초록 ▼

An apparatus, typically a sealing member extending around the periphery of a substrate support or chuck, seals an individual substrate with respect to a substrate support, typically in a processing chamber. The seal is of a corrugated shape, that enhances clamping forces, typically from electrostati

An apparatus, typically a sealing member extending around the periphery of a substrate support or chuck, seals an individual substrate with respect to a substrate support, typically in a processing chamber. The seal is of a corrugated shape, that enhances clamping forces, typically from electrostatic or mechanical clamps, to provide a seal between it and the substrate, for example a wafer.

대표청구항 ▼

1. An apparatus for clamping a substrate, comprising:a substrate support;a clamp coupled to said substrate support, said clamp configured for moving between a first inactive position, and a second active position, where a substrate is secured to said substrate support;a corrugated shaped seal positi

1. An apparatus for clamping a substrate, comprising:a substrate support;a clamp coupled to said substrate support, said clamp configured for moving between a first inactive position, and a second active position, where a substrate is secured to said substrate support;a corrugated shaped seal positioned around a periphery of said substrate support, said seal configured to provide a seal between the substrate support and the substrate, said seal having:a first arm member in communication with said base portion;a first “U” shaped groove intermediate said first arm member and said base portion;a second arm member in communication with said first arm member, said first arm extends inward beyond said second arm; anda second “U” shaped groove intermediate said first arm member and said second arm member, said first “U” shaped groove and said second “U” shaped groove defining said corrugated shape in said seal. 2. The apparatus of claim 1, wherein said second arm member includes at least one protrusion. 3. The apparatus of claim 1, wherein said protrusion includes at least one edge, said at least one edge in a rounded shape. 4. The apparatus of claim 1, wherein said clamp is a mechanical clamp. 5. The apparatus of claim 1, wherein said clamp is an electrostatic clamp. 6. An apparatus for clamping a substrate within a processing chamber comprising:a clamp configured for holding the substrate to an upper surface of a chuck;a substrate release; anda corrugated shaped seal for sealing the substrate with respect to the chuck, said seal configured for extending around a periphery of the chuck, said seal having:a first arm member in communication with said base portion;a first “U” shaped groove intermediate said first arm member and said base portion;a second arm member in communication with said first arm member, said first arm extends inward beyond said second arm; anda second “U” shaped groove intermediate said first arm member and said second arm member, said first “U” shared groove and said second “U” shaped groove defining said corrugated shape in said seal. 7. The apparatus of claim 6, wherein said second arm member includes at least one protrusion. 8. The apparatus of claim 7, wherein said protrusion includes at least one edge, said at least one edge in a rounded shape. 9. The apparatus of claim 6, wherein said clamp is a mechanical clamp and said chuck is a mechanical chuck. 10. The apparatus of claim 6, wherein said clamp is an electrostatic clamp and said chuck is an electrostatic chuck. 11. The apparatus of claim 6, wherein said substrate release include lift pins.