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SiO 2 —TiO 2 glasses having a low coefficient of thermal expansion are produced by a molding being produced that consists of SiO 2 powder, SiO 2 —TiO 2 powder or TiO 2 powder and that contains by way of secondary component a titanium-containing component which is converted into a

SiO 2 —TiO 2 glasses having a low coefficient of thermal expansion are produced by a molding being produced that consists of SiO 2 powder, SiO 2 —TiO 2 powder or TiO 2 powder and that contains by way of secondary component a titanium-containing component which is converted into amorphous TiO 2 .

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1. A process for producing a homogeneous binary SiO 2 —TiO 2 glass having a low coefficient of thermal expansion of 0.5≦10 −6 /K comprising:providing a composition comprising a dense powder selected from the group consisting of SiO 2 powder, SiO 2 —TiO 2 powder or T

1. A process for producing a homogeneous binary SiO 2 —TiO 2 glass having a low coefficient of thermal expansion of 0.5≦10 −6 /K comprising:providing a composition comprising a dense powder selected from the group consisting of SiO 2 powder, SiO 2 —TiO 2 powder or TiO 2 powder and a mixture thereof and as a secondary component a titanium containing component,forming a moulding from said dense powder having a relative green density>40%, said moulding having open pores,drying and sintering said moulding, andconverting said titanium containing component into amorphous TiO 2 . 2. Process as set forth in claim 1, wherein the titanium-containing component is introduced into said open pores of the moulding after drying of the moulding. 3. Process as set forth in claim 1, wherein the powders that are employed have a diameter between 5 nm and 20 μm. 4. Process as set forth in claim 3, wherein the powders that are employed exhibit an at least bimodal distribution and result in a moulding with a bimodal pore distribution. 5. Process as set forth in claim 4, wherein the powders that are employed exhibit a bimodal distribution from 5 to 100 nm, and 1 to 50 μm. 6. Process as set forth in claim 1, wherein the linear shrinkage on drying amounts to 0.1 to 10%. 7. Process as set forth in claim 1, wherein the linear shrinkage on sintering amounts to less than 30%. 8. Process as set forth in claim 1, wherein a dense SiO 2 TiO 2 glass is formed from the moulding by sintering at temperatures <1,500° C. 9. Process as set forth in claim 4, wherein the powders that are employed exhibit a bimodal distribution from 8 to 80 nm and 5 to 20 μm.