초록

In a process for rectificative isolation of (meth)acrylic acid from a mixture containing, as main components, (meth)acrylic acid and an organic liquid having a higher boiling point than (meth)acrylic acid, the rectification is carried out with the addition of a surfactant.

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1. A process for the rectificative isolation of acrylic or methacrylic acid from a mixture containing, as main components, acrylic or methacrylic acid and an organic liquid having a higher boiling point than said acrylic or methacrylic acid, wherein the rectification is carried out with the addition

1. A process for the rectificative isolation of acrylic or methacrylic acid from a mixture containing, as main components, acrylic or methacrylic acid and an organic liquid having a higher boiling point than said acrylic or methacrylic acid, wherein the rectification is carried out with the addition of a surfactant. 2. The process as claimed in claim 1, wherein said surfactant is a nonionic surfactant. 3. The process as claimed in claim 1, wherein said surfactant, on dissolution in water up until reaching the critical micelle formation concentration, is capable of reducing the surface tension of pure water at 20° C. and at a working pressure of 1 bar by at least 15%, based on the corresponding surface tension of pure water. 4. The process as claimed in claim 1, wherein said organic liquid contains diphenyl ether. 5. The process as claimed in claim 1, wherein said organic liquid having a higher boiling point than said acrylic or methacrylic acid is a mixture containing a mixture of from 70 to 75% by weight of diphenyl ether and from 25 to 30% by weight of diphenyl and, based on this mixture, from 0.1 to 25% by weight o-dimethyl phthalate. 6. The process as claimed in claim 1, wherein the mixture containing said acrylic or methacrylic acid contains from 5 to 25% by weight of said acrylic or methacrylic acid. 7. The process as claimed in claim 1, wherein the rectificative isolation is carried out at from 10 to 100 mbar. 8. The process as claimed in claim 1, wherein the rectificative isolation is carried out in the presence of phenothiazine as a polymerization inhibitor. 9. The process as claimed in claim 1, wherein said acrylic or methacrylic acid to be isolated has been produced by catalytic gas-phase oxidation of C 3 -/C 4 -starting compounds. 10. A process for the preparation of acrylic or methacrylic acid by catalytic gas-phase oxidation of a C 3 -/C 4 -starting compound, in which the reaction gas mixture of the gas-phase oxidation is passed in countercurrent to a descending high-boiling inert hydrophobic organic liquid in an absorption column, the liquid discharge of the absorption column is then stripped with inert gas in a desorption column and said acrylic or methacrylic acid is isolated from the liquid discharge of the desorption column by rectification, wherein the rectificative isolation is carried out with the addition of a surfactant. 11. The process as claimed in claim 3, wherein said surfactant, on dissolution in water up until reaching the critical micelle formulation concentration, is capable of reducing the surface tension of pure water at 20° C. and at a working pressure of 1 bar by at least 75%, based on the corresponding surface tension of pure water. 12. The process as claimed in claim 1, wherein said surfactant is selected from the group consisting of nonionic surfactants and cationic surfactants, and mixtures thereof. 13. The process as claimed in claim 1, wherein said surfactant has a boiling point >200° C. at 1 bar. 14. The process as claimed in claim 1, wherein said surfactant is added in an amount range from 10 to 5000 ppm by weight, based on the weight of said acrylic or methacrylic acid containing mixture. 15. The process as claimed in claim 1, wherein said surfactant is selected from the group consisting of anionic surfactants, nonionic surfactants, cationic surfactants and amphoteric surfactants, and mixtures thereof.