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Oxime derivatives and the use thereof as photoinitiators 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G03F-007/004
출원번호 US-0914433 (2000-02-21)
우선권정보 EP-0810180 (1999-03-03)
국제출원번호 PCT/EP00/01404 (2000-02-21)
국제공개번호 WO00/52530 (2000-09-08)
발명자 / 주소
  • Kura, Hisatoshi
  • Yamato, Hitoshi
  • Ohwa, Masaki
  • Dietliker, Kurt
출원인 / 주소
  • Ciba Specialty Chemicals Corporation
대리인 / 주소
    Stevenson Tyler A.
인용정보 피인용 횟수 : 15  인용 특허 : 9

초록

Radically photopolymerizable compositions comprising (a) at least one ethylenically unsaturated photopolymerizable compound; (b) as photoinitiator, at least one compound of formulae (I, II, III, IV, V and/or VI), wherein m is 0 or 1; n is 0, 1, 2 or 3; x is 1 or 2; R 1 is inter alia phenyl, naphthy

대표청구항

1. A radically photopolymerizable composition comprising(a) at least one polymer or oligomer having at least two ethylenically unsaturated groups and at least one carboxyl function within the molecule structure;(b) as photoinitiator, at least one compound of the formula I, II, III, and IVm is 0 or 1

이 특허에 인용된 특허 (9)

  1. Hada Hideo,JPX ; Hashiguchi Tatsuya,JPX ; Komano Hiroshi,JPX ; Nakayama Toshimasa,JPX, Cyanooxime sulfonate compound.
  2. Munzel Norbert (Heitersheim DEX) Schulz Reinhard (Staufen-Wettelbrunn DEX) Holzwarth Heinz (Bad Krozingen DEX) Ilg Stephan (Giebenach CHX), High resolution i-line photoresist of high sensitivity.
  3. Munzel Norbert,DEX ; Schulz Reinhard,DEX ; Holzwarth Heinz,DEX ; Ilg Stephan,CHX, High resolution i-line photoresist of high sensitivity.
  4. Yamato Hitoshi,JPX ; Bleier Hartmut,JPX ; Birbaum Jean-Luc,JPX ; Kunz Martin,DEX ; Dietliker Kurt,CHX ; De Leo Christoph,DEX ; Asakura Toshikage,JPX, Oxime sulfonates and the use thereof as latent sulfonic acids.
  5. Laridon Urbain L. (Wilrijk BEX) Marin August M. (Oevel BEX) De Winter Walter F. (s\-Gravenwezel BEX) Kokelenberg Hendrik E. (Merksem BEX), Photopolymerizable recording materials.
  6. Itoh Masanori (Himeji JPX) Takenaka Fumio (Himeji JPX) Tohya Kouzi (Himeji JPX), Photopolymerization initiator comprised of thioxanthones and oxime esters.
  7. Ai Hideo (Fuji JPX) Suga Nobuhiko (Fuji JPX) Ogitani Satoshi (Fuji JPX) Takahashi Hideaki (Fuji JPX) Ikeda Akihiko (Fuji JPX), Polymer/oxime ester/coumarin compound photosensitive composition.
  8. Berner, Godwin; Rutsch, Werner, Process for curing acid-curable finishes.
  9. Van Goethem Hugo V. (Edegem BEX) Stroobants Marcel (Muizen BEX) De Winter Walter F. (S-Gravenwezel BEX), Production of etch-resist colloid and material suitable therefor.

이 특허를 인용한 특허 (15)

  1. Baker, John Marshall; Mathur, Naresh; Sheets, Roger M.; DeGonia, David J., 1,3,2-dioxaphosphorinane, 2-sulfide derivatives for use as anti-wear additives in lubricant compositions.
  2. Bonda, Craig A.; Hu, Shengkui; Zhang, Qing Jean; Zhang, Zhihui, Compositions, apparatus, systems, and methods for resolving electronic excited states.
  3. Bonda, Craig A.; Hu, Shengkui; Zhang, Qing Jean; Zhang, Zhihui, Compositions, apparatus, systems, and methods for resolving electronic excited states.
  4. Bonda, Craig A.; Hu, Shengkui; Zhang, Qing Jean; Zhang, Zhihui, Compositions, apparatus, systems, and methods for resolving electronic excited states.
  5. Bonda, Craig A.; Hu, Shengkui; Zhang, Qing Jean; Zhang, Zhihui, Compositions, apparatus, systems, and methods for resolving electronic excited states.
  6. Bonda, Craig A.; Hu, Shengkui; Zhang, Qing Jean; Zhang, Zhihui, Compositions, apparatus, systems, and methods for resolving electronic excited states.
  7. Martin, David C.; Rearick, Brian K.; Winters, Christina A.; Fuhry, Mary Ann; Kutchko, Cynthia, Dual cure coating compositions, methods of coating a substrate, and related coated substrates.
  8. Rygas, Tadeusz Piotr; Thurailingam, Thivaharan; Crisan, Silviu; Chalifoux, Norbert Joseph Sylvain, Method and composition for printing tactile marks and security document formed therefrom.
  9. Bonda, Craig A.; Hu, Shengkui, Method of photostabilizing UV absorbers, particularly dibenzyolmethane derivatives, e.g., Avobenzone, with cyano-containing fused tricyclic compounds.
  10. Bonda, Craig A.; Hu, Shengkui, Method of quenching singlet and triplet excited states of pigments, such as porphyrin compounds, particularly protoporphyrin IX, with conjugated fused tricyclic compounds have electron withdrawing groups, to reduce generation of reactive oxygen species, particularly singlet oxygen.
  11. Kunimoto, Kazuhiko; Kura, Hisatoshi; Yamamoto, Hiroshi; Nakagawa, Yumiko; Asakura, Toshikage; Sameshima, Kaori, Oxime ester photoinitiators.
  12. Kashiwagi, Daisuke; Andou, Takeshi; Yamada, Satoru; Kawabe, Yasumasa; Tomeba, Hisamitsu, Photosensitive resin composition, cured product and method for producing same, method for producing resin pattern, cured film, liquid crystal display device, organic el display device, infrared cut filter, and solid-state imaging device.
  13. Kunimoto, Kazuhiko; Sameshima, Kaori; Matsuoka, Yuki; Kura, Hisatoshi, Polymerizable composition comprising an oxime sulfonate as thermal curing agent.
  14. Kunimoto, Kazuhiko; Sameshima, Kaori; Matsuoka, Yuki; Kura, Hisatoshi, Polymerizable composition comprising an oxime sulfonate as thermal curing agent.
  15. Matsumoto,Akira; Yamato,Hitoshi; Asakura,Toshikage; Ohwa,Masaki; Murer,Peter, Substituted oxime derivatives and the use thereof as latent acids.
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