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Controllable electro-optical patternable mask, system with said mask and method of using the same 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • A61F-009/008
출원번호 US-0207947 (2002-07-31)
발명자 / 주소
  • Ruiz, Antonio
  • Matallana, Eduardo
대리인 / 주소
    Smith, Gambrell & Russell, LLP
인용정보 피인용 횟수 : 11  인용 특허 : 44

초록

An electro-optical patternable mask is provided which is controllable by way of a processor for presenting a variety of patterns to electromagnetic radiation. In one embodiment of the mask, the electro-optical mask includes an electrochromic layer that works in conjunction with deposited electrode l

대표청구항

1. A patternable mask system for controlling the transmission of electromagnetic radiation, comprising:a patternable electro-optical mask having a plurality of individual pixel cells with individually adjustable states of transmission with respect to electromagnetic radiation, and said pixel cells i

이 특허에 인용된 특허 (44)

  1. Kobayashi Hideo,JPX ; Ohtake Katsuhiro,JPX, Albada type finder and camera therefor having a movable mask.
  2. L\Esperance ; Jr. Francis A. (Englewood NJ), Apparatus for performing ophthalmogolical surgery.
  3. L\Esperance ; Jr. Francis A. (Englewood NJ), Apparatus for performing ophthalmological surgery.
  4. Barnes Michael S. (Mahopac NY) Coultas Dennis K. (Hopewell Junction NY) Forster John C. (Poughkeepsie NY) Keller John H. (Newburgh NY), Ceramic electrostatic wafer chuck.
  5. Luis Antonio Ruiz CO; Eduardo Matallana CO, Controllable electro-optical patternable mask, system with said mask and method of using the same.
  6. Luis Antonio Ruiz CO; Eduardo Matallana CO, Controllable liquid crystal matrix mask particularly suited for performing ophthamological surgery, a laser system with said mask and a method of using the same.
  7. King Michael C. (Carlisle MA) Klopotek Peter J. (Framingham MA), Correction of presbyopia by photorefractive keratectomy.
  8. Brotman Lynne Shapiro ; Farber James M. ; Stern Benjamin J., Disambiguation of alphabetic characters in an automated call processing environment.
  9. Liao York,HKX ; Kwok Hoi Sing,HKX, Electro-Optic display providing a grey scale by utilizing voltage dependent birefringence.
  10. Notten Petrus H. L.,NLX ; Boonekamp Erik P.,NLX ; Krings Leo H. M.,NLX ; Van De Ven Johan,NLX, Electro-optical switching device.
  11. Johnson Leo F. (Bedminster NJ) Singh Shobha (Summit NJ) Van Uitert LeGrand G. (Morris Township ; Morris County NJ), Electrochromic optical device.
  12. Nizzola Guido M. (Modena ITX), Equipment for the correction of presbyopia by remodelling the corneal surface by means of photo-ablation.
  13. Sasnett Michael W. ; Austin R. Russel, Fluence monitoring apparatus for pulsed-laser corneal reshaping system.
  14. Sasnett Michael W. ; Austin R. Russel, Fluence monitoring method for laser treatment of biological tissue.
  15. Schraivogel Rainer A.,CHX ; Plangger Guido,CHX, Interconnection structure with raised perimeter portions.
  16. Mori Akira,JPX ; Okubo Hideaki,JPX ; Saito Yoshinori,JPX ; Kato Misao,JPX, Laser marking device.
  17. Chiba Teiichiro,JPX ; Okubo Tsuyoshi,JPX ; Sugimoto Yukihiko,JPX, Laser marking method and apparatus and liquid crystal element driving method.
  18. Matsumura Yukinori,JPX ; Tanaka Hirokazu,JPX, Laser marking method including raster scanning of rapidly rewritten liquid crystal mask.
  19. Muller David F. (Boston MA), Laser reprofiling systems and methods.
  20. Trokel Stephen, Laser surgery apparatus and method.
  21. Tanaka Hirokazu,JPX ; Ohkubo Tsuyoshi,JPX ; Yamazaki Taku,JPX, Liquid crystal mask, liquid crystal laser marker, and marking method using the same.
  22. Liu Yung S. (Schenectady NY), Liquid crystal programmable photoresist exposure method for making a set of masks.
  23. Liu Yung S. (Schenectady NY), Liquid crystal programmable photoresist exposure system.
  24. Verlinden Bartholomeus,BEX ; Steenhoudt Pascale,BEX, Material comprising a layer on a glass support.
  25. Mori Akira (Chigasaki JPX) Hagiwara Shigeki (Hiratsuka JPX) Tanaka Hirokazu (Hiratsuka JPX), Method and device for color laser marking.
  26. Shimmick John K. (Redwood City CA) Telfair William B. (San Jose CA) Munnerlyn Charles R. (Sunnyvale CA) Glockler Herrmann J. (Cupertino CA), Method and system for laser treatment of refractive error using an offset image of a rotatable mask.
  27. L\Esperance ; Jr. Francis A. (Englewood NJ), Method for opthalmological surgery.
  28. L\Esperance ; Jr. Francis A. (Englewood NJ), Method for performing ophthalmic laser surgery.
  29. Bogner Udo (Othlostrasse 9 D-8400 Regensburg DEX), Method for providing separately adjustable voltage dependent optical properties.
  30. Miyauchi Tateoki (Yokohama JPX) Hongo Mikio (Yokohama JPX) Maruyama Shigenobu (Yokohama JPX) Mizukoshi Katsurou (Yokohama JPX) Yamaguchi Hiroshi (Fujisawa JPX) Morita Koyo (Yamanashi JPX), Method of cutting interconnection pattern with laser and apparatus thereof.
  31. Fujieda Masanao,JPX ; Ban Yukinobu,JPX ; Otsuki Kan,JPX, Ophthalmic apparatus.
  32. Lin J. T. (Winter Springs FL), Ophthalmic surgery method using non-contact scanning laser.
  33. Auracher Franz (Baierbrunn DEX) Buerk Hermann (Maisach DEX) Keil Rudolf (Munich DEX) Stockmann Michael (Munich DEX) Weingand Kaspar (Duernbach DEX) Zeitler Karl-Heinz (Munich DEX), Optical device or switch for controlling radiation conducted in an optical waveguide.
  34. Miyasaka Tsutomu (Kanagawa JPX) Shizukuishi Makoto (Kanagawa JPX), Optical response element.
  35. Van Der Sluis Paul,NLX ; Ouwerkerk Martin,NLX ; Duine Peter A.,NLX, Optical switching device comprising switchable hydrides.
  36. Raven Anthony (Royston GB2) Marshall John (Farnborough GB2), Photocoagulation apparatus.
  37. Chikamichi Shoichi,JPX, Process for forming a photosensitive material and an exposure apparatus used for the process.
  38. Dreher Andreas W. (P.O. Box 22858 San Diego CA 92192) Reiter Klaus (Ploeck II W-6900 Heidelberg DEX), Retinal eye disease diagnostic system.
  39. Klopotek Peter J. (Framingham MA), Rotatable aperture apparatus and methods for selective photoablation of surfaces.
  40. Raven Antony L. (Hertfordshire GBX) Marshall John (Hants MA GBX) Muller David F. (Boston MA), Surface shaping using lasers.
  41. Miehle Mark R. ; Ignotz Keith ; Banfiel Ronald ; Morgan Nathan ; Moore Bryan, System and method for diagnosing vision disorders.
  42. Saika Tetsuyuki,JPX, Thiophene derivative and the polymer thereof and methods for production thereof.
  43. Haisma Jan,NLX, Three-dimensional image display system.
  44. Pfleiderer Hans-Joerg (Zorneding DEX) Knauer Karl (Kirchseon DEX), Transversal filter having an analog shift register.

이 특허를 인용한 특허 (11)

  1. Eaton, David L.; Guarr, Thomas F.; Ash, Kevin L.; Theiste, David A., Controller configured for an electro-optic device and method thereof.
  2. Mimura, Yasuhiro, Display panel and display device.
  3. Driscoll, David I.; Adamski, Christopher J., Electro-optic window control system.
  4. Barbour, Randall L., Electronically modulated dynamic optical phantoms for biomedical imaging.
  5. Bleeker, Arno Jan, Lithographic apparatus and device manufacturing method.
  6. Bleeker,Arno Jan, Lithographic apparatus and device manufacturing method.
  7. Bornfreund, Richard E., Monolithic electro-optical polymer infrared focal plane array.
  8. Busscher, Bradley L.; Driscoll, David I.; Mitchell, Andrew T.; Ash, Kevin L., Multi-piece bezel for electro-optic window assembly.
  9. Tseng, Ling-Yuan; Liao, Cheng-Hsing; Kusada, Atsuo, Tunable liquid crystal lens module.
  10. Ash, Kevin L.; Busscher, Bradley L.; Turnbull, Robert R.; Neuman, George A.; Cammenga, David J.; Theiste, David A., Variable transmission window system.
  11. Ash, Kevin L.; Busscher, Bradley L.; Turnbull, Robert R.; Neuman, George A.; Cammenga, David J.; Theiste, David A., Variable transmission window system.
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