초록 ▼

A system for separating particles entrained in a fluid includes a base with a first channel and a second channel. A precision gap connects the first channel and the second channel. The precision gap is of a size that allows small particles to pass from the first channel into the second channel and p

A system for separating particles entrained in a fluid includes a base with a first channel and a second channel. A precision gap connects the first channel and the second channel. The precision gap is of a size that allows small particles to pass from the first channel into the second channel and prevents large particles from the first channel into the second channel. A cover is positioned over the base unit, the first channel, the precision gap, and the second channel. An port directs the fluid containing the entrained particles into the first channel. An output port directs the large particles out of the first channel. A port connected to the second channel directs the small particles out of the second channel.

대표청구항 ▼

1. An apparatus for separating particles entrained in a fluid, some of said particles being of a small size, smaller than a predetermined size, and some of said particles being of a large size, larger than said predetermined size, comprising: a base, a first channel in said base, a second ch

1. An apparatus for separating particles entrained in a fluid, some of said particles being of a small size, smaller than a predetermined size, and some of said particles being of a large size, larger than said predetermined size, comprising: a base, a first channel in said base, a second channel in said base spaced from and substantially parallel to said first channel, a precision gap connecting said first channel and said second channel, said precision gap being selected to allow said small size particles to pass from said first channel into said second channel and preventing said large size particles from passing from said first channel into said second channel, a cover positioned over said base, said first channel, said precision gap, and said second channel, an input port connected to said first channel, an output port connected to said first channel, and a port connected to said second channel. 2. The apparatus for separating particles entrained in a fluid of claim 1 wherein said base is a silicon wafer.3. The apparatus for separating particles entrained in a fluid of claim 1 wherein said cover is a glass plate.4. The apparatus for separating particles entrained in a fluid of claim 1 wherein said first channel and said a second channel are substantially the same length and wherein said precision gap extends between said first channel and said second channel along said length.5. The apparatus for separating particles entrained in a fluid of claim 1 wherein said base is a silicon wafer and said first channel and said second channel are etched channels.6. The apparatus for separating particles entrained in a fluid of claim 5 wherein said precision gap is an etched precision gap.7. A method of producing a particle separator for separating particles entrained in a fluid, some of said particles being of a small size, smaller than a predetermined size, and some of said particles being of a large size, larger than said predetermined size, comprising the steps of: providing a base, etching a first channel in said base, etching a second channel in said base spaced from and substantially parallel to said first channel, etching a precision gap in said base connecting said first channel and said second channel, said precision gap being etched of a size to allow said small size particles to pass from said first channel into said second channel and preventing said large size particles from passing from said first channel into said second channel, positioning a cover over said base, said first channel, said precision gap, and said second channel, providing an input port connected to said first channel for directing said fluid containing said entrained particles into said first channel, providing an output port connected to said first channel for directing said large size particles out of said first channel, and providing a port connected to said second channel for directing said small size particles out of said second channel. 8. The method for separating particles entrained in a fluid of claim 7 wherein said step of providing a base comprises providing a silicon wafer base.9. The method for separating particles entrained in a fluid of claim 7 wherein said step of positioning a cover over said base, said first channel, said precision gap, and said second channel, comprises positioning a glass plate cover over said base, said first channel, said precision gap, and said second channel.10. The method for separating particles entrained in a fluid of claim 7 wherein said first channel and said a second channel are etched so that they are substantially the same length and wherein said precision gap is etched so that it extends between said first channel and said second channel along said length.11. The method for separating particles entrained in a fluid of claim 7 wherein said steps of etching said first channel, said second channel, and said precision gap are accomplished by wet silicon etchin g process.12. The method for separating particles entrained in a fluid of claim 7 wherein said steps of etching said first channel, said second channel, and said precision gap are accomplished by dry etching process.13. The method for separating particles entrained in a fluid of claim 7 wherein said steps of etching said first channel, said second channel, and said precision gap are accomplished by timed etching.14. The method for separating particles entrained in a fluid of claim 7 wherein said step of positioning a cover over said base unit is accomplished by anodically bonding said cover to said base unit.