System and method for an advance notification system for monitoring and reporting proximity of a vehicle
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
G01C-021/26
H04Q-007/20
출원번호
US-0908471
(2001-07-18)
발명자
/ 주소
Jones, Martin Kelly
출원인 / 주소
ArrivalStar, Inc.
대리인 / 주소
Thomas, Kayden, Horstemeyer & Risley, LLP
인용정보
피인용 횟수 :
199인용 특허 :
63
초록▼
Generally, the present invention monitors and communicates travel data transmitted from vehicles being monitored by the system to users requesting travel information on a particular vehicle. A travel data storage unit receives and stores the travel data. When a user desires to view some or all of th
Generally, the present invention monitors and communicates travel data transmitted from vehicles being monitored by the system to users requesting travel information on a particular vehicle. A travel data storage unit receives and stores the travel data. When a user desires to view some or all of this travel data, the user submits a request to a data manager. In response, the data manager retrieves the appropriate information from the travel data stored in the travel data storage unit and transmits this information to the user. The data manager may communicate the information in a variety of mediums and preferably contact information is predefined that enables the data manager to determine which medium is preferable and how to establish communication once the medium is determined.
대표청구항▼
Generally, the present invention monitors and communicates travel data transmitted from vehicles being monitored by the system to users requesting travel information on a particular vehicle. A travel data storage unit receives and stores the travel data. When a user desires to view some or all of th
Generally, the present invention monitors and communicates travel data transmitted from vehicles being monitored by the system to users requesting travel information on a particular vehicle. A travel data storage unit receives and stores the travel data. When a user desires to view some or all of this travel data, the user submits a request to a data manager. In response, the data manager retrieves the appropriate information from the travel data stored in the travel data storage unit and transmits this information to the user. The data manager may communicate the information in a variety of mediums and preferably contact information is predefined that enables the data manager to determine which medium is preferable and how to establish communication once the medium is determined. the plasma processing unit at the input terminal and at the output terminal of the matching circuit, and the AC resistances RB0and RB1are measured at a third measuring point corresponding to the output terminal. 5. The performance evaluation method for the plasma processing apparatus according to claim 1, the plasma processing unit further comprising a radiofrequency feeder disposed between the output terminal of the matching circuit and the electrode, wherein the matching circuit is disconnected from the plasma processing unit at the input terminal of the matching circuit and at an output end of the radiofrequency feeder, and the AC resistance RB0and RB1are measured at a fourth measuring point corresponding to the output end of the radiofrequency feeder. 6. The performance evaluation method for the plasma processing apparatus according to claim 1, wherein the AC resistances RA0,RA1,RB0,and RB1are measured at a power frequency of the radiofrequency generator. 7. The performance evaluation method for the plasma processing apparatus according to claim 1, wherein the first upper limit is 0.5 times the AC resistance RA0,and the second upper limit is 0.5 times the AC resistance RB0. 8. The performance evaluation method for the plasma processing apparatus according to claim 7, wherein the first upper limit is 0.4 times the AC resistance RA0,and the second upper limit is 0.4 times the AC resistance RB0. 9. The performance evaluation method for the plasma processing apparatus according to claim 1, the matching circuit further comprising at least one connection point for connecting the matching circuit to the ground potential portion, wherein the AC resistances RA0,RA1,RB0,and RB1are measured for each of the connection points by sequentially switching the connection points so that only one of the connection points is connected to the ground potential portion. 10. The performance evaluation method for the plasma processing apparatus according to claim 1, wherein a workpiece is introduced into the plasma processing chamber to perform a plasma process on the workpiece between the time t0and the later time t1. 11. The performance evaluation method for the plasma processing apparatus according to claim 1, wherein adjustment work is performed between the time t0and the later time t1. 12. The performance evaluation method for the plasma processing apparatus according to claim 1, wherein the plasma processing apparatus is disassembled, transferred, and reassembled between the time t0and the later time t1. 13. A maintenance method for a plasma processing apparatus, wherein, based on the results obtained by the evaluation method of claim 1, the AC resistances RA1and RB1are corrected when the absolute value |ΔRA| is not less than the first upper limit or the absolute value |ΔRB| is not less than the second upper limit. 14. A performance management system for a plasma processing apparatus comprising a plasma processing unit, the plasma processing unit comprising: a plasma processing chamber including an electrode for exciting a plasma; a radiofrequency generator for supplying radiofrequency power to the electrode; and a matching circuit for matching the impedances of the plasma processing chamber and the radiofrequency generator, the matching circuit having an input terminal connected to the radiofrequency generator, an output terminal connected to the electrode, and a connection point provided between the input terminal and the output terminal, the matching circuit being connected to a ground potential portion via the connection point, the performance management system comprising: a server for storing an AC resistance RA0in the matching circuit measured fro m the input terminal side of the matching circuit at a time t0and an AC resistance RB0in the matching circuit measured from the output terminal side of the matching circuit at the time t0; and a customer I/O device linked to the server via a communication line, wherein the server receives an AC resistance RA1at a later time t1and an AC resistance RB1at the later time t1from the customer I/O device, calculates the absolute value |ΔRA| of the difference ΔRA between the AC resistances RA0and RA1and the absolute value |ΔRB| of the difference ΔRB between the AC resistances RB0and RB1,and transmits to the customer I/O device a signal indicating that the plasma processing apparatus maintains a required level of performance when the absolute value |ΔRA| is less than a first upper limit and when |ΔRB| is less than a second upper limit and a signal indicating that that the plasma processing apparatus does not maintain the required level of performance when the absolute value |ΔRA| is not less than the first upper limit or when the absolute value |ΔRB| is not less than the second upper limit. 15. The performance management system for the plasma processing apparatus according to claim 14, the server further storing the identification number of the plasma processing unit, the identification number being associated with the AC resistances RA0and RB0,wherein the server receives the identification number of the plasma processing unit from the customer I/O device and calculates the absolute values |ΔRA| and |ΔRB| based on the AC resistances RA0and RB0associated with the identification number. 16. The performance management system for the plasma processing apparatus according to claim 14, wherein an RF characteristic meter is connected to the plasma processing apparatus and the customer I/O device, and the AC resistances RA1and RB1are directly transmitted from the RF characteristic meter to the server. 17. The performance management system for the plasma processing apparatus according to claim 14, the server comprising an output device located at the site of a supplier, wherein a maintenance command is output through the output device when the absolute value |ΔRA| is not less than the first upper limit or when the absolute value |ΔRB| is not less than the second upper limit. 18. A performance management system for a plasma processing apparatus comprising a plasma processing unit, the unit comprising: a plasma processing chamber including an electrode for exciting a plasma; a radiofrequency generator for supplying radiofrequency power to the electrode; and a matching circuit for matching the impedances of the plasma processing chamber and the radiofrequency generator, the matching circuit having an input terminal connected to the radiofrequency generator, an output terminal connected to the electrode, and a connection point provided between the input terminal and the output terminal, the matching circuit being connected to a ground potential portion via the connection point, the performance management system comprising: a server for storing an AC resistance RA0at a time t0in the matching circuit measured from the input terminal side of the matching circuit, an AC resistance RB0at the time t0in the matching circuit measured from the output terminal side of the matching circuit, and service engineer information containing fault levels and names of registered service engineers corresponding to the fault levels; an output device of the server, the output device being located at the site of a supplier; and a customer I/O device linked to the server via a communication line; wherein the server receives an AC resistance RA1and an AC resistance RB1measured at a later time t1from the customer I/O device, calculates the absolute value |ΔRA| of the difference ΔRA between the AC resistances RA0and RA1and the absolute value |ΔRB| of the difference ΔRB between the AC resistances RB0and RB1,and, when one of the absolute values |ΔRA| and |ΔRB| falls under any one of the fault levels, outputs the relevant fault level, information on the registered service engineer corresponding to the relevant fault level, and a maintenance command from the output device. 19. The performance management system for the plasma processing apparatus according to claim 18, the server further storing the identification number of the plasma processing unit, the identification number being associated with the AC resistances RA0and RB0,wherein the server receives the identification number of the plasma processing unit from the customer I/O device and calculates the absolute values |ΔRA| and |ΔRB| based on the AC resistances RA0and RB0associated with the received identification number. 20. The performance management system for the plasma processing apparatus according to claim 18, wherein an RF characteristic meter is connected to the plasma processing apparatus and the customer I/O device, and the AC resistances RA1and RB1are directly transmitted from the RF characteristic meter to the server. 21. The performance management system for the plasma processing apparatus according to claim 18, wherein the server transmits the relevant fault level to the customer I/O device. 22. A plasma processing apparatus having a plasma processing unit comprising: a plasma processing chamber including an electrode for exciting a plasma; a radiofrequency generator for supplying radiofrequency power to the electrode; and a matching circuit for matching the impedances of the plasma processing chamber and the radiofrequency generator, the matching circuit having an input terminal connected to the radiofrequency generator, an output terminal connected to the electrode, and a connection point provided between the input terminal and the output terminal, the matching circuit being connected to a ground potential portion via the connection point, wherein the absolute value |ΔRA| of the difference ΔRA between an AC resistance RA0at a time t0and an AC resistance RA1at a later time t1in the matching circuit, the AC resistances RA0and RA1being measured from the input terminal side of the matching circuit, is maintained at a value less than a first upper limit, and the absolute value |ΔRB| of the difference ΔRB between an AC resistance RB0at the time t0and an AC resistance RB1at the later time t1in the matching circuit, the AC resistances RB0and RB1being measured from the input terminal side of the matching circuit, is maintained at a value less than a second upper limit. 23. A performance validation system for a plasma processing apparatus, comprising: a customer terminal which allows a customer to request via a public line browsing of performance information indicating operation performance at the time t0and at the later t1of the plasma processing apparatus of claim 22 which the customer purchased from an engineer; an engineer terminal which allows the engineer to upload the performance information; and performance information providing means for providing the performance information uploaded from the engineer terminal to the customer terminal upon the request from the customer terminal. 24. The performance validation system for the plasma processing apparatus according to claim 23, wherein the performance information includes the AC resistances RA1,RA1,RB0,and RB1. 25. The performance validation system for the plasma proc
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