IPC분류정보
국가/구분 |
United States(US) Patent
등록
|
국제특허분류(IPC7판) |
|
출원번호 |
US-0100108
(2002-03-19)
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발명자
/ 주소 |
- Doshi, Dhaval
- Fan, Hongyou
- Huesing, Nicola
- Hurd, Alan
- Brinker, Charles Jeffrey
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출원인 / 주소 |
- Science & Technology Corporation @ University of New Mexico
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대리인 / 주소 |
Schwegman, Lundberg, Woessner & Kluth, P.A.
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인용정보 |
피인용 횟수 :
12 인용 특허 :
3 |
초록
▼
The present invention provides a mesoporous material comprising at least one region of mesoporous material patterned at a lithographic scale. The present invention also provides a a method for forming a patterned mesoporous material comprising: coating a sol on a substrate to form a film, the sol co
The present invention provides a mesoporous material comprising at least one region of mesoporous material patterned at a lithographic scale. The present invention also provides a a method for forming a patterned mesoporous material comprising: coating a sol on a substrate to form a film, the sol comprising: a templating molecule, a photoactivator generator, a material capable of being sol-gel processed, water, and a solvent; and exposing the film to light to form a patterned mesoporous material.
대표청구항
▼
1. A method for forming a patterned mesoporous material comprising:coating a sol on a substrate to form a film, said sol comprising: a templating molecule, a photoactivator generator, a material capable of being sol-gel processed, and a solvent; andexposing said film to light to form a patterned mes
1. A method for forming a patterned mesoporous material comprising:coating a sol on a substrate to form a film, said sol comprising: a templating molecule, a photoactivator generator, a material capable of being sol-gel processed, and a solvent; andexposing said film to light to form a patterned mesoporous material. 2. The method of claim 1, wherein said light is UV radiation. 3. The method of claim 1, wherein said solvent comprises ethyl alcohol. 4. The method of claim 1, wherein said photoactivator generator comprises a photoacid generator. 5. The method of claim 1, wherein said photoactivator generator comprises a photobase generator. 6. The method of claim 1, wherein said sol further comprises an acid for adjusting the pH of said sol. 7. The method of claim 1, wherein said material capable of being sol-gel processed comprises silica. 8. The method of claim 1, wherein said sol further comprises an optically polymerizable monomer. 9. The method of claim 8, wherein said optically polymerizable monomer comprises an epoxide monomer and said method further comprises exposing said patterned mesoporous material to light to polymerize said optically polymerizable monomer. 10. The method of claim 1, wherein at least two regions of said patterned mesoporous material have different physical properties. 11. The method of claim 10, wherein said at least two regions have different refractive indexes in comparison to each other. 12. The method of claim 10, wherein said at least two regions have different mesostructures in comparison to each other. 13. The method of claim 10, wherein said at least two regions have different pore volumes in comparison to each other. 14. The method of claim 10, wherein said at least two regions have different pore sizes in comparison to each other. 15. The method of claim 10, wherein said at least two regions have different thicknesses in comparison to each other. 16. The method of claim 10, wherein said at least two regions have different wetting behaviors in comparison to each other. 17. The method of claim 10, wherein said at least two regions have different etching behaviors in comparison to each other. 18. The method of claim 10, wherein a physical property of said different physical properties has a discrete difference for the physical property between said at least two regions. 19. The method of claim 10, wherein a physical property of said different physical properties varies as a gradient across said at least two regions. 20. The method of claim 1, wherein the method further comprises selective etching of said film. 21. The method of claim 20, wherein selective etching of said film includes irradiating said film with ultraviolet light through a mask via proximity printing. 22. The method of claim 20, further comprising the step of calcinating said mesoporous material after said at least one region has been etched. 23. The method of claim 1, further comprising the step of calcinating said mesoporous material. 24. A method for forming a patterned mesoporous material comprising:coating a sol on a substrate to form a film, said sol comprising: a templating molecule, a photoactivator generator, a material capable of being sol-gel processed, water, and a solvent; andexposing said film to light to form a patterned mesoporous material, wherein said templating molecule comprises CTAB. 25. A method for forming a patterned mesoporous material comprising:coating a sol on a substrate to form a film, said sol comprising: a templating molecule, a photoactivator generator, a material capable of being sol-gel processed, water. and a solvent; andexposing said film to light to form a patterned mesoporous material, wherein said templating molecule comprises Brij 56. 26. A method for forming a patterned mesoporous material comprising:coating a sol on a substrate to form a film, said sol comprising: a templating molecule, a photoactivator generator, a material capable of being sol-gel processed, water, and a solvent; an dexposing said film to light to form a patterned mesoporous material, wherein said photoactivator generator comprises a diaryliodonium compound.
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