초록 ▼

An apparatus and method for effectively and controllably vaporizing a solid precursor material is provided. In particular, the present invention provides an apparatus that includes a housing defining a sealed interior volume having an inlet for receiving a carrier gas, at least one surface within th

An apparatus and method for effectively and controllably vaporizing a solid precursor material is provided. In particular, the present invention provides an apparatus that includes a housing defining a sealed interior volume having an inlet for receiving a carrier gas, at least one surface within the housing for the application of a solid precursor, and a heating member for heating the solid precursor. The heating member can be located in the housing or in the surface within the housing. The surface can be a rod, baffle, mesh, or grating, and is preferably s-shaped or cone-shaped. Optionally, an outlet connects the housing to a reaction chamber. A method for vaporizing a solid precursor using the apparatus of the present invention is also provided.

대표청구항 ▼

1. An apparatus for vaporizing a solid precursor, comprising: a housing defining an interior volume having an inlet for receiving a carrier gas; and at least two surfaces contained in the housing having the solid precursor applied thereto, wherein each of the at least two surfaces comprises a he

1. An apparatus for vaporizing a solid precursor, comprising: a housing defining an interior volume having an inlet for receiving a carrier gas; and at least two surfaces contained in the housing having the solid precursor applied thereto, wherein each of the at least two surfaces comprises a heating member for heating the solid precursor and the at least two surfaces are spaced to allow passage of the carrier gas therebetween. 2. The apparatus of claim 1, wherein the apparatus further comprises an outlet operably connected to a reaction chamber of a deposition chamber. 3. The apparatus of claim 2, wherein the at least two surfaces are selected from the group consisting of a baffle, a rod, a mesh and a grating. 4. The apparatus of claim 1, wherein the at least two surfaces have a form selected from the group consisting of an s-shape, a linear shape and a cone shape. 5. The apparatus of claim 3, wherein the at least two surfaces are formed of a material selected from the group consisting of stainless steel and ceramic. 6. The apparatus of claim 1, wherein the solid precursor includes TaOxprecursors. 7. The apparatus of claim 2, wherein the deposition chamber is selected from the group consisting of ALD chambers, CVD chambers, and evaporative coating chambers.