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Chemical vapor deposition apparatus and method 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • C23C-016/08
출원번호 US-0950013 (2001-09-10)
발명자 / 주소
  • Warnes, Bruce M.
  • Purvis, Andrew L.
  • Near, Daniel L.
출원인 / 주소
  • Howmet Research Corporation
대리인 / 주소
    Timmer Edward J.
인용정보 피인용 횟수 : 6  인용 특허 : 28

초록

Chemical vapor deposition apparatus and method are provided with external metal halide gas generators that reduce leakage of air into the generators so as to improve efficiency of use of the metal charge residing in each generator.

대표청구항

1. A method of chemical vapor deposition, comprising flowing coating gas into in a preheat conduit disposed in and along a length of a heated coating chamber, heating said coating gas as it flows through said preheat conduit, and discharging the preheated coating gas into a gas distribution conduit

이 특허에 인용된 특허 (28)

  1. Rigney David V. (Cincinnati OH), Apparatus and method for gas phase coating of hollow articles.
  2. Hirao Takashi,JPX ; Yoshida Akihisa,JPX ; Kitagawa Masatoshi,JPX, Apparatus and method of manufacturing semiconductor element.
  3. Benden Robert S. (Manchester CT) Parzuchowski Richard S. (Bethel CT), Apparatus for gas phase deposition of coatings.
  4. Vaudel Serge (Teuillac FRX), Apparatus for preheating a flow of gas in an installation for chemical vapor infiltration, and a densification method us.
  5. Rudolph James W. (Colorado Springs CO) Purdy Mark J. (Akron OH) Bok Lowell D. (Anna OH), Apparatus for use with CVI/CVD processes.
  6. Fisher Ronald (Rugby GB2) Smith Norman (Rugby GB2), Apparatus for vapor deposition on tubular substrate.
  7. Punola David C. (Muskegon MI) Basta William C. (Montague MI) Smith Jeffery S. (Muskegon MI), CVD apparatus and method for forming uniform coatings.
  8. Caputo Anthony J. (Knoxville TN) Devore Charles E. (Knoxville TN) Lowden Richard A. (Powell TN) Moeller Helen H. (Concord VA), CVD apparatus and process for the preparation of fiber-reinforced ceramic composites.
  9. Brien Guy (Farnham CAX) Cloutier Richard (Granby CAX) Darwall Edward C. D. (Waterloo CAX) Szolgyemy Laszlo (Bromont CAX), Chemical vapor deposition apparatus with manifold enveloped by cooling means.
  10. Hampden-Smith Mark ; Kunze Klaus ; Nyman May, Chemical vapor deposition of metal sulfide films from metal thiocarboxylate complexes with monodenate or multidentate li.
  11. Mahajan Roop L. (Lawrenceville NJ) Ristorcelli ; Jr. Joseph R. (Belle Mead NJ), Chemical vapor deposition reactor for silicon epitaxial processes.
  12. Miyazaki Shinji (Yokohama JPX), Chemical vapor growth apparatus having an exhaust device including trap.
  13. Lackey Walter Jackson ; Vaidyaraman Sundar, Fabrication of carbon/carbon composites by forced flow-thermal gradient chemical vapor infiltration.
  14. Sarin Vinod K. (Lexington MA) D\Angelo Charles (Southboro MA) Rebenne Helen E. (Westboro MA), Internal reactor for chemical vapor deposition.
  15. Howard Peter ; Williams Michael ; Rahemanji Suebali ; Lucas Scott ; Yi Chong, Method and apparatus for gas phase coating complex internal surfaces of hollow articles.
  16. Schmitt Jerome J. (265 College St. (12N) New Haven CT 06510), Method and apparatus for the deposition of solid films of a material from a jet stream entraining the gaseous phase of s.
  17. Ahmed Irfan (31 Bradford Rd. Framingham MA 01701), Method for etching and controlled chemical vapor deposition.
  18. Arima Noburu (Kubiki JPX) Ogino Nobuyosi (Tokyo JPX) Kimura Hirosi (Takefu JPX), Method of forming thin film and apparatus therefor.
  19. Golecki Ilan (Parsippany NJ) Morris Robert C. (Ledgewood NJ) Narasimhan Dave (Flemington NJ), Method of rapidly densifying a porous structure.
  20. Garo J. Derderian ; Gordon Morrison, Preheating of chemical vapor deposition precursors.
  21. Lackey ; Jr. Walter J. (Oak Ridge TN) Caputo Anthony J. (Knoxville TN), Process for the preparation of fiber-reinforced ceramic composites by chemical vapor deposition.
  22. Gero Lawrence R. ; Rowell David M., Process tube with in-situ gas preheating.
  23. Ban Vladimir S. (Hopewell NJ), Radiation heated reactor process for chemical vapor deposition on substrates.
  24. Inokuchi Yasuhiro,JPX ; Ikeda Fumihide,JPX, Substrate processing apparatus having a gas heating tube.
  25. Bohannon Kenneth W. (Puyallup WA) Srikrishna Kuppuswamy (Puyallup WA) Sholing Anthony F. (Spanaway WA) Reder Steven E. (Puyallup WA), Tube and injector for preheating gases in a chemical vapor deposition reactor.
  26. Gauje Georges M. C. A. (Saulx les Chartreux FRX), Vapor phase process for the deposition of a protective metal coating on a metallic piece.
  27. Christin Fran.cedilla.ois,FRX ; Daubigny Pierre,FRX ; Delaurens Pierre,FRX ; Leluan Jean-Luc,FRX, Vapour phase chemical infiltration process for densifying porous substrates disposed in annular stacks.
  28. Watanabe Singo (Aikawa JPX) Okase Wataru (Sagamihara JPX), Vertical type diffusion apparatus.

이 특허를 인용한 특허 (6)

  1. Kirkendall, Willard N.; Meade, Scott A.; Clemens, Donald R., Internal airfoil component electroplating.
  2. Kirkendall, Willard N.; Meade, Scott A.; Clemens, Donald R., Internal turbine component electroplating.
  3. Lamouroux, Franck; Bertrand, Sébastien; Goujard, Stéphane; Caillaud, Alain; Bagilet, Francis; Mazereau, Stéphane, Method of densifying thin porous substrates by chemical vapor infiltration, and a loading device for such substrates.
  4. Lamouroux, Franck; Bertrand, Sébastien; Goujard, Stéphane; Caillaud, Alain; Bagilet, Francis; Mazereau, Stéphane, Method of densifying thin porous substrates by chemical vapor infiltration, and a loading device for such substrates.
  5. Murphy, Kenneth S., Pt-Al-Hf/Zr coating and method.
  6. Fairbourn, David C., Simple chemical vapor deposition systems for depositing multiple-metal aluminide coatings.
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