초록

To separate a composite member consisting of a plurality of bonded members without destructing or damaging it, a fluid is jetted against the composite member from a nozzle to separate it into a plurality of members at a position different from a bonding position.

대표청구항 ▼

1. A method of producing a semiconductor substrate comprising the steps of: preparing a composite member formed by bonding a first substrate comprising a non-porous semiconductor layer on a porous layer to a second substrate so that the non-porous semiconductor layer is positioned inside the compo

1. A method of producing a semiconductor substrate comprising the steps of: preparing a composite member formed by bonding a first substrate comprising a non-porous semiconductor layer on a porous layer to a second substrate so that the non-porous semiconductor layer is positioned inside the composite member; applying a pressure by a fluid to a side surface of the composite member, the side surface having a recessed or narrow gap, to separate the composite member at the porous layer at a position different from the bonding interface between the first and second substrates; and after the separation step, subjecting the non-porous semiconductor layer transferred onto the second substrate to heat treatment in an atmosphere containing hydrogen. 2. The method according to claim 1, wherein the first substrate is formed by, after forming an oxide film on a pore wall of the porous layer, epitaxially growing the non-porous semiconductor layer on the porous layer.3. The method according to claim 1, wherein the porous layer is formed so as to have a first porous region having a first porosity and a second porous region having a second porosity larger than the first porosity.4. The method according to claim 1, wherein the composite member is formed by heat treatment after bonding the first substrate to the second substrate.5. The method according to claim 1, wherein an insulating layer is formed on the non-porous semiconductor layer of the first substrate.6. The method according to claim 1, wherein surfaces to be bonded of the first substrate and the second substrate are subjected to nitrogen plasma treatment before the step of bonding the first substrate to the second substrate.7. The method according to claim 1, wherein the non-porous semiconductor layer is composed of silicon or a compound semiconductor.8. A method of producing a semiconductor substrate comprising the steps of: preparing a composite member formed by bonding a first substrate comprising a non-porous semiconductor layer on an ion-implanted layer to a second substrate so that the non-porous semiconductor layer is positioned inside the composite member; applying a pressure by a fluid to a side surface of the composite member, the side surface having a recessed or narrow gap, to separate the composite member at the ion-implanted layer at a position different from the bonding interface between the first and second substrates; and after the separation step, subjecting the non-porous semiconductor layer transferred onto the second substrate to heat treatment in an atmosphere containing hydrogen. 9. The method according to claim 8, wherein the composite member is formed by heat treatment after bonding the first substrate to the second substrate.10. The method according to claim 8, wherein an insulating layer is formed on the non-porous semiconductor layer of the first substrate.11. The method according to claim 8, wherein surfaces to be bonded of the first substrate and the second substrate are subjected to nitrogen plasma treatment before the step of bonding the first substrate to the second substrate.12. The method according to claim 8, wherein the first substrate is composed of a single-crystalline silicon substrate, an epitaxial silicon layer, and an ion-implanted layer.13. The method according to claim 8, wherein the non-porous semiconductor layer is composed of silicon or a compound semiconductor.