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System and method for lithography process monitoring and control

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • H01L-027/00
출원번호 US-0646313 (2003-08-22)
발명자 / 주소
  • Ye, Jun
  • Pease, R. Fabian W.
  • Chen, Xun
출원인 / 주소
  • Brion Technologies, Inc.
대리인 / 주소
    Steinberg Neil A.
인용정보 피인용 횟수 : 61  인용 특허 : 47

초록

In one aspect, the present invention is a technique of, and a system and sensor for measuring, inspecting, characterizing and/or evaluating optical lithographic equipment, methods, and/or materials used therewith, for example, photomasks. In one embodiment, the system, sensor and technique measures,

대표청구항

1. A system to collect image data which is representative of an aerial image of a mask used in the manufacture of integrated circuits, wherein the mask includes features having a line width, the system comprising:an optical system to produce the image of the mask on a wafer plane;a platform moveable

이 특허에 인용된 특허 (47)

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