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Method and apparatus for high density nanostructures

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • H01L-027/148
출원번호 US-0301476 (2002-11-21)
발명자 / 주소
  • Chou, Stephen Y.
출원인 / 주소
  • Regents of the University of Minnesota
대리인 / 주소
    Lowenstein Sandler PC
인용정보 피인용 횟수 : 103  인용 특허 : 12

초록

A method and apparatus for high density nanostructures is provided. The method and apparatus include Nano-compact optical disks, such as nano-compact disks (Nano-CDS). In one embodiment a 400 Gbit/in 2 topographical bit density nano-CD with nearly three orders of magnitude higher than commercial CD

대표청구항

1. A nano-compact disk having a polymer resist film on a disk substrate produced by:fabricating a mold on a mold substrate, the mold having a circular data pattern, a one molecular layer of release agent, and a feature size of approximately 10 nanometers or less;imprinting the mold into the polymer

이 특허에 인용된 특허 (12)

  1. Guha Supratik ; Gupta Arunava, High density magnetic recording medium utilizing selective growth of ferromagnetic material.
  2. Jabr Salim N. (2703 Doverton Sq. Mountain View CA 94040), High density optical storage system.
  3. Beaujean, Joseph M. E., Method and system for reproducing relief structures onto a substrate.
  4. Paranjpe Ajit P. (Plano TX), Method for planarization.
  5. Abdala Julio A. (Miami FL) Olkoski Jill C. (Fort Lauderdale FL), Method of fabricating in-mold graphics.
  6. Suleski Thomas J., Method of making optical replicas by stamping in photoresist and replicas formed thereby.
  7. Kuwabara Kazuhiro (Hitachi JPX) Mori Yuji (Hitachi JPX) Mikami Yoshiro (Hitachi JPX), Method of manufacturing a thin-film pattern on a substrate.
  8. Haisma Jan (Eindhoven NLX) Verheijen Martinus (Eindhoven NLX) Schrama Johannes T. (Eindhoven NLX), Method of providing a patterned relief of cured photoresist on a flat substrate surface and device for carrying out such.
  9. Jabr Salim N. (2703 Doverton Sq. Mountain View CA 94040), Optical information reproducing by detecting phase shift of elevated symbols.
  10. Deckman Harry W. (Clinton NJ) Dunsmuir John H. (Annandale NJ), Procedure for fabrication of microstructures over large areas using physical replication.
  11. Bifano Thomas G. (Mansfield MA), Process for manufacturing optical data storage disk stamper.
  12. Flanders Dale C. (Lexington MA), X-ray lithography at _100 A linewidths using X-ray masks fabricated by shadowing techniques.

이 특허를 인용한 특허 (103)

  1. GanapathiSubramanian,Mahadevan; Sreenivasan,Sldlgata V., Adaptive shape substrate support method.
  2. Sreenivasan,Sidlgata V; Watts,Michael P. C.; Choi,Byung Jin; Voisin,Ronald D.; Schumaker,Norman E., Alignment systems for imprint lithography.
  3. Choi,Byung Jin; Sreenivasan,Sidlgata V.; Johnson,Stephen C., Apparatus to control displacement of a body spaced-apart from a surface.
  4. Cherala,Anshuman; Sreenivasan,Sidlgata V.; Schumaker,Norman E., Applying imprinting material to substrates employing electromagnetic fields.
  5. Meissl, Mario J.; Choi, Byung J., Assembly and method for transferring imprint lithography templates.
  6. Choi,Byung Jin; Sreenivasan,Sidlgata V.; Watts,Michael P. C., Capillary imprinting technique.
  7. Cherala, Anshuman; Choi, Byung Jin; Lad, Pankaj B.; Shackleton, Steven C., Chucking system comprising an array of fluid chambers.
  8. Choi,Byung J.; Voisin,Ronald D.; Sreenivasan,Sidlgata V.; Watts,Michael P. C.; Babbs,Daniel; Meissl,Mario J.; Bailey,Hillman; Schumaker,Norman E., Chucking system for modulating shapes of substrates.
  9. Watts,Michael P. C.; Voisin,Ronald D.; Sreenivasan,Sidlgata V., Compliant hard template for UV imprinting.
  10. Xu, Frank Y., Composition for adhering materials together.
  11. Xu,Frank Y.; Miller,Michael N.; Watts,Michael P. C., Composition for an etching mask comprising a silicon-containing material.
  12. Xu,Frank Y.; Stacey,Nicholas A., Composition to provide a layer with uniform etch characteristics.
  13. Xu,Frank Y.; Miller,Michael N., Composition to reduce adhesion between a conformable region and a mold.
  14. Willson,C. Grant; Stacey,Nicholas A., Compositions for dark-field polymerization and method of using the same for imprint lithography processes.
  15. Sreenivasan, Sidlgata V.; Choi, Byung-Jin; Voisin, Ronald D., Conforming template for patterning liquids disposed on substrates.
  16. Sreenivasan,Sidlgata V; Choi,Byung J.; Voisin,Ronald D., Conforming template for patterning liquids disposed on substrates.
  17. Bailey, Todd C.; Choi, Byung-Jin; Colburn, Matthew E.; Sreenivasan, Sidlgata V.; Willson, Carlton G.; Ekerdt, John G., Device for holding a template for use in imprint lithography.
  18. Sreenivasan,Sidlgata V., Eliminating printability of sub-resolution defects in imprint lithography.
  19. Nimmakayala, Pawan Kumar; Choi, Byung-Jin; Rafferty, Tom H.; Schumaker, Philip D., Enhanced multi channel alignment.
  20. Choi, Byung J.; Sreenivasan, Sidlgata V., Flexure based macro motion translation stage.
  21. Voisin, Ronald D., Imprint alignment method, system and template.
  22. Voisin, Ronald D., Imprint alignment method, system, and template.
  23. Xu, Frank Y.; McMackin, Ian Matthew; Lad, Pankaj B., Imprint lithography method.
  24. GanapathiSubramanian, Mahadevan; Choi, Byung-Jin; Meissl, Mario Johannes, Imprint lithography system and method.
  25. Sreenivasan,Sidlgata V.; Choi,Byung Jin; Colburn,Matthew E.; Bailey,Todd C., Imprint lithography system to produce light to impinge upon and polymerize a liquid in superimposition with template overlay marks.
  26. Bailey,Todd C.; Choi,Byung Jin; Colburn,Matthew E.; Sreenivasan,Sidlgata V.; Willson,Carlton G.; Ekerdt,John G., Imprint lithography template having a feature size under 250 nm.
  27. Sreenivasan, Sidlgata V.; Choi, Byung-Jin, Imprinting of partial fields at the edge of the wafer.
  28. Nimmakayala,Pawan Kumar; Rafferty,Tom H.; Aghili,Alireza; Choi,Byung Jin; Schumaker,Philip D.; Babbs,Daniel A., Interferometric analysis for the manufacture of nano-scale devices.
  29. Nimmakayala, Pawan Kumar; Rafferty, Tom H.; Aghili, Alireza; Choi, Byung-Jin; Schumaker, Philip D.; Babbs, Daniel A.; Truskett, Van Nguyen, Interferometric analysis method for the manufacture of nano-scale devices.
  30. DeSimone, Joseph M.; Denison Rothrock, Ginger; Maynor, Benjamin W.; Rolland, Jason P., Isolated and fixed micro and nano structures and methods thereof.
  31. DeSimone, Joseph M.; Rothrock, Ginger Denison; Maynor, Benjamin W.; Rolland, Jason P., Isolated and fixed micro and nano structures and methods thereof.
  32. Haginoya, Chiseki; Ando, Takashi; Ogino, Masahiko, Magnetic recording medium and method for production thereof.
  33. Nimmakayala,Pawan K.; Sreenivasan,Sidlgata V.; Choi,Byung Jin; Cherala,Anshuman, Magnification correction employing out-of-plane distortion of a substrate.
  34. Xu, Frank Y.; Watts, Michael P. C.; Stacey, Nicholas A., Materials for imprint lithography.
  35. Tong,William M.; Islam,M. Saif, Metallic quantum dots fabricated by a superlattice structure.
  36. Sewelll,Harry, Method and apparatus for imprint pattern replication.
  37. Choi, Byung-Jin; Sreenivasan, Sidlgata V., Method and system for double-sided patterning of substrates.
  38. Sewell,Harry, Method and system for making a nano-plate for imprint lithography.
  39. McMackin,Ian M.; Schumaker,Phillip D.; Choi,Byung Jin; Sreenivasan,Sidlgata V.; Watts,Michael P. C., Method and system to measure characteristics of a film disposed on a substrate.
  40. Xu, Frank Y., Method for adhering materials together.
  41. Xu, Frank; McMackin, Ian; Lad, PanKaj B.; Watts, Michael P. C., Method for controlling distribution of fluid components on a body.
  42. Schumaker, Philip D., Method for detecting a particle in a nanoimprint lithography system.
  43. Choi, Byung-Jin; GanapathiSubramanian, Mahadevan; Choi, Yeong-jun; Meissl, Mario J., Method for expelling gas positioned between a substrate and a mold.
  44. Choi, Byung-Jin; Sreenivasan, Sidlgata V.; McMackin, Ian M.; Lad, Pankaj B., Method for expelling gas positioned between a substrate and a mold.
  45. Willson, Carlton Grant; Sreenivasan, Sidlgata V.; Bonnecaze, Roger T., Method for fabricating nanoscale patterns in light curable compositions using an electric field.
  46. McMackin, Ian M.; Lad, Pankaj B.; Truskett, Van N., Method for fast filling of templates for imprint lithography using on template dispense.
  47. Sreenivasan, Sidlgata V.; Bonnecaze, Roger T.; Willson, Carlton Grant, Method for imprint lithography using an electric field.
  48. Xu, Frank Y.; Sreenivasan, Sidlgata V.; Fletcher, Edward Brian, Method for imprint lithography utilizing an adhesion primer layer.
  49. Sewell,Harry, Method for making a computer hard drive platen using a nano-plate.
  50. Maekawa, Shinji, Method for manufacturing semiconductor device.
  51. Choi, Byung-Jin; Sreenivasan, Sidlgata V.; Willson, Carlton Grant; Colburn, Mattherw E.; Bailey, Todd C.; Ekerdt, John G., Method of automatic fluid dispensing for imprint lithography processes.
  52. Sreenivasan,Sidlgata V.; Xu,Frank Y., Method of compensating for a volumetric shrinkage of a material disposed upon a substrate to form a substantially planar structure therefrom.
  53. Sreenivasan, Sidlgata V.; McMackin, Ian M.; Melliar-Smith, Christopher Mark; Choi, Byung-Jin, Method of concurrently patterning a substrate having a plurality of fields and a plurality of alignment marks.
  54. LaBrake,Dwayne L., Method of controlling the critical dimension of structures formed on a substrate.
  55. McMackin, Ian M.; Stacey, Nicholas A.; Babbs, Daniel A.; Voth, Duane J.; Watts, Mathew P. C.; Truskett, Van N.; Xu, Frank Y.; Voisin, Ronald D.; Lad, Pankaj B., Method of creating a turbulent flow of fluid between a mold and a substrate.
  56. Sreenivasan,Sidlgata V.; Choi,Byung Jin; Colburn,Matthew E.; Bailey,Todd C., Method of determining alignment of a template and a substrate having a liquid disposed therebetween.
  57. Sreenivasan,Sidlgata V., Method of forming a recessed structure employing a reverse tone process.
  58. Vidusek,David A.; Sreenivasan,Sidlgata V.; Wang,David C., Method of forming an in-situ recessed structure.
  59. Sreenivasan,Sidlgata V., Method of forming stepped structures employing imprint lithography.
  60. Miller,Michael N.; Stacey,Nicholas A., Method of patterning surfaces while providing greater control of recess anisotropy.
  61. Sreenivasan,Sidlgata V., Method of planarizing a semiconductor substrate with an etching chemistry.
  62. Choi, Byung Jin; Cherala, Anshuman; Babbs, Daniel A., Method of retaining a substrate to a wafer chuck.
  63. Sreenivasan, Sidlgata V.; Watts, Michael P. C., Method to arrange features on a substrate to replicate features having minimal dimensional variability.
  64. Choi, Yeong-Jun; Choi, Byung-Jin, Method to control an atmosphere between a body and a substrate.
  65. Choi,Byung Jin; Xu,Frank Y.; Stacey,Nicholas A.; Truskett,Van Xuan Hong; Watts,Michael P. C., Method to reduce adhesion between a conformable region and a pattern of a mold.
  66. DeSimone, Joseph M.; Rolland, Jason P.; Rothrock, Ginger M. Denison; Resnick, Paul, Methods and materials for fabricating microfluidic devices.
  67. DeSimone, Joseph M.; Rolland, Jason P.; Rothrock, Ginger M. Denison; Resnick, Paul, Methods and materials for fabricating microfluidic devices.
  68. DeSimone, Joseph M.; Rolland, Jason P.; Maynor, Benjamin W.; Euliss, Larkin E.; Rothrock, Ginger Denison; Dennis, Ansley E.; Samulski, Edward T.; Samulski, R. Jude, Methods for fabricating isolated micro- and nano-structures using soft or imprint lithography.
  69. DeSimone, Joseph M.; Rolland, Jason P.; Maynor, Benjamin W.; Euliss, Larken E.; Rothrock, Ginger Denison; Dennis, Ansley E.; Samulski, Edward T.; Samulski, R. Jude, Methods for fabricating isolated micro- or nano-structures using soft or imprint lithography.
  70. DeSimone, Joseph M.; Rolland, Jason P.; Maynor, Benjamin W.; Euliss, Larken E.; Rothrock, Ginger Denison; Dennis, Ansley E.; Samulski, Edward T.; Samulski, R. Jude, Methods for fabricating isolated micro- or nano-structures using soft or imprint lithography.
  71. DeSimone, Joseph M.; Rolland, Jason P.; Maynor, Benjamin W.; Euliss, Larken E.; Rothrock, Ginger Denison; Dennis, Ansley E; Samulski, Edward T.; Samulski, R. Jude, Methods for fabricating isolated micro-and nano-structures using soft or imprint lithography.
  72. Xu,Frank Y.; Stacey,Nicholas E.; Watts,Michael P. C.; Thompson,Ecron D., Methods for fabricating patterned features utilizing imprint lithography.
  73. Choi, Byung J.; Colburn, Matthew; Sreenivasan, S. V.; Willson, C. Grant; Bailey, Todd; Ekerdt, John, Methods for high-precision gap and orientation sensing between a transparent template and substrate for imprint lithography.
  74. Voisin,Ronald D., Methods of manufacturing a lithography template.
  75. McMackin,Ian M.; Lad,Pankaj B., Moat system for an imprint lithography template.
  76. Kobrin, Boris, Nanopatterning method and apparatus.
  77. Sreenivasan, Sidlgata V., Pattern reversal employing thick residual layers.
  78. Sreenivasan, Sidlgata V.; Schumaker, Philip D., Patterning a plurality of fields on a substrate to compensate for differing evaporation times.
  79. Stacey,Nicholas A.; Sreenivasan,Sidlgata V.; Miller,Michael N., Patterning substrates employing multi-film layers defining etch-differential interfaces.
  80. Choi, Byung-Jin; Sreenivasan, Sidlgata V., Patterning substrates employing multiple chucks.
  81. DeSimone, Joseph M.; Rolland, Jason P.; Quake, Stephen R.; Schorzman, Derek A.; Yarbrough, Jason; Van Dam, Michael, Photocurable perfluoropolyethers for use as novel materials in microfluidic devices.
  82. Sreenivasan,Sidlgata V., Positive tone bi-layer imprint lithography method.
  83. Imada, Aya; Den, Toru, Process of production of patterned structure.
  84. Choi,Byung Jin; Sreenivasan,Sidlgata V.; Johnson,Stephen C., Remote center compliant flexure device.
  85. Jones, Christopher Ellis; Khusnatdinov, Niyaz; Johnson, Stephen C.; Schumaker, Philip D.; Lad, Pankaj B., Residual layer thickness measurement and correction.
  86. Sreenivasan,Sidlgata V.; Stacey,Nicholas A., Reverse tone patterning on surfaces having planarity perturbations.
  87. Watts,Michael P. C.; McMackin,Ian, Scatterometry alignment for imprint lithography.
  88. Schmid, Gerard M.; Stacey, Nicholas A; Resnick, Douglas J.; Voisin, Ronald D.; Myron, Lawrence J., Self-aligned process for fabricating imprint templates containing variously etched features.
  89. McMackin,Ian M.; Stacey,Nicholas A.; Babbs,Daniel A.; Voth,Duane J.; Watts,Michael P. C.; Truskett,Van N.; Xu,Frank Y.; Voisin,Ronald D.; Lad,Pankaj B., Single phase fluid imprint lithography method.
  90. Xu, Frank Y.; Khusnatdinov, Niyaz, Single phase fluid imprint lithography method.
  91. Sreenivasan, Sidlgata V.; Choi, Byung J.; Schumaker, Norman E.; Voisin, Ronald D.; Watts, Michael P. C.; Meissl, Mario J., Step and repeat imprint lithography processes.
  92. Sewell, Harry, System and method for forming nanodisks used in imprint lithography and nanodisk and memory disk formed thereby.
  93. Sewell,Harry, System and method for forming nanodisks used in imprint lithography and nanodisk and memory disk formed thereby.
  94. Sewell, Harry, System and method for patterning both sides of a substrate utilizing imprint lithography.
  95. Sewell,Harry, System and method for patterning both sides of a substrate utilizing imprint lithography.
  96. McMackin,Ian M.; Stacey,Nicholas A.; Babbs,Daniel A.; Voth,Duane J.; Watts,Mathew P. C.; Truskett,Van N.; Xu,Frank Y.; Voisin,Ronald D.; Lad,Pankaj B., System for creating a turbulent flow of fluid between a mold and a substrate.
  97. Choi,Byung J.; Sreenivasan,Sidlgata V., System for determining characteristics of substrates employing fluid geometries.
  98. Watts,Michael P. C.; Choi,Byung Jin; Sreenivasan,Sidlgata V., System for dispensing liquids.
  99. Schumaker, Philip D.; Fancello, Angelo; Kim, Jae H.; Choi, Byung-Jin; Babbs, Daniel A., System to transfer a template transfer body between a motion stage and a docking plate.
  100. Choi,Byung Jin; Sreenivasan,Sidlgata V.; Meissl,Mario J., Systems for magnification and distortion correction for imprint lithography processes.
  101. GanapathiSubramanian, Mahadevan; Choi, Byung-Jin; Miller, Michael N.; Stacey, Nicholas A., Technique for separating a mold from solidified imprinting material.
  102. Selinidis, Kosta S.; Choi, Byung-Jin; Schmid, Gerard M.; Thompson, Ecron D.; McMackin, Ian Matthew, Template having alignment marks formed of contrast material.
  103. Sreenivasan, Sidlgata V.; Schumaker, Philip D.; McMackin, Ian M., Tessellated patterns in imprint lithography.
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