IPC분류정보
국가/구분 |
United States(US) Patent
등록
|
국제특허분류(IPC7판) |
|
출원번호 |
US-0102083
(2002-03-19)
|
발명자
/ 주소 |
- Chao, Sandy Shih-Hsun
- Nagengast, Andrew
|
출원인 / 주소 |
|
대리인 / 주소 |
Moser, Patterson & Sheridan
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인용정보 |
피인용 횟수 :
4 인용 특허 :
47 |
초록
▼
Embodiments of the present invention are directed to a carrier head for positioning a substrate on a polishing surface. The carrier head includes a housing connectable to a drive shaft to rotate therewith; a base; a detachable plate removably mounted on top of the housing; a gimbal mechanism connect
Embodiments of the present invention are directed to a carrier head for positioning a substrate on a polishing surface. The carrier head includes a housing connectable to a drive shaft to rotate therewith; a base; a detachable plate removably mounted on top of the housing; a gimbal mechanism connecting the housing to the base to permit the base to move with respect to the housing such that the base remains substantially parallel to the polishing surface; and a flexible membrane defining a mounting surface for the substrate.
대표청구항
▼
Embodiments of the present invention are directed to a carrier head for positioning a substrate on a polishing surface. The carrier head includes a housing connectable to a drive shaft to rotate therewith; a base; a detachable plate removably mounted on top of the housing; a gimbal mechanism connect
Embodiments of the present invention are directed to a carrier head for positioning a substrate on a polishing surface. The carrier head includes a housing connectable to a drive shaft to rotate therewith; a base; a detachable plate removably mounted on top of the housing; a gimbal mechanism connecting the housing to the base to permit the base to move with respect to the housing such that the base remains substantially parallel to the polishing surface; and a flexible membrane defining a mounting surface for the substrate. 35036, 19980400, Barr, 029/603.12; US-5738562, 19980400, Doan, 451/005; US-5740033, 19980400, Wassick et al., 364/149; US-5743784, 19980400, Birang, 451/021; US-5749769, 19980500, Church, 451/005; US-5759917, 19980600, Grover et al., 438/690; US-5762537, 19980600, Sandhu, 451/007; US-5774633, 19980600, Baba et al., 395/023; US-5783489, 19980700, Kaufman, 438/692; US-5799286, 19980800, Morgan et al., 705/030; US-5830280, 19981100, Sato, 134/002; US-5833519, 19981100, Moore, 451/056; US-5842909, 19981200, Sandhu, 451/007; US-5858813, 19990100, Scherber, 438/693; US-5860847, 19990100, Sakurai, 451/010; US-5876266, 19990300, Miller, 451/056; US-5876490, 19990300, Ronay, 106/003; US-5885137, 19990300, Ploessl, 106/003; US-5885334, 19990300, Suzuki, 438/639; US-5906754, 19990500, Appel, 216/088; US-5910041, 19990600, Duescher, 451/028; US-5916855, 19990600, Avanzino, 051/307; US-5919082, 19990700, Walker, 451/041; US-5934978, 19990800, Burke; US-5945347, 19990800, Wright, 438/692; US-5954975, 19990900, Cadien, 216/038; US-5954997, 19990900, Kaufman, 252/079.1; US-5958794, 19990900, Bruxuoort, 438/692; US-5968280, 19991000, Ronay, 134/002; US-5972793, 19991000, Tseng, 438/692; US-5985045, 19991100, Kobayashi, 148/240; US-5987398, 19991100, Halverson et al., 702/179; US-5993298, 19991100, Duescher, 451/056; US-6038540, 20000300, Krist et al., 705/008; US-6056781, 20000500, Wassick et al., 703/012; US-6110214, 20000800, Klimasauskas, 703/002; US-6121143, 20000900, Messner et al., 438/692; US-6128540, 20001000, Van Der Vegt et al., 700/036; US-6157916, 20001200, Hoffman, 705/008; US-6197604, 20010300, Miller, 438/014; US-6246972, 20010600, Klimasauskas, 703/002; US-6257953, 20010700, Gitis et al., 451/005; US-6263255, 20010700, Tan et al., 700/121; US-6267644, 20010700, Molnar, 451/041; US-6268641, 20010700, Yano et al., 257/260; US-6283829, 20010900, Molnar, 451/008; US-6291349, 20010900, Molnar, 438/609; US-6293851, 20010900, Molnar, 451/041; US-6298470, 20011000, Breiner et al., 716/004; US-6408227, 20020600, Singhvi et al., 700/266; US-6526547, 20030200, Breiner et al., 716/004; US-6567718, 20030500, Campbell et al., 700/121; US-6568989, 20030500, Molnar, 451/005; US-20020010563, 20020100, Ratteree et al., 703/002; US-20020123818, 20020900, Yamada et al., 700/121; US-20020199082, 20021200, Shanmugasundram et al., 712/208; US-2003004
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