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Photopolymerizable composition 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G03F-007033
  • G03F-007037
  • G03F-007028
  • G03F-007029
출원번호 US-0073854 (2002-02-14)
우선권정보 JP-0046615 (2001-02-22)
발명자 / 주소
  • Aoshima, Keitaro
  • Fujimaki, Kazuhiro
출원인 / 주소
  • Fuji Photo Film Co., Ltd.
대리인 / 주소
    Burns, Doane, Swecker &
인용정보 피인용 횟수 : 14  인용 특허 : 24

초록

A photopolymerizable composition that is cured with visible light or an infrared laser and is used as a recording layer in a negative planographic printing plate precursor. The photopolymerizable composition is cured by exposure and includes (A) a polymerizable compound that is solid at 25° C. and h

대표청구항

1. A photopolymerizable composition that can be cured by exposure, comprising:(A) a polymerizable compound which is solid at 25° C. and has at least one radical-polymerizable ethylenically unsaturated double bond and at least one amide bond in a molecule, (B) a radical polymerization initiator havin

이 특허에 인용된 특허 (24)

  1. Terry Lane Scarlette, Abrasion resistant coatings.
  2. Yamasita Yukio (Yokohama JPX) Nakamura Toru (Yokohama JPX) Otsuki Yutaka (Yokohama JPX), Cationic electrodeposition negative type resist composition.
  3. Grunwald John J. (Ramat Gan ILX) Hirsh Shulamit (Tel Aviv ILX) Gal Chava (Ramat Hasharim ILX), Direct imaging process for forming resist pattern on a surface and use thereof in fabricating printing plates.
  4. Hauck Gerhard,DEX ; Savariar-Hauck Celin,DEX ; Timpe Hans-Joachim,DEX ; West Paul R. ; Munnelly Heidi M., IR-sensitive composition and use thereof for the preparation of printing plate precursors.
  5. Kazuto Kunita JP, Image forming material.
  6. Mohr Dieter (Wiesbaden DEX) Riess Kurt (Wiesbaden DEX), Light-sensitive aqueous developable copying material and product by coating process thereof utilizing polysiloxane and a.
  7. Shinozaki Fumiaki (Shizuoka) Fujimori Junichi (Shizuoka JPX), Light-sensitive composition consisting essentially of, in admixture a nonionic aromatic diazo compound and a cationic dy.
  8. Imai Masanori (Shizuoka JPX) Koike Mitsuru (Shizuoka JPX) Watanabe Noriaki (Shizuoka JPX) Kita Nobuyuki (Shizuoka JPX) Higashi Tatsuji (Shizuoka JPX), Light-sensitive diazo resin composition containing a higher fatty acid or higher fatty acid amide.
  9. Vermeersch Joan,BEX ; Van Damme Marc,BEX, Method for making a lithographic printing plate involving on press development.
  10. West Paul Richard ; Sheriff Eugene Lynn ; Gurney Jeffery Allen ; Schneebeli Ralph Scott ; Jordan Thomas Robert ; Miller Gary Roger, Method of providing an image using a negative-working infrared photosensitive element.
  11. Aoshima Keitaro,JPX, Negative type image recording material.
  12. Kobayashi Fumikazu,JPX, Negative type image recording material.
  13. Kausch William L. (Cottage Grove MN), Negative-acting photoresist composition.
  14. Aoshima, Keitaro, Negative-type image recording material and precursor for negative-type lithographic printing plate.
  15. Teng, Gary Ganghui, On-press developable thermosensitive lithographic plates utilizing an onium or borate salt initiator.
  16. Gary Ganghui Teng, On-press development of thermosensitive lithographic plates.
  17. Barr Robert ; Lundy Daniel ; Wheeler Stephen, Photoimageable composition having improved flexibility.
  18. Koike Mitsuru (Shizuoka JPX) Kita Nobuyuki (Shizuoka JPX), Photopolymerizable composition.
  19. Faust Raimund Josef (Wiesbaden-Biebrich DT), Photopolymerizable copying compositions containing biuret-based polyfunctional monomers.
  20. Haley Neil F. (Wellington CO) Corbiere Steven L. (Windsor CO), Radiation-sensitive composition containing a resole resin and a novolac resin and use thereof in lithographic printing p.
  21. Nguyen My T. ; Saraiya Shashikant ; Mikell Frederic E. ; Shimazu Ken-ichi ; Pappas S. Peter ; Hallman Robert W. ; Shah Ajay ; Timpe Hans-Joachim,DEX ; Savariar-Hauck Celin,DEX, Radiation-sensitive compositions and printing plates.
  22. Ishimaru Toshiaki (Hitachi JPX) Tsukada Katsushige (Hitachi JPX) Hayashi Nobuyuki (Hitachi JPX) Koibuchi Shigeru (Hitachi JPX) Isobe Asao (Hitachi JPX), Soldering mask formed from a photosensitive resin composition and a photosensitive element.
  23. Miyagawa Masashi (Kawasaki JPX) Takenouchi Masanori (Atsugi JPX) Ohkuma Norio (Machida JPX), Transfer recording medium comprising a layer changing its transferability when provided with light and heat.
  24. Walls John E. (Hampton NJ) Pagano Frank C. (Avenel NJ), Water developable lithographic composition.

이 특허를 인용한 특허 (14)

  1. Fujimaki,Kazuhiro, Curable composition and image forming material containing the same.
  2. Goto, Takahiro, Image forming method.
  3. Aoshima,Keitaro; Kikuchi,Kei, Image recording material.
  4. Gore,Makarand P.; Guo,James Z.; Gupta,Anurag, Imaging media including interference layer for generating human-readable marking on optical media.
  5. Makino, Naonori; Inno, Toshifumi, Lithographic printing process.
  6. Goto,Takahiro, Photosensitive composition.
  7. Goto,Takahiro, Photosensitive composition and planographic printing plate precursor.
  8. Goto,Takahiro, Planographic printing plate precursor.
  9. Shimada,Kazuto, Polymerizable composition and image-recording material using the same.
  10. Shimada, Kazuto, Polymerizable composition and lithographic printing plate precursor.
  11. Shibuya,Akinori; Kunita,Kazuto, Polymerizable composition and negative-working planographic printing plate precursor using the same.
  12. Sugasaki, Atsushi; Kunita, Kazuto; Fujimaki, Kazuhiro, Polymerizable composition and planographic printing plate precursor.
  13. Sugasaki,Atsushi; Kunita,Kazuto; Fujimaki,Kazuhiro, Polymerizable composition and planographic printing plate precursor.
  14. Hayoz, Pascal; Ilg, Stephan, Process for the production of strongly adherent coatings.
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