Burn rate enhancement via a transition metal complex of diammonium bitetrazole
원문보기
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
C06B-047/08
C06B-031/00
출원번호
US-0998122
(2001-11-30)
발명자
/ 주소
Mendenhall, Ivan V.
Barnes, Michael W.
출원인 / 주소
Autoliv ASP, Inc.
대리인 / 주소
Erickson, James D.Brown, Sally J.
인용정보
피인용 횟수 :
11인용 특허 :
6
초록
A method for increasing the burn rate of a gas generant formulation is provided involving the addition of a quantity of at least one transition metal complex of diammonium bitetrazole to the gas generant formulation.
대표청구항▼
A method for increasing the burn rate of a gas generant formulation is provided involving the addition of a quantity of at least one transition metal complex of diammonium bitetrazole to the gas generant formulation. O--, --COO--, --NR2CO--, --NR3COO--, --NR4CONR5--, --OCO--, --OCONR6--, --CONR7--,
A method for increasing the burn rate of a gas generant formulation is provided involving the addition of a quantity of at least one transition metal complex of diammonium bitetrazole to the gas generant formulation. O--, --COO--, --NR2CO--, --NR3COO--, --NR4CONR5--, --OCO--, --OCONR6--, --CONR7--, --NR8SO--, --NR9SO2--, --SONR10--, or --SO2NR11--, in which R1through R11independently represent a hydrogen atom, a substituted or unsubstituted alkyl group or a substituted or unsubstituted aryl group; and Sp1represents a divalent linkage which may have a halogen atom, an alkyl group, an aryl group, an acyl group, a sulfonyl group, an alkoxy group, an aryloxy group, an alkylthio group, an arylthio group, an amino group, an alkylamino group, an arylamino group, an acylamino group, a hydroxy group, a cyano group, a carbamoyl group, a sulfamoyl group, a sulfonamido group, an acyloxy group, an oxycarbonyl group, a sulfonylamino group, a ureido group, a sulfamoylamino group, an alkoxycarbonyl group, an aryloxycarbonyl group, a nitro group, an imido group, or a heterocyclic group, provided that an ultraviolet absorbent structure bonds directly or through a spacer to Sp1or forms a part of the polymer main chain, wherein J2and J3represent the same group as J1denoted in formula (1) above, and may be the same or different; Sp2and Sp3independently represent a divalent linkage which may have a halogen atom, an alkyl group, an aryl group, an acyl group, a sulfonyl group, an alkoxy group, an aryloxy group, an alkylthio group, an arylthio group, an amino group, an alkylamino group, an arylamino group, an acylamino group, a hydroxy group, a cyano group, a carbamoyl group, a sulfamoyl group, a sulfonamido group, an acyloxy group, an oxycarbonyl group, a sulfonylamino group, a ureido group, a sulfamoylamino group, an alkoxycarbonyl group, an aryloxcarbonyl group, a nitro group, an imido group, or a heterocyclic group, and may be the same or different, provided that an ultraviolet absorbent structure bonds directly or through a spacer to at least one of Sp2and Sp3or forms a part of the polymer main chain in at least one of Sp2and Sp3, wherein R12through R25independently represent a hydrogen atom, a halogen atom, an alkyl group, an aryl group, an acyl group, a sulfonyl group, an alkoxy group, an aryloxy group, an alklthio group, an arylthio group, an amino group, an alkylamino group, an arylamino group, an acylamino group, a hydroxy group, a cyano group, a carbamoyl group, a sulfamoyl group, a sulfonamido group, an acyloxy group, an oxycarbonyl group, a sulfonylamino group, a ureido group, a sulfamoylamino group, an alkoxycarbonyl group, an aryloxycarbonyl group, a nitro group, an imido group, or a heterocyclic group, provided that the two adjacent groups of R12through R25may combine with each other to form a ring, and provided that the ultraviolet absorbent structure of formula (3) bonds directly or through a spacer to the polymer main chain or forms a part of the polymer main chain, wherein R26and R27independently represent an alkyl group having a carbon atom number of 1 to 10; R28,R29and R30independently represent a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkoxy group, a substituted or unsubstituted alkylthio group or a substituted or unsubstituted amino group; X and Y independently represent an electron withdrawing group, provided that X and Y may have a halogen atom, an alkyl group, an aryl group, an acyl group, a sulfonyl group, an alkoxy group, an aryloxy group, an alkylthio group, an arylthio group, an amino group, an alkylamino group, an arylamino group, an acylamino group, a hydroxy group, a cyano group, a carbamoyl group, a sulfamoyl group, a sulfonamido group, an acyloxy group, an oxycarbonyl group, a sulfonylamino group, a ureido group, a sulfamoy
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이 특허에 인용된 특허 (6)
Hendrickson Roger R. (Bear River City UT), Composite solid propellants containing bitetrazoles.
Highsmith Thomas K. (North Ogden UT) Lund Gary K. (Ogden UT) Blau Reed J. (Richmond UT) Hinshaw Jerald C. (Ogden UT) Doll Daniel W. (Ogden UT), Gas generating compositions based on salts of 5-nitraminotetrazole.
Shunji Hyoda JP; Masaharu Kita JP; Atsushi Sugino JP; Shuichi Nemugaki JP; Takahiro Ueta JP; Koki Sato JP, Process for the preparation of highly pure 5,5'-bi-1H-tetrazolediammonium salts.
Tappan,Bryce C.; Huynh,My Hang V.; Hiskey,Michael A.; Son,Steven F.; Oschwald,David M.; Chavez,David E.; Naud,Darren L., Preparation of nanoporous metal foam from high nitrogen transition metal complexes.
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