IPC분류정보
국가/구분 |
United States(US) Patent
등록
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국제특허분류(IPC7판) |
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출원번호 |
US-0917400
(2001-07-27)
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발명자
/ 주소 |
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출원인 / 주소 |
|
대리인 / 주소 |
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인용정보 |
피인용 횟수 :
25 인용 특허 :
35 |
초록
▼
A multiple source array for illuminating an object including: a reflective mask having an array of spatially separated apertures; at least one optic positioned relative to the mask to form an optical cavity with the mask; and a source providing electromagnetic radiation to the optical cavity to reso
A multiple source array for illuminating an object including: a reflective mask having an array of spatially separated apertures; at least one optic positioned relative to the mask to form an optical cavity with the mask; and a source providing electromagnetic radiation to the optical cavity to resonantly excite a mode supported by the optical cavity, wherein during operation a portion of the electromagnetic radiation built-up in the cavity leaks through the mask apertures towards the object.
대표청구항
▼
1. A multiple source array for illuminating an object, the multiple source array comprising:a reflective mask having an array of spatially separated apertures; at least one optic positioned relative to the mask to form an optical cavity with the mask; and a source providing electromagnetic radiation
1. A multiple source array for illuminating an object, the multiple source array comprising:a reflective mask having an array of spatially separated apertures; at least one optic positioned relative to the mask to form an optical cavity with the mask; and a source providing electromagnetic radiation to the optical cavity to resonantly excite a mode supported by the optical cavity, wherein during operation a portion of the electromagnetic radiation built-up in the cavity leaks through the mask apertures towards the object, and wherein each aperture has a transverse dimension smaller than the vacuum wavelength of the electromagnetic radiation provided by the source. 2. The multiple source array of claim 1, wherein the excited mode has transverse dimensions at the reflective mask that are larger than a transverse dimension of each aperture.3. The multiple source array of claim 2, wherein the transverse dimensions of the excited mode at the reflective mask are more than 50 times larger than the transverse dimension of each aperture.4. The multiple source array of claim 1, wherein the apertures are formed by holes in the reflective mask.5. The multiple source array of claim 1, wherein the apertures are formed by dielectric regions in the reflective mask.6. The multiple source array of claim 1, wherein each aperture comprises a dielectric region defining a waveguide having transverse dimensions sufficient to support a propagating mode of the electromagnetic radiation, wherein during operation the waveguides couple the electromagnetic energy built-up in the cavity between opposite sides of the mask.7. The multiple source array of claim 6, wherein the reflective mask further comprises an end mask portion adjacent the object, and wherein each aperture further comprises a secondary aperture formed in the end mask portion and aligned with the corresponding waveguide, wherein each secondary aperture has a transverse dimension smaller than the transverse dimensions of the corresponding waveguide.8. The multiple source array of claim 7, wherein the transverse dimension of each secondary aperture is smaller than the vacuum wavelength of the electromagnetic radiation provided by the source.9. The multiple source array of claim 7, wherein the reflective mask comprises a reflective dielectric stack surrounding the waveguides, and wherein the end mask portion comprises a metal layer.10. The multiple source array of claim 6, wherein each waveguide defines a second optical cavity between the opposite sides of the mask, and wherein the length of each waveguide is selected to be resonant with the corresponding propagating mode of the electromagnetic radiation.11. The multiple source array of claim 1, wherein the reflective mask comprises a reflective dielectric stack.12. The multiple source array of claim 11, wherein the reflective dielectric stack is adjacent the optical cavity and the reflective mask further comprises an antireflection coating adjacent the object.13. The multiple source array of claim 1, further comprising a dielectric material contacting the mask in the optical cavity.14. The multiple source array of claim 13, wherein the dielectric material is an Amici lens.15. The multiple source array of claim 13, wherein the optical cavity is a linear optical cavity.16. The multiple source array of claim 15, wherein the at least one optic comprises one optic and the linear optical cavity is formed by two surfaces, the first surface being defined by the optic and the second surface being defined by the interface between the reflective mask and dielectric material.17. The multiple source array of claim 16, wherein the dielectric material fills the space between the two surfaces and the first surface is defined by the interface between the optic and the dielectric material.18. The multiple source array of claim 17, wherein the optic is a lens.19. The multiple source array of claim 1, wherein the at least one optic comprises two optics and the cavity is a folded cavity formed by three surfaces, the first surface being defined by the first optic, the second surface being defined by the second optic, and the third surface being defined by the interface between the reflective mask and a dielectric material.20. The multiple source array of claim 1, wherein the optical cavity is a ring cavity.21. The multiple source array of claim 1, further comprising an active feedback system for maintaining the resonance between the optical cavity and the electromagnetic radiation provided by the source.22. The multiple source array of claim 21, wherein the active feedback system comprises an electronic controller that causes the source to change the wavelength of the electromagnetic radiation in response to a servo signal derived from a portion of the electromagnetic radiation reflected from the optical cavity.23. The multiple source array of claim 21, further comprising a dielectric material at least partially filling the optical cavity, and wherein the active feedback system comprises a temperature controller coupled to the dielectric material and an electronic controller that causes the temperature controller to change the temperature of the dielectric material in response to a servo signal derived from a portion of the electromagnetic radiation reflected from the optical cavity.24. The multiple source array of claim 21, wherein the active feedback system comprises a transducer coupled to one of the optics that form the optical cavity and an electronic controller that causes the transducer to dither the coupled optic in response to a servo signal derived from a portion of the electromagnetic radiation reflected from the optical cavity.25. The multiple source array of claim 1, wherein the at least one optic positioned relative to the mask forms a stable optical cavity with the mask.26. A multiple source array for illuminating an object, the multiple source array comprising:a reflective mask having an array of spatially separated apertures; at least one optic positioned relative to the mask to form an optical cavity with the mask; and a source providing electromagnetic radiation to the optical cavity to resonantly excite a mode supported by the optical cavity, wherein during operation a portion of the electromagnetic radiation built-up in the cavity leaks through the mask apertures towards the object, wherein the at least one optic comprises two optics and the cavity is a folded cavity formed by three surfaces, the first surface being defined by the first optic, the second surface being defined by the second optic, and the third surface being defined by the interface between the reflective mask and a dielectric material, and wherein the first and second surfaces define the end surfaces for the folded optical cavity. 27. A multiple source array for illuminating an object, the multiple source array comprising:a reflective mask having an array of spatially separated apertures; at least one optic positioned relative to the mask to form an optical cavity with the mask; and a source providing electromagnetic radiation to the optical cavity to resonantly excite a mode supported by the optical cavity, wherein during operation a portion of the electromagnetic radiation built-up in the cavity leaks through the mask apertures towards the object, wherein the optical cavity is a ring cavity, and wherein the at least one optic comprises two optics and the ring cavity is formed by three surfaces, the first surface being defined by the first optic, the second surface being defined by the second optic, and the third surface being defined by the interface between the reflective mask and dielectric material. 28. A microscopy system for imaging an object, the microscopy system comprising:a multiple source array comprising a reflective mask having an array of spatially separated apertures, at least one optic positioned relative to the mask to form an optical cavity with the mask, and a source providing electromagnetic radiation to the optical cavity to resonantly excite a mode supported by the optical cavity, wherein during operation a portion of the electromagnetic radiation built-up in the cavity leaks through the mask apertures towards the object; a multi-element photo-detector; and an imaging system positioned to direct a return beam to the multi-element photo-detector, wherein the return beam comprises electromagnetic radiation scattered/reflected by the object back through the apertures in response to the electromagnetic radiation leaked through the apertures towards the object. 29. The microscopy system of claim 28, wherein each aperture has a transverse dimension smaller than the vacuum wavelength of the electromagnetic radiation provided by the source.30. The microscopy system of claim 28, wherein each aperture has a transverse dimension equal to the vacuum wavelength of the electromagnetic radiation provided by the source.31. The microscopy system of claim 28, further comprising a pinhole array positioned adjacent the multi-element photo-detector, wherein the multi-element photo-detector comprises multiple detector elements, wherein each pinhole is aligned with a separate set of one or more of the detector elements, and wherein the imaging system produces a conjugate image of each aperture on a corresponding pinhole of the pinhole array.32. The microscopy system of claim 28, further comprising:an interferometer which separates the electromagnetic radiation from the source into a measurement beam which is directed to the optical cavity and a reference beam which is directed along a reference beam path and combined with the return beam to interfere at the multi-element photo-detector. 33. A microscopy system for imaging an object, the microscopy system comprising:a multiple source array comprising a reflective mask having an array of spatially separated apertures, at least one optic positioned relative to the mask to form an optical cavity with the mask, and a source providing electromagnetic radiation to the optical cavity to resonantly excite a mode supported by the optical cavity, wherein during operation a portion of the electromagnetic radiation built-up in the cavity leaks through the mask apertures towards the object; a multiple detector array comprising an array of spatially separated apertures; a multi-element photo-detector; and an imaging system positioned to image a signal beam to the multi-element photo-detector, wherein the signal beam comprises electromagnetic radiation transmitted by the object through the apertures of the multiple detector array in response to the electromagnetic radiation leaked through the apertures of the multiple source array towards the object. 34. A microscopy system of claim 33, wherein the apertures of the source array are aligned with the apertures of the detector array.35. The microscopy system of claim 33, further comprising a pinhole array positioned adjacent the multiple-element photo-detector, wherein the multiple-element photo-detector comprises multiple detector elements, wherein each pinhole is aligned with a separate set of one or more of the detector elements, and wherein the imaging system produces a conjugate image of each aperture of the multiple detector array on a corresponding pinhole of the pinhole array.36. The microscopy system of claim 33, further comprising:an interferometer which separates the electromagnetic radiation from the source into a measurement beam which is directed to the optical cavity and a reference beam which is directed along a reference beam path and combined with the signal beam to interfere at the multi-element photo-detector. 37. A method for illuminating an object, the method comprising:resonantly exciting a mode of a stable optical cavity with electromagnetic radiation from a source; and coupling electromagnetic radiation out of the optical cavity towards the object through an array of apertures in one of multiple optics that define the cavity, wherein transverse dimensions of the excited mode are larger than a transverse dimension of each aperture, and wherein each aperture has a transverse dimension smaller than the vacuum wavelength of the electromagnetic radiation provided by the source. 38. The method of claim 37, wherein the transverse dimensions of the excited mode are more than 50 times larger than the transverse dimensions of each aperture.39. The method of claim 37, further comprising:imaging electromagnetic radiation produced by the object in response to the electromagnetic radiation coupled out of the optical cavity towards the object to a multi-element photo-detector. 40. The method of claim 39, further comprising:interfering the imaged electromagnetic radiation with reference electromagnetic radiation at the multi-element photo-detector, wherein the reference electromagnetic radiation and the electromagnetic radiation coupled out of the optical cavity are derived from a common source. 41. A microscopy method comprising:resonantly exciting a mode of a stable optical cavity with electromagnetic radiation from a source; coupling electromagnetic radiation out of the optical cavity towards an object through an array of apertures in one of multiple optics that define the cavity, wherein transverse dimensions of the excited mode are larger than a transverse dimension of each aperture; and imaging electromagnetic radiation produced by the object in response to the electromagnetic radiation coupled out of the optical cavity towards the object to a multi-element photo-detector, wherein the imaged electromagnetic radiation produced by the object passes back through the array of apertures before being imaged to the multi-element photo-detector. 42. The method of claim 41, further comprising:positioning a pinhole array adjacent the multi-element photo-detector, wherein each pinhole is aligned with a separate set of one or more detector elements of the multi-element photo-detector, and wherein the imaged radiation produces a conjugate image of each aperture on a corresponding pinhole of the pinhole array. 43. A microscopy method comprising:resonantly exciting a mode of a stable optical cavity with electromagnetic radiation from a source; coupling electromagnetic radiation out of the optical cavity towards an object through an array of apertures in one of multiple optics that define the cavity, wherein transverse dimensions of the excited mode are larger than a transverse dimension of each aperture; and imaging electromagnetic radiation produced by the object in response to the electromagnetic radiation coupled out of the optical cavity towards the object to a multi-element photo-detector, wherein the electromagnetic radiation produced by the object passes through a second array of apertures before being imaged to the multi-element photo-detector. 44. The method of claim 43, further comprising:positioning a pinhole array adjacent the multi-element photo-detector, wherein each pinhole is aligned with a separate set of one or more detector elements of the multi-element photo-detector, and wherein the imaged radiation produces a conjugate image of each aperture of the second array of apertures on a corresponding pinhole of the pinhole array. 45. A microscopy system for imaging an object, the microscopy system comprising:a multiple source array comprising a reflective mask having an array of spatially separated apertures, at least one optic positioned relative to the mask to form an optical cavity with the mask, and a source providing electromagnetic radiation to the optical cavity to resonantly excite a mode supported by the optical cavity, wherein during operation a portion of the electromagnetic radiation built-up in the cavity leaks through the mask apertures towards the object; a multi-element photo-detector; an imaging system positioned to direct a return beam to the multi-element photo-detector, wherein the return beam comprises electromagnetic radiation leaked to the object and scattered/reflected back through the apertures; and an interferometer which separates the electromagnetic radiation from the source into a measurement beam which is directed to the optical cavity and a reference beam which is directed along a reference beam path and combined with the return beam to interfere at the multi-element photo-detector. 46. A microscopy system for imaging an object, the microscopy system comprising:a multiple source array comprising a reflective mask having an array of spatially separated apertures, at least one optic positioned relative to the mask to form an optical cavity with the mask, and a source providing electromagnetic radiation to the optical cavity to resonantly excite a mode supported by the optical cavity, wherein during operation a portion of the electromagnetic radiation built-up in the cavity leaks through the mask apertures towards the object; a multiple detector array comprising an array of spatially separated apertures; a multi-element photo-detector; an imaging system positioned to direct a signal beam to the multi-element photo-detector, wherein the signal beam comprises electromagnetic radiation leaked to the object and transmitted by the object through the apertures of the multiple detector array; and an interferometer which separates the electromagnetic radiation from the source into a measurement beam which is directed to the optical cavity and a reference beam which is directed along a reference beam path and combined with the signal beam to interfere at the multi-element photo-detector.
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