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특허 상세정보

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Gas port sealing for CVD/CVI furnace hearth plates

특허상세정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판) C23C-01600    C23C-016455   
미국특허분류(USC) 427/249.2; 029/428; 432/003
출원번호 US-0849273 (2004-05-19)
발명자 / 주소
  • Jonnalagadda, Rajanikant
  • Miller, Brian J.
출원인 / 주소
  • Honeywell International Inc.
인용정보 피인용 횟수 : 19  인용 특허 : 27
초록
▼

A method and apparatus for sealing gas ports in CVD/CVI furnaces and processes is disclosed. A fluid direction nozzle (160) is positioned between a top lip (101) of a gas inlet port (100) delivering a reactant gas (G) to a furnace compartment(200) in a CVD/CVI furnace (10) and corresponding holes (151) of a CVD/CVI process apparatus such as a hearth plate (150). The fluid direction nozzle 160 reduces leakage of reactant gases (G) and ensures a smooth transition of gas flow direction between the gas inlet port (100) and the corresponding holes (151). CVD/...

대표
청구항
▼

1. A method for sealing gas inlet ports for delivering a process gas in a CVD/CVI furnace, said method comprising:positioning flow direction nozzles along upper lips of said gas inlet ports; loading a CVD/CVI process apparatus having a plurality of gas inlet holes into said furnace; sealingly engaging the flow direction nozzles to said gas inlet holes of said process apparatus to create a gas-path directing, fluid seal. 2. The method according to claim 1, wherein the CVD/CVI process apparatus is a hearth plate having hearth plate holes, and the CVD/CVI p...

인용문헌 (27)

  1. Rudolph James W. (Colorado Springs CO) Purdy Mark J. (Akron OH) Bok Lowell D. (Anna OH), Apparatus for use with CVI/CVD processes.
  2. Rudolph James W. ; Purdy Mark J. ; Bok Lowell D., Apparatus for use with CVI/CVD processes.
  3. Fiala Robert ; Zeigler Dary ; Welson Darren ; Del Real Jose ; Rudolph James W., Combination CVI/CVD and heat treat susceptor lid.
  4. Rudolph James Warren ; Stevens Scott William, Combination CVI/CVD and heat treat susceptor lid.
  5. Lackey Walter Jackson ; Vaidyaraman Sundar, Fabrication of carbon/carbon composites by forced flow-thermal gradient chemical vapor infiltration.
  6. Koyama, Yoshihiro, Focused ion beam apparatus having a gas injector in which one of a plurality of nozzles can be selectively driven for elevation.
  7. Ishikawa Tetsuya ; Krishnaraj Padmanabhan ; Gao Feng ; Collins Alan W. ; Pang Lily, Gas distribution system for a CVD processing chamber.
  8. Quirk George ; Raney Daniel V. ; Heuser Michael Scott ; Shepard ; Jr. C. B., Gas injection disc assembly for CVD applications.
  9. Maydan Dan ; Mak Steve S. Y. ; Olgado Donald ; Yin Gerald Zheyao ; Driscoll Timothy D. ; Papanu James S. ; Tepman Avi, Gas injection slit nozzle for a plasma process reactor.
  10. Maydan Dan ; Mak Steve S. Y. ; Olgado Donald ; Yin Gerald Zheyao ; Driscoll Timothy D. ; Papanu James S. ; Tepman Avi, Gas injection slit nozzle for a plasma process reactor.
  11. Ni Tuqiang ; Demos Alex, Gas injection system for plasma processing.
  12. Young Lydia J. ; Matthiesen Richard H. ; Selitser Simon ; Os Ron van, Gas injection system for semiconductor processing.
  13. Jonnalagadda, Rajanikant; Miller, Brian J., Gas port sealing for CVD/CVI furnace hearth plates.
  14. Sion, Eric; Baudry, Yvan, Gas preheater and process for controlling distribution of preheated reactive gas in a CVI furnace for densification of porous annular substrates.
  15. Daws, David E.; Rudolph, James W.; Zeigler, Dary; Bazshushtari, Afshin, Hardware assembly for CVI/CVD processes.
  16. Okase Wataru (Sagamihara JPX) Tanahashi Takashi (Sagamihara JPX) Matsuo Takenobu (Kofu JPX), Heat-treating apparatus.
  17. Uchiyama Taroh,JPX ; Yoshikawa Yukio,JPX ; Tsukamoto Takashi,JPX ; Nishihama Jiro,JPX, Low pressure CVD system.
  18. James Warren Rudolph, Method and apparatus for inhibiting infiltration of a reactive gas into porous refractory insulation.
  19. White Carl (Gilbert AZ) MacErnie Jon R. (Chandler AZ) Hillman Joseph T. (Scottsdale AZ), Method and apparatus for isolating a susceptor heating element from a chemical vapor deposition environment.
  20. Roger A. Ross ; Patrick C. Trujillo ; Robert Fiala, Method and apparatus for pressure measurement in a CVI/CVD furnace.
  21. Hanley Thomas Martin, Method and apparatus for purging barrel reactors.
  22. Roberson ; Jr. Glenn A. ; Genco Robert M. ; Eglinton Robert B. ; Comer Wayland ; Mundt Gregory K., Molecular contamination control system.
  23. Sato Yasuhiko,JPX ; Fujita Hiroaki,JPX, Nozzle tip for glass injection cartridge.
  24. Rudolph James W. ; Purdy Mark J., Pressure gradient CVI/CVD apparatus process and product.
  25. Rudolph James W. ; Purdy Mark J., Pressure gradient CVI/CVD apparatus, process and product.
  26. Rudolph James Warren, Sealed reactant gas inlet for a CVI/CVD furnace.
  27. Sekizuka Hiroshi (Shiroyama JPX), Sealing apparatus.

이 특허를 인용한 특허 (19)

  1. Nordberg, Timothy J.; Chiain, Brent; Schultz, Michael W.; Bird, Douglas D., Burner firing rate determination for modulating furnace.
  2. Nordberg, Timothy J.; Chian, Brent; Schultz, Michael W.; Bird, Douglas D., Burner firing rate determination for modulating furnace.
  3. Chian, Brent; Nordberg, Timothy J., Combustion blower control for modulating furnace.
  4. Chian, Brent; Nordberg, Timothy J., Combustion blower control for modulating furnace.
  5. Chian, Brent; Nordberg, Timothy J., Combustion blower control for modulating furnace.
  6. Schultz, Michael W., Combustion blower control for modulating furnace.
  7. Schultz, Michael William; McDonald, Jonathan; Cueva, Victor J., Furnace with modulating firing rate adaptation.
  8. Schultz, Michael William; McDonald, Jonathan; Cueva, Victor J., Furnace with modulating firing rate adaptation.
  9. Miller, Brian J.; Arico, Alan A.; Waghray, Akshay; Menzie, Todd M.; Cress, James Jay, Gas preheater for chemical vapor processing furnace.
  10. Cress, James Jay; Miller, Brian J., Gas preheater for chemical vapor processing furnace having circuitous passages.
  11. Schultz, Michael W., Gas pressure control for warm air furnaces.
  12. Leen, Cary; Zywicki, III, Stan; Schnell, Robert J., HVAC control with comfort/economy management.
  13. Leen, Cary; Zywicki, Stan; Schnell, Robert J., HVAC control with comfort/economy management.
  14. Rudolph, James Warren; She, Ying; Dardas, Zissis A.; Filburn, Thomas P.; St. Rock, Brian; Linck, John, Methods for modifying pressure differential in a chemical vapor process.
  15. Super, Willem, Mixing device for a gas burner.
  16. Schultz, Michael W., Negative pressure conditioning device and forced air furnace employing same.
  17. Schultz, Michael W., Negative pressure conditioning device with low pressure cut-off.
  18. Praat, Jos; Vrolijk, Enno, Regulating device for gas burners.
  19. Nordberg, Timothy J.; Chian, Brent; Bird, Douglas D.; Schultz, Michael W.; Anderson, Peter M., Selectable efficiency versus comfort for modulating furnace.

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