IPC분류정보
국가/구분 |
United States(US) Patent
등록
|
국제특허분류(IPC7판) |
|
출원번호 |
US-0299487
(2002-11-18)
|
우선권정보 |
EP-0200304 (2000-01-31) |
발명자
/ 주소 |
|
출원인 / 주소 |
|
대리인 / 주소 |
|
인용정보 |
피인용 횟수 :
20 인용 특허 :
22 |
초록
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This invention relates to a retractable and extendable awning and control system for automatically extending and retracting the awning. A front of an awning fabric is attached to a front bar, movably mounted on a wall of a building by retractable arms. A rear of the fabric is unrolled from a roll wh
This invention relates to a retractable and extendable awning and control system for automatically extending and retracting the awning. A front of an awning fabric is attached to a front bar, movably mounted on a wall of a building by retractable arms. A rear of the fabric is unrolled from a roll when the arms move the front bar away from the wall. The awning also features a weather sensor unit on its front bar in wireless communication with an indoor control unit. The weather sensor unit can detect excessive wind, mechanical shocks, sunlight, and rain. In addition, each support bracket on the awning has a screw spindle for adjusting an angle of extension of the awning from the wall with a resilient inner bushing that cushions mechanical shocks to the awning. Adhesive can also be introduced into arm ends after assembly of the arms.
대표청구항
▼
This invention relates to a retractable and extendable awning and control system for automatically extending and retracting the awning. A front of an awning fabric is attached to a front bar, movably mounted on a wall of a building by retractable arms. A rear of the fabric is unrolled from a roll wh
This invention relates to a retractable and extendable awning and control system for automatically extending and retracting the awning. A front of an awning fabric is attached to a front bar, movably mounted on a wall of a building by retractable arms. A rear of the fabric is unrolled from a roll when the arms move the front bar away from the wall. The awning also features a weather sensor unit on its front bar in wireless communication with an indoor control unit. The weather sensor unit can detect excessive wind, mechanical shocks, sunlight, and rain. In addition, each support bracket on the awning has a screw spindle for adjusting an angle of extension of the awning from the wall with a resilient inner bushing that cushions mechanical shocks to the awning. Adhesive can also be introduced into arm ends after assembly of the arms. . The method of claim 1 wherein the predefined condition is a “set inhibit next load flag” command, initiated by an operator command.8. The method of claim 1 wherein the predefined condition is a “set inhibit next load flag” command, initiated by a higher level controller, connected to the tool controller.9. The method of claim 1 wherein the to be processed wafers are supplied to the processing tool in cassettes and the step of providing pre-programmed recovery procedures further comprising initiating an automatic transfer of the to be processed wafers that has been removed from the cassette and of which the start of the processing is prohibited.10. The method of claim 9 wherein the step of initiating an automatic transfer of the to be processed wafers that have been removed from the cassette and of which the start of the processing is prohibited comprises transferring said wafers to the cassette.11. The method of claim 1 wherein the step of providing pre-programmed recovery procedures further comprises initiating a hold unload timer during which no automated response to the inhibit next load flag is started.12. The method of claim 11 wherein the step of initiating a hold unload timer further comprises allowing operator intervention when the hold unload timer is operational.13. A process tool for processing one or more wafers supplied, comprising: at least one reaction chamber for subjecting the one or more wafers to a process; a tool controller having a processor and memory and operable to execute a process control system program, the process control system program operable to monitor and control tool parameters; and wherein the tool controller is operable to generate an inhibit next load flag upon predefined inputs and, when the inhibit next load object is generated prior to the start of the processing of a to be processed wafer, prohibit the start of the processing of the to be processed wafer in the reaction chamber, and to provide pre-programmed recovery procedures such that after execution of a preprogrammed recovery procedure the to be processed wafer ends in a defined state such that the tool can be used for further processing. 14. The process tool of claim 13, wherein the tool controller comprises one or more subcontrollers, connected to the tool controller, the one or more sub-controllers performing part of the tasks of the tool controller.15. The process tool of claim 13 wherein the pre-programmed recovery procedures includes operator selectable recovery procedures.16. The process tool of claim 15 wherein the operator selectable recovery procedures includes resetting the inhibit next load flag if said predetermined condition is no longer true.17. The process tool of claim 15 wherein operator selectable recovery procedures includes overruling the inhibit next load flag for the immediate next to be processed wafer.18. The process tool of claim 13 wherein the predefined condition is based on an alarm level of a real time parameter, the real time parameter representing real time conditions in the process tool.19. The process tool of claim 13 wherein the predefined condition is based on an expression comprising one or more parameters out of a collection of a plurality of real time parameters, representing real time conditions in the process tool, and analysis results of a wafer processed prior to the to be processed wafer.20. The process tool of claim 13 wherein the predefined condition is a “set inhibit next load flag” command, initiated by an operator command.21. The process tool of claim 13 wherein the predefined condition is a “set inhibit next load flag” command, initiated by a higher level controller, connected to the tool controller.22. The process tool of claim 13 wherein the to be processed wafers are supplied to the processing tool in cassettes and pre-programmed recovery procedures comprising initiating an automatic transfer of the to be processed wafers that have been removed from a cassette and of which the start of the processing is prohibited.23. The process tool of claim 22 wherein the automatic transfer of to be processed wafers that have been removed from the cassette comprises transferring the to be processed wafers to the cassette.24. The process tool of claim 13 wherein the pre-programmed recovery procedures further comprise initiating a hold unload timer during which no automated response to the inhibit next load flag is started.25. The process tool of claim 24 wherein initiating the hold unload timer further comprises allowing operator intervention when the hold unload timer is operational.26. A method for the batch-wise processing of wafers in a process tool comprising: subjecting wafers batch-wise to a process in a reaction chamber in the process tool; performing one or more of the following steps in a control computer coupled to the process tool: a) setting an inhibit next load flag on predefined conditions, the inhibit next load flag not effecting the processing of a wafer batch of which the processing has already started;c) checking, prior to the start of the processing of a to be processed wafer batch, to see if an inhibit-next load flag has been set;d) prohibiting to start processing, in the reaction chamber, of the to be processed wafer batch, if an inhibit next load flag has been set; ande) providing pre-programmed recovery procedures, such that after execution of a pre-programmed recovery procedure the to be processed wafer batch of which the start of the processing is prohibited ends in a defined state such that the process tool can be used for further processing.27. The method of claim 26 wherein the step of providing pre-programmed recovery procedures includes the step of providing operator selectable recovery procedures.28. The method of claim 27 wherein the step of providing operator selectable recovery procedures includes the step of allowing an operator to reset the inhibit next load flag if said predetermined condition is no longer true.29. The method of claim 27 wherein the step of providing operator selectable recovery procedures includes the step of allowing an operator to overrule the inhibit next load flag for the immediate next to be processed wafer batch.30. The method of claim 26 wherein the predefined condition is based on an alarm level of a real time parameter, the real time parameter representing real time conditions in the process tool.31. The method of claim 26 wherein the predefined condition is based on an expression comprising one or more parameters out of a collection of a plurality of real time parameters, representing real time conditions in the process tool, and analysis results of a wafer processed prior to the to be processed wafer.32. The method of claim 26 wherein the predefined condition is a “set inhibit next load flag” command, initiated by an operator command.33. The method of claim 26 wherein the predefined condition is a “set inhibit next load flag” command, initiated by a higher level controller, connected to the tool controller.34. The method of claim 26 wherein the to be processed wafer batch are supplied to the processing tool in one or more cassettes and the step of providing pre-programmed recovery procedures further comprising initiating an automatic transfer of the to be processed wafer batch, or part thereof, to the extent that it has been removed from the one or more cassettes and of which the start of the processing is prohibited.35. The method of claim 34 wherein the step of initiating an automatic transfer of the to be processed wafer batch, or part thereof, that has been removed from the one or more cassettes and of which the start of the processing is prohibited comprises transferring said wafer batch or part thereof to the one or more cassettes.36. The method of claim 34 wherein during processing in the process tool a wafer batch is sequentially subjected to a first process in a first reaction chamber and a second process in a se
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