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Carbon dioxide dry cleaning system

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • D06B-005/26
  • D06F-043/08
출원번호 US-0231559 (2002-08-30)
발명자 / 주소
  • Preston, A. Duane
  • Turner, Jon R.
  • Svoboda, Charles
출원인 / 주소
  • Chart Inc.
대리인 / 주소
    Piper Rudnick LLP
인용정보 피인용 횟수 : 17  인용 특허 : 16

초록

A carbon dioxide dry cleaning system features a pair of liquid carbon dioxide storage tanks in communication with a compressor. A sealed cleaning chamber contains the objects to be cleaned. By selectively pressurizing the storage tanks with the compressor, liquid carbon dioxide is made to flow to th

대표청구항

1. A method for cleaning objects in a cleaning chamber with liquid solvent supplied by a storage tank having a head space above the liquid solvent and a liquid side comprising the steps of:a) connecting the cleaning chamber and the head space of the storage tank; b) connecting the liquid side of the

이 특허에 인용된 특허 (16)

  1. Shore Stephen H. ; Rosio Larry R., Apparatus and method for controlling the use of carbon dioxide in dry cleaning clothes.
  2. Mielnik Richard J. (Erie PA) Metalonis John A. (Erie PA) Reber Richard K. (Erie PA) Rosio Larry R. (Erie PA) Shore Stephen H. (Erie PA) Smith Charles W. (Erie PA), Apparatus for supercritical cleaning.
  3. Mielnik Richard J. (Erie PA) Metalonis John A. (Fairview PA) Reber Richard K. (Erie PA) Rosio Larry R. (Fairview PA) Shore Stephen H. (Erie PA) Smith Charles W. (Fairview PA), Apparatus for supercritical cleaning.
  4. Chao Sidney C. (Manhattan Beach CA) Purer Edna M. (Los Angeles CA), Chemical decomposition by sonication in liquid carbon dioxide.
  5. Purer Edna M. (Los Angeles CA) Wilkerson Angela Y. (Los Angeles CA) Townsend Carl W. (Los Angeles CA) Chao Sidney C. (Manhattan Beach CA), Dry-cleaning of garments using gas-jet agitation.
  6. Chao Sidney C. (Manhattan Beach CA) Stanford Thomas B. (San Pedro CA) Purer Edna M. (Los Angeles CA) Wilkerson Angela Y. (Inglewood CA), Dry-cleaning of garments using liquid carbon dioxide under agitation as cleaning medium.
  7. Maffei Raymond L. (639 Front St. San Francisco CA 94111), Extraction and cleaning processes.
  8. Townsend Carl W. (Los Angeles CA) Purer Edna M. (Los Angeles CA), Liquid carbon dioxide dry cleaning system having a hydraulically powered basket.
  9. Dewees Thomas G. (Pleasanton CA) Knafelc Frank M. (Lafayette CA) Mitchell James D. (Alamo CA) Taylor R. Gregory (Pleasanton CA) Iliff Robert J. (Oakley CA) Carty Daniel T. (Danville CA) Latham James , Liquid/supercritical carbon dioxide dry cleaning system.
  10. Roberts James L. ; Kegler Andrew, Liquified gas dry-cleaning system with pressure vessel temperature compensating compressor.
  11. Stucker John F., Method and system for rejuvenating pressurized fluid solvents used in cleaning substrates.
  12. Schwenkler Robert S., Method for precision drying surfaces.
  13. Smith ; Jr. Charles W. (Fairview PA) Rosio Larry R. (Fairview PA) Shore Stephen H. (Erie PA), Method of cleaning workpiece with solvent and then with liquid carbon dioxide.
  14. Jureller Sharon Harriott (Haworth NJ) Kerschner Judith Lynne (Ridgewood NJ) Bae-Lee Myongsuk (Montville NJ) Del Pizzo Lisa (Bloomfield NJ) Harris Rosemarie (Yonkers NY) Resch Carol (Rutherford NJ) Wa, Method of dry cleaning fabrics using densified carbon dioxide.
  15. Haddon Robert Cort (Dover NJ) Hebard Arthur Foster (Bernardsville NJ) Palstra Thomas Theodorus Marie (New Providence NJ), N-channel field effect transistor including a thin-film fullerene.
  16. Sauer Richard A. ; Hubert Jean-Luc ; Connors Robert W., Pressure-swing absorption based cleaning methods and systems.

이 특허를 인용한 특허 (17)

  1. Yokomizo,Kenji, Apparatus and method of securing a workpiece during high-pressure processing.
  2. Berglund, David N.; Eriksson, Eskil; Smerling, Robert, Clothes treating apparatus and method.
  3. Jones,William Dale, Control of fluid flow in the processing of an object with a fluid.
  4. Worm,Steven L.; DeYoung,James P.; McClain,James B.; Brainard,David E., Divided pressure vessel apparatus for carbon dioxide based systems and methods of using same.
  5. Spalteholz,Bernhard Alexander; Nielsen,Geoffrey Paul, Dry ice blasting cleaning apparatus.
  6. Sheydayi,Alexei; Sutton,Thomas, Gate valve for plus-atmospheric pressure semiconductor process vessels.
  7. Jones, William D., High pressure fourier transform infrared cell.
  8. Biberger,Maximilian A.; Layman,Frederick Paul; Sutton,Thomas Robert, High pressure processing chamber for semiconductor substrate.
  9. Jones,William Dale, High-pressure processing chamber for a semiconductor wafer.
  10. Jones,William Dale, High-pressure processing chamber for a semiconductor wafer.
  11. Goshi,Gentaro, Method and apparatus for cooling motor bearings of a high pressure pump.
  12. Biberger,Maximilian Albert; Layman,Frederick Paul; Sutton,Thomas Robert, Method of supercritical processing of a workpiece.
  13. Holden, James Matthew; Suh, Song-Moon; Sudheeran, Shalina D.; Mori, Glen T., Methods and apparatus for cleaning a substrate.
  14. Wuester,Christopher D., Process flow thermocouple.
  15. Jacobson,Gunilla; Yellowaga,Deborah, Treatment of a dielectric layer using supercritical CO.
  16. Luckman, Joel Adam; Hendrickson, Michael Stephen; Wright, Tremitchell; Warner, Katherine E., Wash cycle for oxidizing agents.
  17. Luckman, Joel Adam; Hendrickson, Michael Stephen; Wright, Tremitchell; Warner, Katherine E., Wash cycle for oxidizing agents.
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