Methods of fabricating articles and sputtering targets
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
C22F-001/00
C22F-001/04
출원번호
US-0912476
(2001-07-24)
발명자
/ 주소
Segal, Vladimir
Willett, William B.
Ferrasse, Stephane
출원인 / 주소
Honeywell International Inc.
대리인 / 주소
Wells St. John P.S.
인용정보
피인용 횟수 :
14인용 특허 :
54
초록
Described is a high quality sputtering target and method of manufacture which involves application of equal channel angular extrusion.
대표청구항▼
Described is a high quality sputtering target and method of manufacture which involves application of equal channel angular extrusion. 9741000, Schweizer; US-3871379, 19750300, Clarke; US-3880167, 19750400, Hardwick, 606/222; US-3890975, 19750600, McGregor; US-3892240, 19750700, Park, 606/222; US-39
Described is a high quality sputtering target and method of manufacture which involves application of equal channel angular extrusion. 9741000, Schweizer; US-3871379, 19750300, Clarke; US-3880167, 19750400, Hardwick, 606/222; US-3890975, 19750600, McGregor; US-3892240, 19750700, Park, 606/222; US-3901244, 19750800, Schweizer; US-3946740, 19760300, Bassett; US-3980177, 19760900, McGregor; US-3990619, 19761100, Russell; US-4161951, 19790700, Scanlan, Jr.; US-4164225, 19790800, Johnson et al.; US-4172458, 19791000, Pereyra; US-4224947, 19800900, Fukuda; US-4235238, 19801100, Ogiu et al.; US-4326531, 19820400, Shimonaka; US-4384406, 19830500, Tischlinger; US-4448194, 19840500, DiGiovanni et al.; US-4476590, 19841000, Scales et al.; US-4493323, 19850100, Albright et al.; US-4500024, 19850200, DiGiovanni et al.; US-4509516, 19850400, Richmond; US-4512344, 19850400, Barber; US-4535768, 19850800, Hourahane et al.; US-4563961, 19860100, Beyer et al., 112/222; US-4580563, 19860400, Gross; US-4590929, 19860500, Klein; 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US-5336231, 19940800, Adair; US-5356419, 19941000, Chow; US-5364408, 19941100, Gordon; US-5372604, 19941200, Trott; US-5382257, 19950100, Lewis et al.; US-5383883, 19950100, Wilk et al.; US-5391170, 19950200, McGuire et al.; US-5391173, 19950200, Wilk; US-5391174, 19950200, Weston; US-5393302, 19950200, Clark et al.; US-5405354, 19950400, Sarrett, 606/148; US-5409494, 19950400, Morgan; US-5441502, 19950800, Bartlett; US-5441507, 19950800, Wilk; US-5447512, 19950900, Wilson et al.; US-5449367, 19950900, Kadry; US-5456246, 19951000, Schmieding et al.; US-5464425, 19951100, Skiba; US-5466243, 19951100, Schmieding et al.; US-5496331, 19960300, Xu et al.; US-5501688, 19960300, Whiteside et al.; US-5520696, 19960500, Wenstrom, Jr.; US-5520703, 19960500, Essig et al.; US-5522820, 19960600, Caspari et al.; US-5527322, 19960600, Klein et al.; US-5545170, 19960800, Hart; US-5549613, 19960800, Goble et al.; US-5549618, 19960800, Fleenor et al.; US-5549636, 19960800, Li; US-5554171, 19960900, Gatturna et al.; US-5562683, 19961000, Chan; US-5562685, 19961000, Mollenauer et al.; U S-5562687, 19961000, Chan; US-5562696, 19961000, Nobles et al.; US-5565122, 19961000, Zinnbauer et al.; US-5569269, 19961000, Hart et al.; US-5571090, 19961100, Sherts; US-5571119, 19961100, Atala; US-5601571, 19970200, Moss; US-5618304, 19970400, Hart et al.; US-5626590, 19970500, Wilk; US-5632748, 19970500, Beck, Jr. et al.; US-5643266, 19970700, Li; US-5645552, 19970700, Sherts; US-5658299, 19970800, Hart; US-5662658, 19970900, Wenstrom, Jr.; US-5665096, 19970900, Yoon; US-5681333, 19971000, Burkhart et al.; US-5690677, 19971100, Schmieding et al.; US-5693061, 19971200, Pierce et al.; US-5697950, 19971200, Fucci et al.; US-5709692, 19980100, Mollenauer et al.; US-5728135, 19980300, Bregen et al.; US-5749376, 19980500, Wilk et al.; US-5752964, 19980500, Mericle; US-5792152, 19980800, Klein et al.; US-5797927, 19980800, Yoon; US-5800447, 19980900, Wenstrom, Jr.; US-5814052, 19980900, Nakao et al.; US-5814054, 19980900, Kortenbach et al.; US-5817108, 19981000, Poncet; US-5826776, 19981000, Schulze et al.; US-5827298, 19981000, Hart et al.; US-5843084, 19981200, Hart et al.; US-5843099, 19981200, Nichols et al.; US-5846254, 19981200, Schulze et al.; US-5855311, 19990100, Hamblin et al.; US-5860983, 19990100, Wenstrom, Jr.; US-5897563, 19990400, Yoon et al.; US-5897564, 19990400, Schulze et al.; US-5897574, 19990400, Bonutti; US-5904692, 19990500, Steckel et al.; US-5906620, 19990500, Nakao et al.; US-5908426, 19990600, Pierce; US-5918604, 19990700, Whelan; US-5928252, 19990700, Steadman et al.; US-5941439, 19990800, Kammerer et al.; US-5944724, 19990800, Lizardi; US-5951559, 19990900, Burkhart; US-5968047, 19991000, Reed; US-5980557, 19991100, Iserin et al.; US-5993451, 19991100, Burkhart; US-5993466, 19991100, Yoon; US-6006965, 19991200, Hamann, 223/102; US-6010513, 20000100, Tormala; US-6039753, 20000300, Meislin; US-6045561, 20000400, Marshall et al.; US-6071289, 20000600, Stefanchik et al.; US-6074403, 20000600, Nord; US-6096060, 20000800, Fitts et al.; US-6099538, 20000800, Moses et al.; US-6113610, 20000900, Poncet; US-6132433, 20001000, Whelan; US-6146387, 20001100, Trott et al.
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