초록 ▼

The present invention provides an apparatus and method for substrate transport. In systems according to the invention, at least a first and second chamber are provided. The first chamber may be a load lock and the second chamber a processing chamber. A substrate transfer shuttle is provided and is m

The present invention provides an apparatus and method for substrate transport. In systems according to the invention, at least a first and second chamber are provided. The first chamber may be a load lock and the second chamber a processing chamber. A substrate transfer shuttle is provided and is moveable along a linear path defined by guide rollers between one position in the first chamber and another position in the second chamber. In this way, the substrate may be transferred, in both a forward and a reverse direction, between the first chamber and the second chamber. The substrate transfer shuttle is structured so that a substrate may be removed therefrom by moving a support in one of the chambers from a lowered position to an intermediate position, after which the substrate transfer shuttle may be removed from the chamber.

대표청구항 ▼

1. A substrate transfer shuttle for carrying a substrate in a processing system having at least two chambers, comprising: first and second longitudinal side rails each including a toothed rack mounted thereon; cross members proximate first and second ends of the first and second longitudinal si

1. A substrate transfer shuttle for carrying a substrate in a processing system having at least two chambers, comprising: first and second longitudinal side rails each including a toothed rack mounted thereon; cross members proximate first and second ends of the first and second longitudinal side rails to structurally connect the first and second longitudinal side rails; a first plurality of substrate support elements extending inwardly from the first longitudinal side rail; and a second plurality of substrate support elements extending inwardly from the second longitudinal side rail. 2. The apparatus of claim 1, wherein said substrate support elements extend about 15-30% of a dimension of the substrate.3. The apparatus of claim 2, wherein said substrate support elements extend about 22% of a dimension of the substrate.4. The apparatus of claim 1, wherein the first and second longitudinal side rails each include a toothed rack mounted on the underside thereof.5. The apparatus of claim 1, wherein the substrate support elements, extending inwardly from the first and second longitudinal side rails, each have a proximal portion extending at least in part upwardly from the first or second longitudinal side rails and a distal portion extending horizontally inwardly from the proximal portion so that when the substrate transfer shuttle is supporting a substrate, an end effector may be accommodated vertically between the substrate and the first and second longitudinal side rails and laterally between at least some of the proximal portions of the substrate support elements.6. The apparatus of claim 5, wherein at least the first longitudinal side rail has a portion extending beyond the second cross-member.7. The apparatus of claim 5, wherein the distal portions of the first and second plurality of substrate support elements are parallel.8. The apparatus of claim 1, wherein at least one of the distal portions of the substrate support elements is at an angle with respect to at least another of the distal portions of the substrate support elements.9. The apparatus of claim 8, wherein the angle is between about 30° and 60°.10. A substrate transfer shuttle for carrying a substrate in a processing system having at least two chambers, comprising: first and second longitudinal side rails each including a toothed rack mounted thereon; cross members proximate first and second ends of the first and second longitudinal side rails to structurally connect the first and second longitudinal side rails; and a plurality of substrate support elements extending from the first and second longitudinal side rails. 11. The apparatus of claim 10, wherein said substrate support elements extend about 15-30% of a dimension of the substrate.12. The apparatus of claim 10, wherein the substrate support elements, extending inwardly from the first and second longitudinal side rails, each have a proximal portion extending at least in part upwardly from the first or second longitudinal side rails and a distal portion extending horizontally inwardly from the proximal portion so that when the substrate transfer shuttle is supporting a substrate, an end effector may be accommodated vertically between the substrate and the first and second longitudinal side rails and laterally between at least some of the proximal portions of the substrate support elements.13. The apparatus of claim 12, wherein the distal portions of the first and second plurality of substrate support elements are parallel.14. The apparatus of claim 12, wherein at least one of the distal portions of the substrate support elements is at an angle with respect to at least another of the distal portions of the substrate support elements.15. The apparatus of claim 10, wherein at least the first longitudinal side rail has a portion extending beyond the second cross-member.16. A substrate transfer shuttle for carrying a substrate in a processing system having at least two chambers, comprising: first and second longitudinal side rails comprising suspensions; cross members proximate first and second ends of the first and second longitudinal side rails to structurally connect the first and second longitudinal side rails; a first plurality of substrate support elements extending from the first longitudinal side rail; and a second plurality of substrate support elements extending from the second longitudinal side rail. 17. The apparatus of claim 16, wherein said substrate support elements extend about 15-30% of a dimension of the substrate.18. The apparatus of claim 16, wherein the substrate support elements, extending inwardly from the first and second longitudinal side rails, each have a proximal portion extending at least in part upwardly from the first or second longitudinal side rails and a distal portion extending horizontally inwardly from the proximal portion so that when the substrate transfer shuttle is supporting a substrate, an end effector may be accommodated vertically between the substrate and the first and second longitudinal side rails and laterally between at least some of the proximal portions of the substrate support elements.19. The apparatus of claim 18, wherein the distal portions of the first and second plurality of substrate support elements are parallel.20. The apparatus of claim 18, wherein at least one of the distal portions of the substrate support elements is at an angle with respect to at least another of the distal portions of the substrate support elements.21. The apparatus of claim 16, wherein at least the first longitudinal side rail has a portion extending beyond the second cross-member.