초록 ▼

A photocurable and thermosetting resin composition comprises (A) a high purity synthetic silica powder having a uranium content of not more than 1.0 ppb, (B) a photosensitive prepolymer containing a carboxylic group and at least two ethylenically unsaturated groups in its molecule and having an acid

A photocurable and thermosetting resin composition comprises (A) a high purity synthetic silica powder having a uranium content of not more than 1.0 ppb, (B) a photosensitive prepolymer containing a carboxylic group and at least two ethylenically unsaturated groups in its molecule and having an acid value of solid content of 50 to 150 mg KOH/g, (C) a photosensitive (meth)acrylate compound, (D) a photopolymerization initiator, (E) an epoxy resin, and (F) a curing catalyst. A cured film which emits alpha rays at a fully low dose is obtained by forming a film of the composition on a substrate, subjecting the film to exposure to light and development, and finally curing the coating film by irradiation with active energy rays and/or thermal curing.

대표청구항 ▼

1. An alkali-developable, photocurable and thermosetting solder resist composition, comprising: (A) a high purity synthetic silica powder having a uranium content of not more than 1.0 ppb, (B) a photosensitive prepolymer containing a carboxylic group and at least two ethylenically unsaturated groups

1. An alkali-developable, photocurable and thermosetting solder resist composition, comprising: (A) a high purity synthetic silica powder having a uranium content of not more than 1.0 ppb, (B) a photosensitive prepolymer containing a carboxylic group and at least two ethylenically unsaturated groups in its molecule and having an acid value of solid content of 50 to 150 mg KOH/g, (C) a photosensitive (meth)acrylate compound, (D) a photopolymerization initiator, (E) an epoxy resin, and (F) a curing catalyst,wherein said high purity synthetic silica powder has an average particle diameter of not more than 10.0 μm and is present in an amount of 5 to 40 parts by weight, based on 100 parts by weight of the composition, and said photosensitive prepolymer (B) is at least one compound selected from the group consisting of:(1) a photosensitive prepolymer obtained by the reaction of (a) a polyfunctional epoxy compound having at least two epoxy groups in its molecule with (b) an unsaturated monocarboxylic acid and the subsequent reaction of (c) a saturated or unsaturated polybasic acid anhydride with a hydroxyl group caused by said reaction,(2-1) a photosensitive prepolymer obtained by the reaction of (a) a polyfunctional epoxy compound having at least two epoxy groups in its molecule with (b) an unsaturated monocarboxylic acid and (d-1) a compound having one reactive group other than an alcoholic hydroxyl group capable of reacting with an epoxy group in its molecule, and the subsequent reaction of (c) a saturated or unsaturated polybasic acid anhydride with a product of said reaction, and(2-2) a photosensitive prepolymer obtained by the reaction of (a) a polyfunctional epoxy compound having at least two epoxy groups in its molecule with (b) an unsaturated monocarboxylic acid and (d-2) a compound having at least one alcoholic hydroxyl group and one reactive group other than an alcoholic hydroxyl group capable of reacting with an epoxy group in its molecule, and the subsequent reaction of (c) a saturated or unsaturated polybasic acid anhydride with a product of said reaction. 2. The composition according to claim 1, further comprising an organic solvent. 3. The composition according to claim 1, further comprising a filler other than said high purity synthetic silica powder which does not emit alpha rays. 4. The composition according to claim 1, further comprising at least one compound selected from the group consisting of a coloring agent, a thermal polymerization inhibitor, an anti-foaming agent, a leveling agent, and a silane coupling agent. 5. A cured film obtained by a method which comprises:a step of forming a resist pattern on a substrate by forming a film of the photocurable and thermosetting solder resist composition set forth in claim 1 on the substrate and subjecting the resultant film to exposure to light and development, anda step of curing the film of the resultant resist pattern. 6. The cured film according to claim 5, wherein said formation of the film on the substrate is performed by applying the photocurable and thermosetting resin composition to the substrate and drying it. 7. The cured film according to claim 5, wherein said formation of the film on the substrate is performed by laminating a dry film of the photocurable and thermosetting resin composition on the substrate. 8. The cured film according to claim 5, wherein said step of curing the coating film is carried out by subjecting to irradiation with active energy rays and subsequent thermal curing, or to thermal curing and subsequent irradiation with active energy rays, or to thermal curing only. 9. A printed circuit board having a solder resist film formed on a circuit board provided with a conductor layer of a prescribed circuit pattern, wherein said solder resist film is formed from a cured film of the photocurable and thermosetting solder resist composition set forth in claim 1. 10. The printed circuit board according to claim 9, wherein said cured film i s obtained by subjecting said composition to irradiation with active energy rays and/or thermal curing.