IPC분류정보
국가/구분 |
United States(US) Patent
등록
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국제특허분류(IPC7판) |
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출원번호 |
US-0788146
(2004-02-26)
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발명자
/ 주소 |
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출원인 / 주소 |
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대리인 / 주소 |
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인용정보 |
피인용 횟수 :
4 인용 특허 :
22 |
초록
▼
Systems and methods are provided for delivering solid precursors in deposition processes. A flow monitor is used to measure and regulate the flow of vaporized solid precursor material from a vaporization chamber to a deposition chamber. The flow monitor chokes the supply of vapor into the deposition
Systems and methods are provided for delivering solid precursors in deposition processes. A flow monitor is used to measure and regulate the flow of vaporized solid precursor material from a vaporization chamber to a deposition chamber. The flow monitor chokes the supply of vapor into the deposition chamber to regulate vapor flow. To avoid condensation of the solid precursor material in the delivery lines or flow monitor, a controller is placed in a feed back loop to monitor the flow rate and make adjustments to the amount of vapor available at the inlet of the flow monitor.
대표청구항
▼
1. A vapor delivery system for a solid precursor comprising:a vaporization chamber; a first surface within said vaporization chamber, said first surface arranged to hold a solid precursor material; a heating device having a temperature control, said temperature control arranged to vary the temperatu
1. A vapor delivery system for a solid precursor comprising:a vaporization chamber; a first surface within said vaporization chamber, said first surface arranged to hold a solid precursor material; a heating device having a temperature control, said temperature control arranged to vary the temperature of said heating device over a range of temperatures, at least a portion of the temperatures within said range of temperatures sufficient to transform said solid precursor material to a vapor, wherein said heating device is arranged to transfer heat to said first surface; a delivery line coupled to said vaporization chamber; a flow monitor arranged to measure the flow of said vapor through said delivery line; and a controller having a first input coupled to said flow monitor and a first output coupled to said temperature control of said heating device, said controller arranged to control the supply of said vapor to said delivery line by varying said first output to adjust the temperature of said heating device based at least in part on the measured flow of said vapor at said first input. 2. A vapor delivery system for a solid precursor according to claim 1, wherein said heating device comprises a thermoelectric heating device.3. A vapor delivery system for a solid precursor according to claim 1, wherein said heating device is arranged to heat said first surface to a temperature sufficient to sublimate said solid precursor material.4. A vapor delivery system for a solid precursor according to claim 1, wherein said controller comprises a microprocessor based controller.5. A vapor delivery system for a solid precursor according to claim 1, wherein said controller comprises a general purpose computer.6. A vapor delivery system for a solid precursor according to claim 1, wherein said flow monitor comprises a pulsed gate flow mass flow controller.7. A vapor delivery system for a solid precursor according to claim 1, wherein said flow monitor comprises a sonic nozzle mass flow controllers.8. A vapor delivery system for a solid precursor according to claim 1, further comprising a pressure sensor arranged to measure the pressure of said vapor within said delivery line, wherein said controller has a second input coupled to said pressure sensor, said second input receiving as a second input signal the measured pressure of said vapor.9. A vapor delivery system for a solid precursor according to claim 8, wherein said controller is arranged to vary said first output to adjust the temperature of said heating device based at least in part on the measured pressure of said pressure sensor.10. A vapor delivery system for a solid precursor according to claim 9, wherein said controller is arranged to compare said measured pressure against a guard band range of pressures, and said controller varies said first output to adjust the temperature of said heating device if said measured pressure is outside of said guard band range of pressures.11. A vapor delivery system for a solid precursor according to claim 1, further comprising a temperature sensor arranged to measure the temperature of said vapor within said delivery line, wherein said controller has a second input coupled to said temperature sensor, said second input receiving as a second input signal the measured temperature of said vapor.12. A vapor delivery system for a solid precursor according to claim 1, further comprising a gas source coupled to an inlet in said vaporization chamber, wherein said gas source is arranged to supply a gas to said delivery line, said gas transferred to said delivery line to regulate the pressure within said delivery line.13. A vapor delivery system for a solid precursor according to claim 12, wherein said controller further comprises a second output adapted to adjust the amount of said gas that is supplied to said delivery line by said gas source.14. A vapor delivery system for a solid precursor according to claim 12, wherein said gas comprises an inert gas.15. A vapor delivery system for a solid precursor comprising:a vaporization chamber; a first surface within said vaporization chamber, said first surface arranged to hold a solid precursor material; a heating device having a temperature control, said temperature control arranged to vary the temperature of said heating device over a range of temperatures, at least a portion of the temperatures within said range of temperatures sufficient to transform said solid precursor material to a vapor, wherein said heating device is arranged to transfer heat to said first surface; a delivery line coupled to said vaporization chamber; a flow monitor arranged to measure the flow of said vapor through said delivery line; a pressure sensor arranged to measure the pressure of said vapor within said delivery line; a gas source coupled to an inlet in said vaporization chamber, said gas source arranged to supply an inert gas to said delivery line; and a controller comprising: a first input coupled to said flow monitor; a second input coupled to said pressure sensor; a first output coupled to said temperature control of said heating device, and a second output coupled to said gas source, wherein said controller is arranged to control the supply of said vapor to said delivery line by varying said first output to adjust the temperature of said heating device based at least in part on the measured flow of said vapor at said first input, and by varying said second output to adjust the flow of said inert gas based at least in part on the measured pressure of said vapor at said second input. 16. A vapor delivery system for a solid precursor comprising:a vaporization chamber; a first surface within said vaporization chamber, said first surface arranged to hold a solid precursor material; a heating device having a temperature control, said temperature control arranged to vary the temperature of said heating device over a range of temperatures, at least a portion of the temperatures within said range of temperatures sufficient to transform said solid precursor material to a vapor, wherein said heating device is arranged to transfer heat to said first surface; a delivery line coupled to said vaporization chamber; a flow monitor arranged to measure the flow of said vapor through said delivery line; a pressure sensor arranged to measure the pressure of said vapor within said delivery line; a temperature sensor arranged to measure the temperature of said vapor within said delivery line; a gas source coupled to an inlet in said vaporization chamber, said gas source arranged to supply an inert gas to said delivery line; a flow regulator coupled between said gas source and said inlet in said vaporization chamber, and a controller comprising: a first input coupled to said flow monitor; a second input coupled to said pressure sensor; a third input coupled to said temperature sensor; a first output coupled to said temperature control of said heating device, and a second output coupled to said flow regulator, wherein said controller is arranged to control the supply of said vapor to said delivery line by varying said first output to adjust the temperature of said heating device based at least in part on the measured flow of said vapor at said first input, and by varying said second output to adjust the flow of said inert gas through said flow regulator, based at least in part on the measured pressure of said vapor at said second input, and the measured temperature of said vapor at said third input. 17. A chemical vapor deposition system comprising:a vaporization chamber; a first surface within said vaporization chamber, said first surface arranged to hold a solid precursor material; a heating device having a temperature control, said temperature control arranged to vary the temperature of said heating device over a range of temperatures, at least a portion of the temperatures within said range of temperatures sufficient to transform said solid precursor material to a vapor, wherein said heating device is arranged to transfer heat to said first surface; a deposition chamber; a delivery line arranged to couple said vaporization chamber to said deposition chamber; a flow monitor arranged to measure the flow of said vapor through said delivery line; and a controller having a first input coupled to said flow monitor and a first output coupled to said temperature control of said heating device, said controller arranged to control the supply of said vapor to said delivery line by varying said first output to adjust the temperature of said heating device based at least in part on the measured flow of said vapor at said first input. 18. A vapor delivery system for a solid precursor comprising:a vaporization chamber; a first surface within said vaporization chamber, said first surface arranged to hold a solid precursor material; a heating device arranged to heat said first surface sufficient to transform said solid precursor material to a vapor; a delivery line coupled to said vaporization chamber, said delivery line arranged to route said vapor in a first direction and a second direction; a first flow monitor arranged to measure the flow of said vapor through said delivery line in said first direction; a first valve arranged to regulate the flow of said vapor through said delivery line in said second direction; a first pump coupled to said delivery line, said first pump arranged to draw vapor through said delivery line in said second direction; and a controller having a first input coupled to said first flow monitor and a first output coupled to said first valve, said controller arranged to bleed off excess amounts of said vapor located in said first direction of said delivery line by varying said first output to adjust said valve based at least in part on the measured flow of said vapor at said first input. 19. A vapor delivery system for a solid precursor according to claim 18, wherein said controller comprises a microprocessor based controller.20. A vapor delivery system for a solid precursor according to claim 18, wherein said controller comprises a general purpose computer.21. A vapor delivery system for a solid precursor according to claim 18, wherein said first flow monitor comprises a pulsed gate flow mass flow controller.22. A vapor delivery system for a solid precursor according to claim 18, wherein said first flow monitor comprises a sonic nozzle mass flow controller.23. A vapor delivery system for a solid precursor according to claim 18, further comprising a pressure sensor arranged to measure the pressure of said vapor within said delivery line in said first direction, wherein said controller has a second input coupled to said pressure sensor, said second input receiving as a second input signal the measured pressure of said vapor.24. A vapor delivery system for a solid precursor according to claim 23, wherein said controller is arranged to vary said first output to adjust said first valve based at least in part on the measured pressure of said pressure sensor.25. A vapor delivery system for a solid precursor according to claim 24, wherein said controller is arranged to compare said measured pressure against a guard band range of pressures, and said controller varies said first output to adjust said first valve if said measured pressure is outside of said guard band range of pressures.26. A vapor delivery system for a solid precursor according to claim 18, further comprising a temperature sensor arranged to measure the temperature of said vapor within said delivery line in said first direction, wherein said controller has a second input coupled to said temperature sensor, said second input receiving as a second input signal the measured temperature of said vapor.27. A vapor delivery system for a solid precursor according to claim 18, further comprising a gas source coupled to an inlet in said vaporization chamber, wherein said gas source is arranged to supply a gas to said delivery line, said gas transferred to said delivery line to regulate the pressure within said delivery line.28. A vapor delivery system for a solid precursor according to claim 27, wherein said controller further comprises a second output coupled to said flow regulator, said second output adapted to adjust the amount of said gas that is supplied to said delivery line by said gas source.29. A vapor delivery system for a solid precursor according to claim 28, wherein said gas comprises an inert gas.30. A vapor delivery system for a solid precursor according to claim 18, wherein said first valve comprises a digital valve.31. A vapor delivery system for a solid precursor according to claim 18, wherein said first valve comprises a pulsed gate valve.32. A vapor delivery system for a solid precursor according to claim 18, wherein said first valve is positioned upstream of said first flow monitor.33. A vapor delivery system for a solid precursor comprising:a vaporization chamber; a first surface within said vaporization chamber, said first surface arranged to hold a solid precursor material; a heating device arranged to heat said first surface sufficient to transform said solid precursor material to a vapor, a delivery line coupled to said vaporization chamber, said delivery line arranged to route said vapor in a first direction and a second direction; a first flow monitor arranged to measure the flow of said vapor through said delivery line in said first direction; a first pressure sensor arranged to measure the pressure of said vapor within said delivery line in said first direction; a first valve arranged to regulate the flow of said vapor through said delivery line in said second direction; a first pump coupled to said delivery line, said first pump arranged to draw vapor through said delivery line in said second direction; a gas source coupled to an inlet in said vaporization chamber, said gas source arranged to supply an inert gas to said delivery line; a flow regulator between said gas source and said inlet in said vaporization chamber; and a controller comprising: a first input coupled to said first flow monitor; a second input coupled to said first pressure sensor; a first output coupled to said first valve; and a second output coupled to said flow regulator; wherein said controller is arranged to bleed off excess amounts of said vapor in said first direction of said delivery line by varying said first output to adjust said valve and by varying said second output to adjust the amount of said inert gas that is supplied to said delivery line by said gas source, based at least in part on the measured flow of said vapor at said first input and the measured pressure of said vapor at said second input. 34. A vapor delivery system for a solid precursor comprising:a vaporization chamber; a first surface within said vaporization chamber, said first surface arranged to hold a solid precursor material; a heating device arranged to heat said first surface sufficient to transform said solid precursor material to a vapor; a delivery line coupled to said vaporization chamber, said delivery line arranged to route said vapor in a first direction and a second direction; a first flow monitor arranged to measure the flow of said vapor through said delivery line in said first direction; a first pressure sensor arranged to measure the pressure of said vapor within said delivery line in said first direction; a first temperature sensor arranged to measure the temperature of said vapor within said delivery line in said first direction; a first valve arranged to regulate the flow of said vapor through said delivery line in said second direction; a first pump coupled to said delivery line, said first pump arranged to draw vapor through said delivery line in said second direction; a gas source coupled to an inlet in said vaporization chamber, said gas source arranged to supply an inert gas to said delivery line; a flow regulator between said gas source and said inlet in said vaporization chamber; and a controller comprising: a first input coupled to said first flow monitor; a second input coupled to said first pressure sensor; a third input coupled to said first temperature sensor; a first output coupled to said first valve; and a second output coupled to said flow regulator, wherein said controller is arranged to bleed off excess amounts of said vapor in said first direction of said delivery line by varying said first output to adjust said valve and by varying said second output to adjust the amount of said inert gas that is supplied to said delivery line by said gas source, based at least in part on the measured flow of said vapor at said first input, the measured pressure of said vapor at said second input, and the measured temperature of said vapor at said third input. 35. A chemical vapor deposition system comprising:a vaporization chamber, a first surface within said vaporization chamber, said first surface arranged to hold a solid precursor material; a heating device arranged to heat said first surface sufficient to transform said solid precursor material to a vapor; a deposition chamber; a delivery line arranged to couple said deposition chamber to said vaporization chamber, said delivery line having a first delivery line arranged to route said vapor in a first direction from said vaporization chamber toward said deposition chamber, and said delivery line having a second delivery line arranged to route said vapor in a second direction from said vaporization chamber away from said deposition chamber; a first flow monitor arranged to measure the flow of said vapor through said delivery line in said first direction; a first valve arranged to regulate the flow of said vapor through said delivery line in said second direction; a first pump coupled to said delivery line, said first pump arranged to draw vapor through said delivery line in said second direction; and a controller having a first input coupled to said first flow monitor and a first output coupled to said first valve, said controller arranged to bleed off excess amounts of said vapor in said first direction of said delivery line by varying said first output to adjust said valve based at least in part on the measured flow of said vapor at said first input. 36. A vapor delivery system for a solid precursor comprising:a vaporization chamber; a first surface within said vaporization chamber, said first surface arranged to hold a solid precursor material; a heating device having a temperature control, said temperature control arranged to vary the temperature of said heating device over a range of temperatures, at least a portion of the temperatures within said range of temperatures sufficient to transform said solid precursor material to a vapor, wherein said heating device is arranged to transfer heat to said first surface; a delivery line coupled to said vaporization chamber, said delivery line arranged to route said vapor in a first direction and a second direction; a first flow monitor arranged to measure the flow of said vapor through said delivery line in said first direction; a valve arranged to regulate the flow of said vapor through said delivery line in said second direction; a first pump coupled to said delivery line, said first pump arranged to draw vapor through said delivery line in said second direction; and a controller having a first input coupled to said first flow monitor, a first output coupled to said temperature control of said heating device, and a second output coupled to said valve, said controller arranged to control the supply of said vapor to said delivery line in said first direction based at least in part on the measured flow of said vapor at said first input by varying said first output to adjust the temperature of said heating device and to bleed off excess amounts of said vapor in said first direction by varying said second output to adjust said valve. 37. A vapor delivery system for a solid precursor according to claim 36, further comprising a pressure sensor arranged to measure the pressure of said vapor within said delivery line in said first direction, wherein said controller has a second input coupled to said pressure sensor, said second input receiving as a second input signal the measured pressure of said vapor.38. A vapor delivery system for a solid precursor according to claim 37, wherein said controller is arranged to vary said first output to adjust the temperature of said heating device based at least in part on the measured pressure of said pressure sensor.39. A vapor delivery system for a solid precursor according to claim 38, wherein said controller is arranged to compare said measured pressure against a guard band range of pressures, and said controller varies said first output to adjust the temperature of said heating device if said measured pressure is outside of said guard band range of pressures.40. A vapor delivery system for a solid precursor according to claim 36, further comprising a temperature sensor arranged to measure the temperature of said vapor within said delivery line in said first direction, wherein said controller has a second input coupled to said temperature sensor, said second input receiving as a second input signal the measured temperature of said vapor.41. A vapor delivery system for a solid precursor according to claim 36, further comprising a gas source coupled to an inlet in said vaporization chamber, wherein said gas source is arranged to supply a gas to said delivery line, said gas transferred to said delivery line to regulate the pressure within said delivery line.42. A vapor delivery system for a solid precursor according to claim 41, wherein said controller further comprises a second output adapted to adjust the amount of said gas that is supplied to said delivery line by said gas source.43. A vapor delivery system for a solid precursor according to claim 41, wherein said gas comprises an inert gas.44. A vapor delivery system for a solid precursor according to claim 36, wherein said first valve comprises a digital valve.45. A vapor delivery system for a solid precursor according to claim 36, wherein said first valve comprises a pulsed gate valve.46. A vapor delivery system for a solid precursor according to claim 36, wherein said first valve is positioned upstream of said first flow monitor.47. A vapor delivery system for a solid precursor comprising:a vaporization chamber; a first surface within said vaporization chamber, said first surface arranged to hold a solid precursor material; a heating device having a temperature control, said temperature control arranged to vary the temperature of said heating device over a range of temperatures, at least a portion of the temperatures within said range of temperatures sufficient to transform said solid precursor material to a vapor, wherein said heating device is arranged to transfer heat to said first surface; a delivery line coupled to said vaporization chamber, said delivery line arranged to route said vapor in a first direction and a second direction; a flow monitor arranged to measure the flow of said vapor through said delivery line in said first direction; a pressure sensor arranged to measure the pressure of said vapor within said delivery line in said first direction; a valve arranged to regulate the flow of said vapor through said delivery line in said second direction; a first pump coupled to said delivery line, said first pump arranged to draw vapor through said delivery line in said second direction; a gas source coupled to an inlet in said vaporization chamber, said gas source arranged to supply an inert gas to said delivery line; a flow regulator between said gas source and said inlet in said vaporization chamber; and a controller having a first input coupled to said flow monitor, a second input coupled to said pressure sensor, a first output coupled to said temperature control of said heating device, a second output coupled to said valve, and a third output coupled to said flow regulator, said controller arranged to control the supply of said vapor to said delivery line in said first direction based at least in part on the measured flow and pressure of said vapor at said first and second inputs by varying said first output to adjust the temperature of said heating device, to bleed off excess amounts of said vapor in said first direction by varying said second output to adjust said valve, and by varying said third output to adjust the amount of inert gas in said delivery line. 48. A vapor delivery system for a solid precursor comprising:a vaporization chamber; a first surface within said vaporization chamber, said first surface arranged to hold a solid precursor material; a heating device having a temperature control, said temperature control arranged to vary the temperature of said heating device over a range of temperatures, at least a portion of the temperatures within said range of temperatures sufficient to transform said solid precursor material to a vapor, wherein said heating device is arranged to transfer heat to said first surface; a delivery line coupled to said vaporization chamber, said delivery line arranged to route said vapor in a first direction and a second direction; a flow monitor arranged to measure the flow of said vapor through said delivery line in said first direction; a pressure sensor arranged to measure the pressure of said vapor within said delivery line in said first direction; a temperature sensor arranged to measure the temperature of said vapor within said delivery line in said first direction; a valve arranged to regulate the flow of said vapor through said delivery line in said second direction; a first pump coupled to said delivery line, said first pump arranged to draw vapor through said delivery line in said second direction; a gas source coupled to an inlet in said vaporization chamber, said gas source arranged to supply an inert gas to said delivery line; a flow regulator between said gas source and said inlet in said vaporization chamber; and a controller having a first input coupled to said flow monitor, a second input coupled to said pressure sensor, a third input coupled to said temperature sensor, a first output coupled to said temperature control of said heating device, a second output coupled to said valve, and a third output coupled to said flow regulator, said controller arranged to control the supply of said vapor to said delivery line in said first direction based at least in part on the measured flow, pressure, and temperature of said vapor at said first, second, and third inputs by varying said first output to adjust the temperature of said heating device, to bleed off excess amounts of said vapor in said first direction by varying said second output to adjust said valve, and by varying said third output to adjust the amount of inert gas in said delivery line.
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