초록 ▼

An apparatus for supporting a substrate and a method for positioning a substrate include a substrate support, a stator circumscribing the substrate support, and an actuator. The actuator is coupled to the stator and adapted to change the elevation of the stator and/or adjust an angular orientation o

An apparatus for supporting a substrate and a method for positioning a substrate include a substrate support, a stator circumscribing the substrate support, and an actuator. The actuator is coupled to the stator and adapted to change the elevation of the stator and/or adjust an angular orientation of the stator relative to its central axis. As the substrate support is magnetically coupled to the stator, a position, i.e., elevation and angular orientation, of the substrate support may be controlled.

대표청구항 ▼

1. Apparatus for supporting a substrate, comprising:a substrate, support;a stator circumscribing and magnetically coupled to the substrate support, wherein the substrate support is rotatable relative to the stator; andan actuator coupled to the stator and adapted to move the stator. 2. The apparatus

1. Apparatus for supporting a substrate, comprising:a substrate, support;a stator circumscribing and magnetically coupled to the substrate support, wherein the substrate support is rotatable relative to the stator; andan actuator coupled to the stator and adapted to move the stator. 2. The apparatus of claim 1 further comprising:a second actuator coupled to the stator; anda third actuator coupled to the stator, the first, second and third actuators arranged in a spaced-apart relationship. 3. The apparatus of claim 1, wherein the first actuator is an electric control motor, a stepper motor, a servo motor, a pneumatic cylinder, a hydraulic cylinder, a bail screw, a solenoid, a linear actuator, or a cam and follower. 4. The apparatus of claim 1, wherein the first actuator is coupled to the stator by a coupling that allows relative movement between the first actuator and the stator. 5. The apparatus of claim 4, wherein the coupling provides motion along a first axis and a second axis that is orientated perpendicular to the first axis. 6. The apparatus of claim 1 further comprising a thermally reflective plate coupled to the substrate support. 7. The apparatus of claim 1, wherein the substrate support further comprises:a support section having a support surface adapted to support the substrate; andat least one post protruding from the support surface and defining at least one notch that extends into the support section. 8. The apparatus of claim 7, wherein the substrate support further comprises:an annular magnetic section coupled to the support section. 9. The apparatus of claim 8, wherein the magnetic section further comprises:a plurality of outwardly extending flanges disposed in a polar army about a centerline of the substrate support. 10. Apparatus for supporting a substrate, comprising:an annular substrate support having a central axis;a stator circumscribing and magnetically coupled to the substrate support, wherein the substrate support is rotatable relative to the stator;a first actuator coupled to the stator, the first actuator adapted to move the stator along or change the angular orientation of the stator relative to the central axis;a second actuator coupled to the stator; anda third actuator coupled to the stator the first, second and third actuators arranged in a spaced-apart relationship. 11. The apparatus of claim 10, wherein the first actuator is an electric control motor, a stepper motor, a servo motor, a pneumatic cylinder, a hydraulic cylinder, a ball screw, a solenoid, a linear actuator, or a cam and follower. 12. The apparatus of claim 10, wherein the first actuator is coupled to the stator by a coupling that allows relative movement between the first actuator and the stator. 13. The apparatus of claim 12, wherein the coupling provides motion along a first axis and a second axis that is orientated perpendicular to the first axis. 14. The apparatus of claim 10 further comprising a thermally reflective plate coupled to the substrate support. 15. The apparatus of claim 10, wherein the substrate support further comprises:a substrate support section having a support surface adapted to support the substrate; andat least one post protruding from the support surface and defining at least one notch that extends into the substrate support section. 16. The apparatus of claim 15, wherein the substrate support further comprises:an annular magnetic portion coupled to the support section; anda plurality of flanges extending radially outward from the magnetic portion in a polar array about a centerline of the substrate support. 17. The apparatus of claim 15, wherein the flanges are permanent magnets. 18. A processing chamber comprising:a chamber body defining an interior volume,a substrate support disposed in the interior volume of the chamber body;a stator circumscribing the chamber body and magnetically coupled to the substrate support, wherein the substrate support is rotatable relative to the stator; andan actuator coup led to the stator and adapted to move the stator. 19. The chamber of claim 18 further comprising:a second actuator coupled to the stator; anda third actuator coupled to the stator, the first, second and third actuators arranged in a spaced-apart relationship. 20. The chamber of claim 18 further comprising:a lamp assembly coupled to a top of the chamber body and adapted to heat the interior volume of the chamber body. 21. The chamber of claim 18 further comprising:an atmosphere control system coupled to the chamber body and adapted to provide deposition gases to the interior volume of the chamber body. 22. The apparatus of claim 1, wherein the substrate support further comprises:a plurality of permanent magnets arranged to impart rotational motion to the substrate support in response o an energization state of the stator. 23. The apparatus of claim 10, wherein the substrate support further comprises:a plurality of permanent magnet arranged to impart rotational motion to the substrate support in response to an energization state of the stator. 24. The apparatus of claim 18, wherein the substrate support further comprises:a plurality of permanent magnets arranged to impart rotational motion to the substrate support in response to an energization state of the stator. 25. The apparatus of claim 10, wherein the change in angular orientation of the central axis of the substrate support corresponds to relative extensions of the first, second and third actuators. 26. The apparatus of claim 1, wherein the substrate support has a first planar orientation corresponding to a first actuator position and a second planar orientation corresponding to a second actuator position, wherein the first planar orientation is non-parallel to the second planar orientation. 27. The apparatus of claim 10, wherein the substrate support has a first planar orientation corresponding to a first actuator position, and a second planar orientation corresponding to a second, actuator position, wherein the first planar orientation is non-parallel to the second planar orientation.