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A method for producing an electrode enabling fabrication of small electrodes at a high dimensional accuracy without being affected by the number of connections between chips, comprising the steps of forming an insulating film on an interconnection pattern of a semiconductor chip, forming a mask laye

A method for producing an electrode enabling fabrication of small electrodes at a high dimensional accuracy without being affected by the number of connections between chips, comprising the steps of forming an insulating film on an interconnection pattern of a semiconductor chip, forming a mask layer having an opening on the insulating film at a position where an electrode is to be formed, removing the insulating film within the opening by using the mask layer as a mask to expose a portion of the interconnection pattern, forming a conductor layer on the exposed interconnection pattern and the mask layer, removing the conductor layer formed on the mask layer while leaving the conductor layer formed on the exposed interconnection pattern, and removing the mask layer, and a method for producing a semiconductor device provided with such electrode.

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1. A method for producing electrode contacts for a semiconductor chip having a plurality of previously formed individual semiconductor integrated circuit elements secured to a substrate comprising the steps of: forming an insulating film on an interconnection pattern of a first integrated circuit el

1. A method for producing electrode contacts for a semiconductor chip having a plurality of previously formed individual semiconductor integrated circuit elements secured to a substrate comprising the steps of: forming an insulating film on an interconnection pattern of a first integrated circuit element that has been secured to the substrate, forming on the insulating film a mask layer having an opening at a position where electrodes of the first semiconductor integrated circuit element are located, removing the insulating film within the opening by using the mask layer as a mask to expose a portion of the interconnection pattern, forming a conductor layer on the exposed interconnection pattern and the mask layer, removing the conductor layer formed on the mask layer while leaving the conductor layer formed on the exposed interconnection pattern, and removing the mask and further wherein the conductor formed on the exposed interconnection pattern forms an electrical connection to a second intergrated circuit element that is also secured to the substrate, electrical connection to the second integrated circuit element also being formed by patterning insulation formed on the second integrated circuit element while it is secured to the substrate. 2. A method for producing an electrode as set forth in claim 1, further comprising a step of forming a barrier film on the exposed interconnection pattern and the mask layer after exposing a portion of the interconnection pattern and before forming the conductor layer, wherein the step of forming the conductor layer comprises a step of forming the conductor layer on the barrier film and the step of removing the conductor layer comprises a step of removing the barrier film and the conductor layer formed on the mask layer while leaving the barrier film and the conductor layer formed on the exposed interconnection pattern. 3. A method for producing electrode contacts as set forth in claim 2, wherein the step of forming the conductor layer comprises a step of forming the conductor layer with copper. 4. A method for producing an electrode as set forth in claim 1, further comprising a step of forming a protective film on the conductor layer after removing the mask layer. 5. A method of producing electrode contacts for a semiconductor device having a plurality of individual previously formed semiconductor integrated circuit elements secured to a common substrate comprising the steps of: forming an interlayer insulating film to cover an interconnection pattern of a first semiconductor integrated circuit element that is secured to the substrate, forming a connection hole in the interlayer insulating film over each of a plurality of electrical connection points, filling the connection holes with a conductor layer; forming an insulating film over the filled holes; forming a mask layer for the purpose of forming openings in the insulating film at positions where electrode contacts are to be formed; selectively removing the insulating film by using the mask layer as a mask to form openings; filling the openings with a conductor by applying a conductive layer over the openings and the mask to form the electrical contacts, and further wherein the conductor filling an opening forms an electrical connection to a second integrated circuit element that is also secured to the substrate, electrical connection to the second integrated circuit element also being formed by patterning insulation formed on the second integrated circuit element while it is secured to the substrate. 6. A method for producing external electrode contacts for a semiconductor device as set forth in claim 5, wherein the step of forming an insulating film comprises a step of forming an insulating film on an uppermost interconnection pattern and the step of exposing a portion of the interconnection pattern comprises a step of exposing a portion of the upper most interconnection pattern. 7. A method for producing electrod e contacts for a semiconductor device as set forth in claim 5, further comprising a step of forming a barrier film on the exposed interconnection pattern and before filling with the conductor layer, and wherein the step of removing the conductor layer comprises a step of removing the barrier film and the conductor layer formed on the mask layer while leaving the barrier film and the conductor layer formed on the exposed interconnection pattern. 8. A method for producing electrode contacts for a semiconductor device as set forth in claim 7, wherein the step of forming the conductor layer comprises a step of forming the conductor layer with copper. 9. A method for producing electrode contacts for a semiconductor device as set forth in claim 5, comprising a step of forming a protective film on the conductor layer after removing the mask layer. 10. A method for producing electrode contacts for a semiconductor chip having a plurality of individual previously formed semiconductor integrated circuit elements secured to a substrate comprising the steps of: forming an insulating film on an interconnection pattern of a first intergrated circuit element secured to the substrate, forming on the insulating film a mask layer having an opening at a position where each electrode contact is to be formed, removing the insulating film within the opening by using the mask layer as a mask to expose a portion of the interconnection pattern, forming a conductor layer on the exposed interconnection pattern and the mask layer, removing the conductor layer formed on the mask layer while leaving the conductor layer formed on the exposed interconnection pattern, and removing the mask; and forming a further electrode in contact with a portion of the conductor layer and a further insulting layer above the insulating film and further wherein the conductor formed on the exposed interconnection pattern forms an electrical connection to a second integrated circuit element that is also secured to the substrate, electrical connection to the second integrated circuit element also being formed by patterning insulation formed on the second integrated circuit element while it is secured to the substrate.