초록 ▼

The method for selective deposition of Co—W—P system films onto copper with palladium-free activation consists of creating hydrogen-rich complexes on the metal surface prior to deposition. More specifically, the method consists of creating the aforementioned complexes on the copper sur

The method for selective deposition of Co—W—P system films onto copper with palladium-free activation consists of creating hydrogen-rich complexes on the metal surface prior to deposition. More specifically, the method consists of creating the aforementioned complexes on the copper surfaces prior to electroless deposition of a Co—W—P system films. This is achieved by contacting the copper surface with reducing agents for a short period of time and under an elevated temperature. Such reducing agents comprise a hypophosphorous-acid-based or borane-based reducing agents such as dimethylamine borane. Hypophosphorous acid is preferred since it is more compatible with the electroless deposition solution.

대표청구항 ▼

1. A method for electroless deposition of a phosphorus-containing metal film onto copper having oxides on the copper surface with palladium-free activation, comprising the steps of:forming complexes with a high level of hydrogen by bringing said copper surface into contact with an aqueous solution o

1. A method for electroless deposition of a phosphorus-containing metal film onto copper having oxides on the copper surface with palladium-free activation, comprising the steps of:forming complexes with a high level of hydrogen by bringing said copper surface into contact with an aqueous solution of a reducing agent;forming said complexes on said copper surface thus reducing copper from said oxides and protecting said copper surface from oxidation; and thendepositing the phosphorus-containing metal film onto said copper surface by electroless deposition. 2. The method of claim 1, wherein said phosphorus-containing metal film is a cobalt-tungsten-phosphorus film. 3. The method of claim 1, wherein said reducing agent is selected from the group consisting of a hypophosphorous acid and amine boranes. 4. The method of claim 1, where said step of forming said complexes comprises maintaining said aqueous solution within a temperature range from 20° C. to approximately 100° C. 5. The method of claim 1, wherein said step of forming said complexes is carried out during a period of time of less than approximately 1 hour. 6. The method of claim 5, wherein said step of forming said complexes is carried out during a period of time from approximately 5 seconds to approximately 30 seconds. 7. The method of claim 1, further comprising a step of removing said complexes from said copper surface with a rinsing solution thus imparting selective catalytic properties to said copper surface with regard to said phosphorus-containing metal film. 8. The method of claim 7, wherein said rinsing solution is deionized water. 9. The method of claim 2, wherein said copper surface comprises interconnects on an integrated circuit, and wherein the step of depositing comprises a barrier layer on said copper interconnects, said barrier layer being made from said cobalt-tungsten-phosphorus film. 10. The method of claim 1, wherein said phosphorus-containing metal film is made from a metal alloy selected from the group consisting of a nickel-based alloy and a cobalt-based alloy. 11. The method of claim 1, wherein said phosphorus-containing metal film contains tungsten or molybdenum as a second metal component. 12. The method of claim 2, wherein said phosphorus-containing metal film further contains molybdenum. 13. The method of claim 1, wherein the aqueous solution of the reducing agent is distinct from a deposition solution used for the electroless deposition of the phosphorus-containing metal film. 14. A method for electroless deposition of a phosphorus-containing film onto copper, comprising:exposing a copper surface to a catalytic activation solution comprising a hypophosphorous acid based reducing agent; andsubsequently exposing the copper surface to a deposition solution comprising a hypophosphite based reducing agent. 15. The method of claim 14, where the step of exposing the copper surface to the catalytic activation solution comprises maintaining the catalytic activation solution within a temperature range between approximately 20° C. and approximately 100° C. 16. The method of claim 15, where the step of exposing the copper surface to the catalytic activation solution comprises heating the catalytic activation solution to a temperature greater than approximately 85° C. 17. The method of claim 14, wherein the step of exposing the copper surface to the catalytic. activation solution comprises exposing the copper surface to the catalytic activation solution for less than approximately 1 hour. 18. The method of claim 14, wherein the catalytic activation solution is essentially absent of palladium. 19. The method of claim 14, wherein the catalytic activation solution is essentially absent of akali salts. 20. The method of claim 14, wherein the catalytic activation solution comprises an additional source of hydrogen other than the hypophosphorous acid. 21. The method of claim 14, wherein the catalytic activation solution comprises organ ic radicals. 22. A method for depositing a phosphorus-containing film onto copper, comprising:treating a copper layer with a catalytic activation solution comprising a borane amine to cause a reduction reaction of oxides formed upon the copper layer; anddepositing the phosphorus-containing film onto the treated copper layer using an electroless deposition solution distinct from the catalytic activation solution. 23. The method of claim 22, further comprising removing the catalytic activation solution from the treated copper layer prior to the step of depositing the phosphorus-containing film. 24. The method of claim 23, wherein the step of removing comprises rinsing the treated copper layer with deionized water. 25. The method of claim 21, further comprising heating the catalytic activation solution to a temperature greater than approximately 60° C. 26. The method of claim 25, wherein the step of heating the catalytic activation solution comprises heating the catalytic activation solution to a temperature of approximately 100° C. 27. The method of claim 22, wherein the step of treating the copper layer to the catalytic activation solution causes hydrogen-rich complexes to form upon the copper layer.