Photopolymerizable composition and recording material using the same
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
G03F-007/004
출원번호
US-0676487
(2000-10-02)
우선권정보
JP-0323762 (1999-11-15); JP-0094431 (2000-03-30)
발명자
/ 주소
Matsumoto, Hirotaka
Takashima, Masanobu
Washizu, Shintaro
Kawamura, Koichi
Sorori, Tadahiro
출원인 / 주소
Fuji Photo Film Co., Ltd.
대리인 / 주소
Sughrue Mion, PLLC
인용정보
피인용 횟수 :
9인용 특허 :
12
초록▼
Provided is a photopolymerizable composition which has a high sensitivity to not only ultraviolet light but also to visible to infrared light. The photopolymerizable composition is a composition comprising a polymerizable compound having an ethylenically unsaturated bond, a compound represented by t
Provided is a photopolymerizable composition which has a high sensitivity to not only ultraviolet light but also to visible to infrared light. The photopolymerizable composition is a composition comprising a polymerizable compound having an ethylenically unsaturated bond, a compound represented by the following general formula (1), and an organoboron compound represented by the following general formula (A):
대표청구항▼
1. A photopolymerizable composition comprising: a polymerizable compound having an ethylenically unsaturated bond; at least one of a compound represented by formula (8): wherein Q 3represents an oxygen atom or sulfur atom; R1and R2each independently represents a hydrogen atom, an aliphatic gro
1. A photopolymerizable composition comprising: a polymerizable compound having an ethylenically unsaturated bond; at least one of a compound represented by formula (8): wherein Q 3represents an oxygen atom or sulfur atom; R1and R2each independently represents a hydrogen atom, an aliphatic group, an aromatic group, or heterocyclic group; L1and L2each independently represents a methine group which may be substituted; m represents an integer of 1 to 3; Rd, Re, Rfand Rgeach independently represents a hydrogen atom or a monovalent substituent selected from the group consisting of hydrogen, halogen, alkyl, alkoxy, alkylsulfonyl, cyano, and nitro; Rhrepresents a hydrogen atom, an alkyl group, an alkenyl group, an aryl group or a heterocyclic group; and an organoboron compound represented by the following formula (A): wherein R a1, Ra2and Ra3each independently represents an aliphatic group, an aromatic group, a heterocyclic group, or —SiRa5Ra6Ra7where Ra5, Ra6, and Ra7each independently represents an aliphatic group or an aromatic group; Ra4represents an aliphatic group; and Y+ represents a group capable of forming a cation.2. A recording material comprising a support having disposed thereon a recording layer containing at least microcapsules enclosing a color-forming component and the photopolymerizable composition described in claim 1, wherein the polymerizable compound having an ethylenically unsaturated bond is a compound having a site which reacts with the color-forming component and causes the color-forming component to develop a color.3. A recording material according to claim 1 having a multilayer structure produced by laminating at least three recording layers to one another, each recording layer being sensitive to light of a different wave length, and each recording layer developing a different color when used for recording.4. The composition of claim 1, wherein Q3of formula (8) represents a sulfur atom.5. The composition of claim 4, wherein at least one of Rd, Re, Rfand Rgis an electron-withdrawing group.6. The composition of claim 5, wherein at least one of Rd, Re, Rfand Rgis a sulfonyl group.7. The composition of claim 6, wherein at least one of Rd, Re, Rfand Rgis a sufonyl alkyl group.
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이 특허에 인용된 특허 (12)
Cunningham Allan Francis,CHX ; Kunz Martin,DEX ; Kura Hisatoshi,JPX, Acid-stable borates for photopolymerization.
Shanklin Michael S. (Dayton OH) Gottschalk Peter (Centerville OH) Adair Paul C. (Springboro OH), Photohardenable composition containing borate salts and ketone initiators.
Gottschalk Peter (Centerville OH) Schuster Gary B. (Champaign IL), Photohardenable compositions containing a dye borate complex and photosensitive materials employing the same.
Kawamura Kouichi (Shizuoka JPX) Tsuchiya Mitsumasa (Shizuoka JPX), Photopolymerizable composition containing photoinitiators having at least two sulfur atoms.
Laridon Urbain L. (Wilrijk BEX) DeWinter Walter F. (s\-Gravenwezel BEX) Kokelenberg Hendrik E. (Merksem BEX), Photosensitive composition containing an ethylenically unsaturated compound, initiator and sensitizer.
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