Reduced-pressure drying unit and coating film forming method
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
B05C-011/00
출원번호
US-0217458
(2002-08-14)
우선권정보
JP-0285481 (2001-09-19)
발명자
/ 주소
Kitano, Takahiro
Hama, Manabu
Sugimoto, Shinichi
Hirakawa, Naoya
출원인 / 주소
Tokyo Electron Limited
대리인 / 주소
Oblon, Spivak, McClelland, Maier & Neustadt, P.C.
인용정보
피인용 횟수 :
13인용 특허 :
3
초록▼
The invention includes a hermetic container provided with a substrate mount; a vacuum exhauster connected to the hermetic container; a current member; and a current member raising and lowering mechanism. When the current member is raised and lowered as a function of the pressure inside the hermetic
The invention includes a hermetic container provided with a substrate mount; a vacuum exhauster connected to the hermetic container; a current member; and a current member raising and lowering mechanism. When the current member is raised and lowered as a function of the pressure inside the hermetic container, a liquid flow of the coating solution on the substrate is controlled, thereby controlling the uniformity of the film thickness of the coating solution.
대표청구항▼
1. A reduced-pressure drying unit for a substrate, comprising:a hermetic container provided therein with a mount for mounting thereon a substrate coated with a coating solution made by mixing a component of a coating film and a solvent;a vacuum exhauster connected to said hermetic container through
1. A reduced-pressure drying unit for a substrate, comprising:a hermetic container provided therein with a mount for mounting thereon a substrate coated with a coating solution made by mixing a component of a coating film and a solvent;a vacuum exhauster connected to said hermetic container through an exhaust passage for reducing a pressure in said hermetic container to vaporize the solvent from the coating solution on the substrate;a pressure sensor for detecting the pressure in said hermetic container;a current member provided to face a front face of the substrate mounted on said mount; anda current member raising and lowering mechanism for raising and lowering said current member,wherein said current member is raised and lowered by said current member raising and lowering mechanism to change in height position while the pressure inside said hermetic container is reduced to vaporize the solvent from the coating solution on the substrate, said current member is changed from a first position to a second position while the solvent is vaporizing from the coating solution on the substrate, and, when a detection value from said pressure sensor becomes a predetermined pressure or lower, the height position of said current member is changed from the first position to the second position. 2. A reduced-pressure drying unit as set forth in claim 1, further comprising:a film thickness measuring sensor for measuring a thickness of the coating film formed on the front face of the substrate, wherein the height position of said current member is changed based on a measurement value from said film thickness measuring sensor. 3. A reduced-pressure drying unit as set forth in claim 2, further comprising:a pressure adjuster provided between said exhaust passage and said vacuum exhauster for adjusting a displacement, wherein a displacement in said hermetic container is controlled by said pressure adjuster based on the measurement value from said film thickness measuring sensor to control a vaporization period of the solvent. 4. A reduced-pressure drying unit as set forth in claim 1,wherein said current member is composed of an element in a shape of a plate. 5. A reduced-pressure drying unit as set forth in claim 1,wherein said current member has a form covering the front face and an outer edge of the substrate. 6. A reduced-pressure drying unit for a substrate, comprising:a hermetic container provided therein with a mount for mounting thereon a substrate coated with a coating solution made by mixing a component of a coating film and a solvent;a vacuum exhauster connected to said hermetic container through an exhaust passage for reducing a pressure in said hermetic container to vaporize the solvent from the coating solution on the substrate;a heater in said hermetic container for heating the substrate;a current member provided to face a front face of the substrate mounted on said mount; anda current member raising and lowering mechanism for raising and lowering said current member,wherein said current member is raised and lowered by said current member raising and lowering mechanism to change in height position while the pressure inside said hermetic container is reduced to vaporize the solvent from the coating solution on the substrate,the substrate is heated by said heater while the solvent and/or water are/is vaporizing from the coating solution on the substrate so that the solvent and/or water vaporize/vaporizes, and a pressure in said hermetic container and/or a film thickness of the coating solution on the substrate are/is detected so that the heating by said heater is performed based on the detection values/value. 7. A reduced-pressure drying unit as set forth in claim 6,wherein the reduction in pressure in said hermetic container by said vacuum exhauster is stopped while the substrate is being heated by said heater. 8. A reduced-pressure drying unit as set forth in claim 6,wherein said heater for heating the substrate is provided in said current member. 9. A reduced-pressure drying unit for a substrate, comprising;a hermetic container provided therein with a mount for mounting thereon a substrate coated with a coating solution made by mixing a component of a coating film and a solvent;a vacuum exhauster connected to said hermetic container through an exhaust passage for reducing a pressure in said hermetic container to vaporize the solvent from the coating solution on the substrate;a current member provided to face a front face of the substrate mounted on said mount;a current member raising and lowering mechanism for raising and lowering said current member, said raising and lowering mechanism being provided on a rear face side of said current member for pushing said current member to change the height position of said current member; anda hang-supporter connected to a front face of said current member for attaching said current member to a lid body of said hermetic container,wherein said current member is raised and lowered by said current member raising and lowering mechanism to change in height position while the pressure inside said hermetic container is reduced to vaporize the solvent from the coating solution on the substrate,said current member is hung by means of said hang-supporter to be movable in a vertical direction, said current member and said hang-supporter are connected to each other with a spherical joint, said current member raising and lowering mechanism has a raising and lowering rod having a ventilation hole therein, and one end of said raising and lowering rod is in contact with the rear face of said current member and another end of said raising and lowering rod is connected to an exhauster. 10. A reduced-pressure drving unit for a substrate, comprising:a hermetic container provided therein with a mount for mounting thereon a substrate coated with a coating solution made by mixing a component of a coating film and a solvent;a vacuum exhauster connected to said hermetic container through an exhaust passage for reducing a pressure in said hermetic container to vaporize the solvent from the coating solution on the substrate;a current member provided to face a front face of the substrate mounted on said mount;a current member raising and lowering mechanism for raising and lowering said current member, anda second current member at a position closer to said exhaust passage than said current member in said hermetic container, said second current plate having ventilation holes at positions corresponding to the vicinity of the outer periphery of the substrate,wherein said current member is raised and lowered by said current member raising and lowering mechanism to change in height position while the pressure inside said hermetic container is reduced to vaporize the solvent from the coating solution on the substrate. 11. A reduced-pressure drying unit for a substrate, comprising:a hermetic container provided therein with a mount for mounting thereon a substrate coated with a coating solution made by mixing a component of a coating film and a solvent;a vacuum exhauster connected to said hermetic container through an exhaust passage for reducing a pressure in said hermetic container to vaporize the solvent from the coating solution on the substrate; anda plurality of aligning members provided at positions outside said mount and apart from a center position of said mount by equal distances in radial directions, wherein said plurality of aligning members synchronously move in substantially horizontal directions from the positions outside the substrate to positions to come into contact with an edge of the substrate to align the center position of said mount and a center position of the substrate.
Englhardt, Eric A.; Rice, Michael R.; Hudgens, Jeffrey C.; Hongkham, Steve; Pinson, Jay D.; Salek, Mohsen; Carlson, Charles; Weaver, William T; Armer, Helen R., Cartesian cluster tool configuration for lithography type processes.
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