, Chien-Kang; Chou, Chiu-Ming; Lin, Li-Ren; Lin, Chu-Fu, Wafer level processing method and structure to manufacture two kinds of interconnects, gold and solder, on one wafer.
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