초록 ▼

A vacuum chuck for holding a semiconductor wafer during high pressure processing comprises a wafer platen, first through third lift pins, and an actuator mechanism. The wafer platen comprises a smooth surface, first through third lift pin holes, and a vacuum opening. In use, the vacuum opening appli

A vacuum chuck for holding a semiconductor wafer during high pressure processing comprises a wafer platen, first through third lift pins, and an actuator mechanism. The wafer platen comprises a smooth surface, first through third lift pin holes, and a vacuum opening. In use, the vacuum opening applies vacuum to a surface of a semiconductor wafer, which chucks the semiconductor wafer to the wafer platen. The first through third lift pins mount within the first through third lift pin holes, respectively. The actuator mechanism couples the first through third lifting pins to the wafer platen. The actuator mechanism operates to extend the first through third lift pins in unison above the smooth surface of the wafer platen. The actuator mechanism operates to retract the first through third lift pins in unison to at least flush with the smooth surface of the wafer platen.

대표청구항 ▼

A vacuum chuck for holding a semiconductor wafer during high pressure processing comprises a wafer platen, first through third lift pins, and an actuator mechanism. The wafer platen comprises a smooth surface, first through third lift pin holes, and a vacuum opening. In use, the vacuum opening appli

A vacuum chuck for holding a semiconductor wafer during high pressure processing comprises a wafer platen, first through third lift pins, and an actuator mechanism. The wafer platen comprises a smooth surface, first through third lift pin holes, and a vacuum opening. In use, the vacuum opening applies vacuum to a surface of a semiconductor wafer, which chucks the semiconductor wafer to the wafer platen. The first through third lift pins mount within the first through third lift pin holes, respectively. The actuator mechanism couples the first through third lifting pins to the wafer platen. The actuator mechanism operates to extend the first through third lift pins in unison above the smooth surface of the wafer platen. The actuator mechanism operates to retract the first through third lift pins in unison to at least flush with the smooth surface of the wafer platen. e relative to the walkway between a deployed position in which the segment at least restricts movement by the people between the first and second aisles and a stowed position in which the segment allows movement by the people between the first and second aisles.29. The apparatus of claim 22 wherein the restriction includes a reel and a flexible, coilable, elongated barrier extendibly coiled on the reel.30. The apparatus of claim 22 wherein the restriction includes a plurality of spaced apart, upright members positioned along the longitudinal axis.31. The apparatus of claim 22 wherein the restriction includes a plurality of spaced apart, upright members positioned along the longitudinal axis, with each upright member having at least a first shaft and a second shaft telescopically received in the first shaft, and wherein each upright member is received in a recess in a floor portion of the walkway when the upright member is in the stowed position.32. The apparatus of claim 22 wherein the walkway includes a floor portion and wherein the restriction includes a plurality of spaced apart, upright members, with each upright member at least partially stowed in the floor portion when the restriction is in the retracted position.33. The apparatus of claim 22 wherein the width of the walkway is about 50 inches or more.34. The apparatus of claim 22 wherein the walkway includes a floor portion and a ceiling portion positioned over the floor portion, and wherein the restriction depends from the ceiling portion.35. The apparatus of claim 22 wherein the first portion of the walkway includes an opening positioned to allow people to move between the walkway and the aircraft door, and wherein at least a portion of the restriction extends outwardly through the opening.36. The apparatus of claim 22 wherein the restriction includes a generally planar sheet.37. An apparatus for loading and/or unloading people from an aircraft