IPC분류정보
국가/구분 |
United States(US) Patent
등록
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국제특허분류(IPC7판) |
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출원번호 |
US-0646313
(2003-08-22)
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발명자
/ 주소 |
- Ye, Jun
- Pease, R. Fabian W.
- Chen, Xun
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출원인 / 주소 |
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대리인 / 주소 |
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인용정보 |
피인용 횟수 :
61 인용 특허 :
47 |
초록
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In one aspect, the present invention is a technique of, and a system and sensor for measuring, inspecting, characterizing and/or evaluating optical lithographic equipment, methods, and/or materials used therewith, for example, photomasks. In one embodiment, the system, sensor and technique measures,
In one aspect, the present invention is a technique of, and a system and sensor for measuring, inspecting, characterizing and/or evaluating optical lithographic equipment, methods, and/or materials used therewith, for example, photomasks. In one embodiment, the system, sensor and technique measures, collects and/or detects an aerial image produced or generated by the interaction between the photomask and lithographic equipment. An image sensor unit may measure, collect, sense and/or detect the aerial image in situ—that is, the aerial image at the wafer plane produced, in part, by a product-type photomask (i.e., a wafer having integrated circuits formed during the integrated circuit fabrication process) and/or by associated lithographic equipment used, or to be used, to manufacture of integrated circuits. In this way, the aerial image used, generated or produced to measure, inspect, characterize and/or evaluate the photomask is the same aerial image used, generated or produced during wafer exposure in integrated circuit manufacturing.In another embodiment, the system, sensor and technique characterizes and/or evaluates the performance of the optical lithographic equipment, for example, the optical sub-system of such equipment. In this regard, in one embodiment, an image sensor unit measures, collects, senses and/or detects the aerial image produced or generated by the interaction between lithographic equipment and a photomask having a known, predetermined or fixed pattern (i.e., test mask). In this way, the system, sensor and technique collects, senses and/or detects the aerial image produced or generated by the test mask—lithographic equipment in order to inspect, evaluate and/or characterize the performance of the lithographic equipment.
대표청구항
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1. A system to collect image data which is representative of an aerial image of a mask used in the manufacture of integrated circuits, wherein the mask includes features having a line width, the system comprising:an optical system to produce the image of the mask on a wafer plane;a platform moveable
1. A system to collect image data which is representative of an aerial image of a mask used in the manufacture of integrated circuits, wherein the mask includes features having a line width, the system comprising:an optical system to produce the image of the mask on a wafer plane;a platform moveable between a plurality of discrete locations in a first direction and a plurality of discrete locations in a second direction;an image sensor unit disposed on the moveable platform, the image sensor unit includes a sensor array located in the wafer plane, wherein the sensor array includes a plurality of sensor cells wherein each sensor cell includes an active area to sample light of a predetermined wavelength that is incident thereon, wherein the active area is smaller than the line width, and wherein at each discrete location of the platform the sensor cells samples the intensity of light;a processing unit, coupled to the image sensor unit, to generate image data which is representative of the aerial image, wherein the processing unit generates the aerial image of the mask by interleaving the image data sampled by each sensor at each discrete location of the platform. 2. The system of claim 1 wherein the image sensor unit further includes:a substrate wherein the sensor array is disposed on or in the substrate;a film, disposed over selected portions of the active areas of the plurality of sensor cells to enhance the spatial resolution of each sensor cell wherein the film is comprised of a material that impedes passage of light of the predetermined wavelength. 3. The system of claim 2 wherein the substrate includes a wafer-shaped profile. 4. The system of claim 1 wherein the processing unit generates a first data set using the intensity of light sampled by each sensor cell when the platform is positioned at a first location relative to the aerial image, wherein the first data set includes data which is representative of the aerial image at locations corresponding to the locations of the sensor cells relative to the aerial image. 5. The system of claim 4 wherein the processing unit generates a second data set using the intensity of light sampled by each sensor cell when the platform is positioned at a second location relative to the aerial image, wherein the second data set includes data which is representative of the aerial image at locations corresponding to the locations of the sensor cells relative to the aerial image. 6. The system of claim 5 wherein the first location and the second location are adjacent locations along an axis in the first direction and wherein the distance between the first location and the second location is less than the distance between the two opposing edges of the active area of each sensor cell of the sensor array, wherein the opposing sides are transverse to the axis. 7. The system of claim 5 wherein the first location and the second location are adjacent locations along an axis in the first direction and wherein the distance between the first location and the second location is less than the diameter of the active area of each sensor cell. 8. The system of claim 5 wherein the image sensor unit further includes:a substrate wherein the sensor array is disposed on the substrate;a film, disposed over the active areas of the plurality of sensor cells and comprised of a material that impedes passage of light of the predetermined wavelength, wherein the film includes a plurality of apertures which are arranged such that one aperture of the plurality of apertures overlies an associated active area of a corresponding sensor cell to expose a portion of the active area and wherein light of the predetermined wavelength is capable of being sensed by the portion of the active area that is exposed by the associated aperture. 9. The system of claim 8 wherein the first location and the second location are adjacent locations along an axis in the first direction and wherein the distance between the first location and the second location is less than the distance between the two opposing sides of each aperture, and wherein the opposing sides are transverse to the axis. 10. The system of claim 8 wherein the first location and the second location are adjacent locations along an axis in the first direction and wherein the distance between the first location and the second location is less than the diameter of each aperture of the plurality of apertures in the film. 11. The system of claim 10 wherein the diameters of the plurality of apertures are substantially equal. 12. The system of claim 5 wherein the image sensor unit further includes:a wafer-shaped substrate wherein the sensor array is integrated in the substrate;a film, disposed over the active areas of the plurality of sensor cells and comprised of a material that impedes passage of light of the predetermined wavelength, wherein the film includes a plurality of apertures which are arranged such that one aperture of the plurality of apertures overlies a corresponding active area of a corresponding sensor cell to expose a portion of the active area and wherein light of the predetermined wavelength is capable of being sensed by the portion of the active area that is exposed by the corresponding aperture. 13. The system of claim 12 wherein the first location and the second location are adjacent locations along an axis in the first direction and wherein the distance between the first location and the second location is less than the distance between the two opposing sides of each aperture of the plurality of apertures, wherein the opposing sides are transverse to the axis. 14. The system of claim 12 wherein the first location and the second location are adjacent locations along an axis in the first direction and wherein the distance between the first location and the second location is less than the diameter of each aperture of the plurality of apertures in the film. 15. A system to collect image data which is representative of an aerial image of a mask used in the manufacture of integrated circuits, the system comprising:an optical system to produce the image of the mask on a wafer plane;a platform moveable between a plurality of discrete locations along a plurality of axes;an image sensor unit disposed on the moveable platform, the image sensor unit includes a sensor array located in the wafer plane, wherein the sensor array includes a plurality of sensor cells wherein each sensor cell includes an active area to sample light of a predetermined wavelength that is incident thereon and wherein at each discrete location of the platform the sensor cells samples the intensity of light; anda processing unit, coupled to the image sensor unit, to generate image data which is representative of only a portion of the aerial image of the mask wherein the portion of the aerial image includes a plurality of non-contiguous sub-images and wherein the processing unit generates each sub-image of the plurality of non-contiguous sub-images using the intensity of light sampled by a corresponding sensor cell when the platform is positioned at a plurality of discrete locations relative to the aerial image. 16. The system of claim 15 wherein the image sensor unit further includes:a substrate having a wafer-shaped profile, wherein the sensor array is disposed on the substrate;a film, disposed over selected portions of the active areas of the plurality of sensor cells to enhance the spatial resolution of each sensor cell wherein the film is comprised of a material that impedes passage of light of the predetermined wavelength. 17. The system of claim 15 wherein the processing unit generates each sub-image using the intensity of light sampled by a corresponding sensor cell at a plurality of adjacent locations along a first axis and the intensity of light sampled by the corresponding sensor cell at a plurality of adjacent locations along a second axis. 18. The system of claim 17 wherein the image sensor unit further includ es:a wafer-shaped substrate, wherein the sensor array is integrated in, or disposed on the substrate;a film, disposed over the active areas of the plurality of sensor cells and comprised of a material that impedes passage of light of the predetermined wavelength, wherein the film includes a plurality of apertures which are arranged such that one aperture of the plurality of apertures overlies a corresponding active area of a corresponding sensor cell to expose a portion of the active area and wherein light of the predetermined wavelength is capable of being sensed by the portion of the active area that is exposed by the corresponding aperture. 19. The system of claim 18 wherein the distance between adjacent locations of the plurality of locations along the first axis is less than the distance between the two opposing sides of each aperture of the plurality of apertures in the film, wherein the opposing sides are transverse to the first axis. 20. The system of claim 18 wherein the distance between adjacent locations of the plurality of locations along the first axis is less than the diameter of each aperture of the plurality of apertures in the film. 21. A system to collect image data which is representative of an aerial image of a mask used in the manufacture of integrated circuits, wherein the mask includes features having a line width, the system comprising:an optical system to produce the image of the mask on a wafer plane;a platform moveable between a plurality of discrete locations;an image sensor unit disposed within the moveable platform, the image sensor unit includes a sensor array, wherein the sensor array includes a plurality of sensor cells wherein each sensor cell includes an active area to sample light of a predetermined wavelength that is incident thereon, wherein the active area is smaller than the line width, and wherein at each discrete location of the platform the sensor cells samples the intensity of light;a processing unit, coupled to the image sensor unit, to generate image data which is representative of the aerial image of the mask, wherein the processing unit generates the aerial image of the mask by interleaving the image data sampled by each sensor at each discrete locations of the platform. 22. The system of claim 21 wherein the processing unit generates:a first data set using the intensity of light sampled by each sensor cell when the platform is positioned at a first location relative to the aerial image, wherein the first data set includes data which is representative of the aerial image at locations corresponding to the locations of the sensor cells relative to the aerial image; anda second data set using the intensity of light sampled by each sensor cell when the platform is positioned at a second location relative to the aerial image, wherein the second data set includes data which is representative of the aerial image at locations corresponding to the locations of the sensor cells relative to the aerial image, wherein the first location and the second location are locations on a first axis. 23. The system of claim 22 wherein the first location and the second location are adjacent locations along the first axis and wherein the distance between the first location and the second location is less than the distance between the two opposing edges of the active area of each sensor cell of the sensor array, wherein the opposing sides are transverse to the axis. 24. The system of claim 22 wherein the first location and the second location are adjacent locations along the first axis and wherein the distance between the first location and the second location is less than the diameter of each active area of the sensor cells. 25. The system of claim 22 wherein the image sensor unit further includes a film, disposed over the active areas of the plurality of sensor cells and comprised of a material that impedes passage of light of the predetermined wavelength, wherein the film includes a plurality of apertu res which are arranged such that one aperture of the plurality of apertures overlies an associated active area of a corresponding sensor cell to expose a portion of the active area and wherein light of the predetermined wavelength is capable of being sensed by the portion of the active area that is exposed by the associated aperture. 26. The system of claim 25 wherein the first location and the second location are adjacent locations along the first axis and wherein the distance between the first location and the second location is less than the distance between the two opposing sides of each aperture of the plurality of apertures in the film, wherein the opposing sides are transverse to the axis. 27. The system of claim 26 wherein the first location and the second location are adjacent locations along the first axis and wherein the distance between the first location and the second location is less than the diameter of each aperture of the plurality of apertures in the film. 28. The system of claim 22 wherein the processing unit generates:third data set using the intensity of light sampled by each sensor cell when the platform is positioned at a third location relative to the aerial image, wherein the third data set includes data which is representative of the aerial image at locations corresponding to the locations of the sensor cells relative to the aerial image; andfourth data set using the intensity of light sampled by each sensor cell when the platform is positioned at a fourth location relative to the aerial image, wherein the fourth data set includes data which is representative of the aerial image at locations corresponding to the locations of the sensor cells relative to the aerial image. 29. The system of claim 28 wherein the third location and the fourth location are adjacent locations along a second axis and wherein the distance between the third location and the fourth location is less than the diameter of each active area of the sensor cells. 30. The system of claim 29 wherein the first location is adjacent to the third location along a third axis and wherein the distance between the first location and the third location is less than the diameter of each active area of the sensor cells. 31. The system of claim 30 wherein the image sensor unit further includes a film, disposed over the active areas of the plurality of sensor cells and comprised of a material that impedes passage of light of the predetermined wavelength, wherein the film includes a plurality of apertures which are arranged such that one aperture of the plurality of apertures overlies an associated active area of a corresponding sensor cell to expose a portion of the active area and wherein light of the predetermined wavelength is capable of being sensed by the portion of the active area that is exposed by the associated aperture. 32. The system of claim 31 wherein the second location and the fourth location are adjacent locations along a fourth axis and wherein the distance between the second location and the fourth location is less than the diameter of each aperture of the plurality of apertures in the film.
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