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Transparent elastomeric, contact-mode photolithography mask, sensor, and wavefront engineering element

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G03C-005/00
  • G03F-009/00
출원번호 US-0422611 (1999-10-21)
발명자 / 주소
  • Rogers, John A.
  • Jackman, Rebecca J.
  • Paul, Kateri E.
  • Schueller, Olivier J. A.
  • Breen, Tricia Lynn
  • Whitesides, George M.
출원인 / 주소
  • President and Fellows of Harvard College
대리인 / 주소
    Wolf, Greenfield & Sacks, P.C.
인용정보 피인용 횟수 : 54  인용 특허 : 34

초록

A contact-mode photolithography phase mask includes a diffracting surface having a plurality of indentations and protrusions. The protrusions are brought into contact with a surface of positive photoresist, and the surface exposed to electromagnetic radiation through the phase mask. The phase shift

대표청구항

1. A method comprising:establishing a minimum in intensity of electromagnetic radiation at a predetermined area of a surface of photoresist exposed to the radiation by directing the radiation at the predetermined area while contacting a first portion of the surface, which terminates at the predeterm

이 특허에 인용된 특허 (34)

  1. Hung Paul L. K. (Edison NJ) Tseng Kenneth K. S. (Piscataway NJ), Aqueous akaline developable, UV curable urethane acrylate compounds and compositions useful for forming liquid 100 perce.
  2. Trankle Richard A. (Chicago IL), Backing sheet.
  3. Akkapeddi Prasad R. (Norwalk CT) Hufnagel Robert E. (Ridgefield CT), Contact lithographic fabrication of patterns on large optics.
  4. Akkapeddi Prasad R. (Norwalk CT) Hufnagel Robert E. (Ridgefield CT), Contact lithographic fabrication of patterns on large optics.
  5. Akkapeddi Prasad R. (Norwalk CT) Hufnagel Robert E. (Ridgefield CT), Contact lithographic fabrication of patterns on large optics.
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  7. Everett Patrick N. (Concord MA) Delaney William F. (Millville MA) Griswold Marsden P. (Ashland MA), Device and method for the alignment of masks.
  8. Lein Juergen G. (West Henrietta NY), Exposure drum mask.
  9. Tuulse Tanel (Sdertlje SEX), Exposure of radiation sensitive materials.
  10. Feldman Michael R. ; Suleski Thomas J. ; Delaney William F., Fabricating optical elements using a photoresist formed from contact printing of a gray level mask.
  11. Kumar Amit (Sacramento CA) Whitesides George M. (Newton MA), Formation of microstamped patterns on surfaces and derivative articles.
  12. Bernacki Stephen E. (Worcester MA), Lithographic mask attraction system.
  13. Boudreau Robert A. (Hampton NH), Mask assembly having mask stress relieving feature.
  14. Stansbury Darryl, Mask modification for focal plane on contact photolithography tool.
  15. Mueller Karl-Heinz (Berlin DEX), Method and apparatus for changing the imaging scale in X-ray lithograph.
  16. Parker Kevin J. (Rochester NY) Mitsa Theophano (Iowa City IA), Method and apparatus for halftone rendering of a gray scale image using a blue noise mask.
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  18. Sullivan ; Paul A., Method and apparatus for mask to wafer gap control in X-ray lithography.
  19. Utaka Katsuyuki (Musashino JPX) Akiba Shigeyuki (Tokyo JPX) Matsushima Yuichi (Tanashi JPX), Method for manufacturing diffraction grating.
  20. Lee Ruojia (Boise ID) Rolfson J. Brett (Boise ID), Method of fabricating a chromeless phase shift reticle.
  21. Okai Makoto (Tokyo JPX) Tsuji Shinji (Tokyo JPX) Ohishi Akio (Tokyo JPX) Hirao Motohisa (Tokyo JPX) Matsumura Hiroyoshi (Iruma JPX) Harada Tatsuo (Tokyo JPX) Kita Toshiaki (Tokyo JPX) Taira Hideki (T, Optical device diffraction gratings and a photomask for use in the same.
  22. Speckbacher Peter,DEX ; Flatscher Georg,DEX ; Allgauer Michael,DEX ; Bayer Erich,DEX ; Spanner Erwin,DEX ; Franz Andreas,DEX, Phase grating and method of producing phase grating.
  23. Steinmann Alfred (Praroman CHX), Phenylacetates and their use in radiation sensitive compositions.
  24. Park Byung-Sun (Yusong-ku KRX) Oh Yong-Ho (Joong-ku KRX) Choi Sang-Soo (Yusong-ku KRX) Yoo Hyung-Joun (Yusong-ku KRX), Photomask for forming T-gate electrode of the semiconductor device.
  25. Nakane Hisashi (Kawasaki JPX), Photomasks for photolithographic fine patterning.
  26. Estes Howard S. (Houston TX), Polymeric composite lead wire and method for making same.
  27. Sullivan Donald F. (56 W. White Oak Rd. Paradise PA 17562), Printed wiring board.
  28. Deckman Harry W. (Clinton NJ) Dunsmuir John H. (Annandale NJ), Procedure for fabrication of microstructures over large areas using physical replication.
  29. Schneider Martin Victor (Holmdel NJ), Process for contact photolithography utilizing a photomask having indented channels.
  30. Okamoto Yoshihiko (Ohme JPX), Process for manufacturing semiconductor integrated circuit device, exposure method and mask for the process.
  31. Kamitakahara Hirofumi (Yokohama JPX), Process for producing molding stamper for data recording medium substrate.
  32. Kraus Heinz (Traunreut DEX), Radiation mask for the lithographic production of patterns.
  33. Jaskie James E. (Scottsdale AZ), Tunable diffraction grating.
  34. DiMilia Vincent (Carmel NY) Warlaumont John M. (Chappaqua NY), Variable magnification mask for X-ray lithography.

이 특허를 인용한 특허 (54)

  1. Hyde,Roderick A.; Myhrvold,Nathan P., Active mask lithography.
  2. Omenetto, Fiorenzo; Kaplan, David L.; Lawrence, Brian; Cronin-Golomb, Mark, Biopolymer optofluidic device and method of manufacturing the same.
  3. Choi,Byung Jin; Sreenivasan,Sidlgata V.; Watts,Michael P. C., Capillary imprinting technique.
  4. Watts,Michael P. C.; Voisin,Ronald D.; Sreenivasan,Sidlgata V., Compliant hard template for UV imprinting.
  5. Sreenivasan, Sidlgata V.; Choi, Byung-Jin; Voisin, Ronald D., Conforming template for patterning liquids disposed on substrates.
  6. Sreenivasan,Sidlgata V; Choi,Byung J.; Voisin,Ronald D., Conforming template for patterning liquids disposed on substrates.
  7. Wu, Jigang; Pang, Shuo; Yang, Changhuei, Delayed emission detection devices and methods.
  8. Ho, Peter Chi Fai, Device and method for capturing a surface of an object.
  9. Bailey, Todd C.; Choi, Byung-Jin; Colburn, Matthew E.; Sreenivasan, Sidlgata V.; Willson, Carlton G.; Ekerdt, John G., Device for holding a template for use in imprint lithography.
  10. Hyde, Roderick A.; Myhrvold, Nathan P., Electroactive polymers for lithography.
  11. Hyde, Roderick A.; Myhrvold, Nathan P., Electroactive polymers for lithography.
  12. Hyde, Roderick A.; Myhrvold, Nathan P., Electroactive polymers for lithography.
  13. Hyde,Roderick A.; Myhrvold,Nathan P., Electroactive polymers for lithography.
  14. Cui, Xiquan; Lee, Lap Man; Yang, Changhuei, Focal plane adjustment by back propagation in optofluidic microscope devices.
  15. Voisin, Ronald D., Imprint alignment method, system and template.
  16. Voisin, Ronald D., Imprint alignment method, system, and template.
  17. Bailey,Todd C.; Choi,Byung Jin; Colburn,Matthew E.; Sreenivasan,Sidlgata V.; Willson,Carlton G.; Ekerdt,John G., Imprint lithography template having a feature size under 250 nm.
  18. McMackin,Ian M.; Lad,Pankaj B.; Truskett,Van N., Imprint lithography template to facilitate control of liquid movement.
  19. DeSimone, Joseph M.; Denison Rothrock, Ginger; Maynor, Benjamin W.; Rolland, Jason P., Isolated and fixed micro and nano structures and methods thereof.
  20. DeSimone, Joseph M.; Rothrock, Ginger Denison; Maynor, Benjamin W.; Rolland, Jason P., Isolated and fixed micro and nano structures and methods thereof.
  21. Kobrin, Boris, Large area nanopatterning method and apparatus.
  22. Kobrin, Boris; Volf, Boris; Landau, Igor, Large area nanopatterning method and apparatus.
  23. Zheng, Guoan; Yang, Changhuei, Light-field pixel for detecting a wavefront based on a first intensity normalized by a second intensity.
  24. Maly, Wojciech P., Lithography and associated methods, devices, and systems.
  25. Kobrin, Boris, Mask for near-field lithography and fabrication the same.
  26. Kobrin, Boris, Method and device for patterning a disk.
  27. Fattinger, Christof, Method for preparing an outer surface of a planar waveguide to be capable of binding target samples along a plurality of predeterminded lines and a planar waveguide.
  28. Choi, Byung-Jin; Sreenivasan, Sidlgata V.; Willson, Carlton Grant; Colburn, Mattherw E.; Bailey, Todd C.; Ekerdt, John G., Method of automatic fluid dispensing for imprint lithography processes.
  29. Bailey,Todd; Choi,Byung J.; Colburn,Matthew; Sreenivasan,Sidlgata V.; Willson,C. Grant; Ekerdt,John, Method of creating a dispersion of a liquid on a substrate.
  30. Hong, Pil-Soon, Method of manufacturing imprint substrate and imprinting method.
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  34. DeSimone, Joseph M.; Rolland, Jason P.; Maynor, Benjamin W.; Euliss, Larken E.; Rothrock, Ginger Denison; Dennis, Ansley E.; Samulski, Edward T.; Samulski, R. Jude, Methods for fabricating isolated micro- or nano-structures using soft or imprint lithography.
  35. DeSimone, Joseph M.; Rolland, Jason P.; Maynor, Benjamin W.; Euliss, Larken E.; Rothrock, Ginger Denison; Dennis, Ansley E.; Samulski, Edward T.; Samulski, R. Jude, Methods for fabricating isolated micro- or nano-structures using soft or imprint lithography.
  36. DeSimone, Joseph M.; Rolland, Jason P.; Maynor, Benjamin W.; Euliss, Larken E.; Rothrock, Ginger Denison; Dennis, Ansley E; Samulski, Edward T.; Samulski, R. Jude, Methods for fabricating isolated micro-and nano-structures using soft or imprint lithography.
  37. Sharma, Ashutosh; Verma, Ankur; Kulkarni, Giridhar U., Micropattern generation with pulsed laser diffraction.
  38. Sharma, Ashutosh; Verma, Ankur; Kulkarni, Giridhar U., Micropattern generation with pulsed laser diffraction.
  39. McMackin,Ian M.; Lad,Pankaj B., Moat system for an imprint lithography template.
  40. Hyde, Roderick A.; Myhrvold, Nathan P., Multilayer active mask lithography.
  41. Hyde, Roderick A.; Myhrvold, Nathan P., Multilayer active mask lithography.
  42. Kaplan, David; Omenetto, Fiorenzo; Lawrence, Brian; Cronin-Golomb, Mark, Nanopatterned biopolymer optical device and method of manufacturing the same.
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  44. Kitamura,Mitsuru, Optical element.
  45. Cui, Xiquan; Heng, Xin; Lee, Lap Man; Yang, Changhuei, Optofluidic microscope device with photosensor array.
  46. DeSimone, Joseph M.; Rolland, Jason P.; Quake, Stephen R.; Schorzman, Derek A.; Yarbrough, Jason; Van Dam, Michael, Photocurable perfluoropolyethers for use as novel materials in microfluidic devices.
  47. Strauss, Dennis R., Photolithographic method and apparatus employing a polychromatic mask.
  48. Marsh, Eugene P., Porous organosilicate layers, and vapor deposition systems and methods for preparing same.
  49. Cui, Xiquan; Yang, Changhuei, Quantitative differential interference contrast (DIC) devices for computed depth sectioning.
  50. Cui, Xiquan; Yang, Changhuei; Tearney, Guillermo J., Quantitative differential interference contrast (DIC) microscopy and photography based on wavefront sensors.
  51. Zheng, Guoan; Yang, Changhuei; Yang, Samuel; Lee, Seung Ah, Super resolution optofluidic microscopes for 2D and 3D imaging.
  52. Xu, Xiangling; Vanier, Noel R.; Purdy, Sean, Thermally responsive crystalline colloidal arrays.
  53. Cui, Xiquan; Yang, Changhuei; Tearney, Guillermo J., Wavefront imaging devices comprising a film with one or more structured two dimensional apertures and their applications in microscopy and photography.
  54. Cui, Xiquan; Yang, Changhuei, Wavefront imaging sensor.
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