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The present invention relates to a substrate holding apparatus for holding a substrate to be polished and pressing the substrate against a polishing surface. The substrate holding apparatus comprises a top ring body for holding a substrate, an elastic pad for being brought into contact with the subs

The present invention relates to a substrate holding apparatus for holding a substrate to be polished and pressing the substrate against a polishing surface. The substrate holding apparatus comprises a top ring body for holding a substrate, an elastic pad for being brought into contact with the substrate, and a support member for supporting the elastic pad. The substrate holding apparatus further comprises a contact member mounted on a lower surface of the support member and disposed in a space formed by the elastic pad and the support member. The contact member has an elastic membrane for being brought into contact with the elastic pad. A first pressure chamber is defined in the contact member, and a second pressure chamber is defined outside of the contact member. The substrate holding apparatus further comprises a fluid source for independently supplying a fluid into, or creating a vacuum in, the first pressure chamber and the second pressure chamber.

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1. A substrate holding apparatus for holding a substrate to be polished and pressing the substrate against a polishing surface, said substrate holding apparatus comprising:a top ring body for holding a substrate; an elastic pad for being brought into contact with the substrate; a support member for

1. A substrate holding apparatus for holding a substrate to be polished and pressing the substrate against a polishing surface, said substrate holding apparatus comprising:a top ring body for holding a substrate; an elastic pad for being brought into contact with the substrate; a support member for supporting said elastic pad; a contact member mounted on a lower surface of said support member and disposed in a space formed by said elastic pad and said support member, said contact member having an elastic membrane for being brought into contact with said elastic pad; a first pressure chamber defined in said contact member; a second pressure chamber defined outside of said contact member; a fluid source for independently supplying a fluid into, or creating a vacuum in, said first pressure chamber and said second pressure chamber; and a retainer ring, fixed to or integrally formed with said top ring body, for holding a peripheral portion of the substrate, said retainer ring defining a central opening and having a through hole extending through said retainer ring from an outer surface to an inner surface of said retainer ring. 2. A substrate holding apparatus for holding a substrate to be polished and pressing the substrate against a polishing surface, said substrate holding apparatus comprising:a top ring body for holding a substrate; an elastic pad for being brought into contact with the substrate; a support member for supporting said elastic pad; a contact member mounted on a lower surface of said support member and disposed in a space formed by said elastic pad and said support member, said contact member having an elastic membrane for being brought into contact with said elastic pad; a first pressure chamber defined in said contact member; a second pressure chamber defined outside of said contact member; and a fluid source for independently supplying a fluid, controlled in terms of temperature, into said first pressure chamber and said second pressure chamber, respectively. 3. The substrate holding apparatus according to claim 1, wherein said contact member includes a holding member for detachably holding said elastic membrane.4. The substrate holding apparatus according to claim 3, wherein said holding member is detachably mounted on said support member.5. The substrate holding apparatus according to claim 1, wherein said contact member includes a central contact member disposed at a position corresponding to a central portion of the substrate when held by said top ring body, and an outer contact member disposed outside of said central contact member.6. The substrate holding apparatus according to claim 5, wherein said outer contact member is disposed at a position corresponding to an outer peripheral portion of the substrate when held by said top ring body.7. A substrate holding apparatus for holding a substrate to be polished and pressing the substrate against a polishing surface, said substrate holding apparatus comprising:a top ring body for holding a substrate; an elastic pad for being brought into contact with the substrate; a support member for supporting said elastic pad; a contact member mounted on a lower surface of said support member and disposed in a space formed by said elastic pad and said support member, said contact member having an elastic membrane for being brought into contact with said elastic pad; a first pressure chamber defined in said contact member; a second pressure chamber defined outside of said contact member; a fluid source for independently supplying a fluid into, or creating a vacuum in, said first pressure chamber and said second pressure chamber; and a retainer ring, fixed to or integrally formed with said top ring body, for holding a peripheral portion of the substrate, wherein said top ring body includes a cleaning liquid passage defined therein for supplying a cleaning liquid into a gap defined between an outer circumferential surface of said elastic pad and said retainer ring. 8. A substrate holding apparatus for holding a substrate to be polished and pressing the substrate against a polishing surface, said substrate holding apparatus comprising:a top ring body for holding a substrate; an elastic pad for being brought into contact with said substrate; a support member for supporting said elastic pad; a contact member mounted on a lower surface of said support member and disposed in a space formed by said elastic pad and said support member, said contact member having an elastic membrane for being brought into contact with said elastic pad; a first pressure chamber defined in said contact member; a second pressure chamber defined outside of said contact member; a fluid source for independently supplying a fluid into, or creating a vacuum in, said first pressure chamber and said second pressure chamber; and a retainer ring, fixed to or integrally formed with said top ring body, for holding a peripheral portion of the substrate, wherein said retainer ring is fixed to or integrally formed with said top ring body without interposing an elastic member between said retainer ring and said top ring body. 9. A substrate holding apparatus for holding a substrate to be polished and pressing the substrate against a polishing surface, said substrate holding apparatus comprising:a top ring body for holding a substrate; an elastic pad for being brought into contact with the substrate; a support member for supporting said elastic pad; a contact member mounted on a lower surface of said support member and disposed in a space formed by said elastic pad and said support member, said contact member having an elastic membrane for being brought into contact with said elastic pad; a first pressure chamber defined in said contact member; a second pressure chamber defined outside of said contact member; and a fluid source for independently supplying a fluid into, or creating a vacuum in, said first pressure chamber and said second pressure chamber, wherein said elastic membrane has differing thicknesses. 10. A substrate holding apparatus for holding a substrate to be polished and pressing the substrate against a polishing surface, said substrate holding apparatus comprising:a top ring body for holding a substrate; an elastic pad for being brought into contact with the substrate; a support member for supporting said elastic pad; a contact member mounted on a lower surface of said support member and disposed in a space formed by said elastic pad and said support member, said contact member having an elastic membrane for being brought into contact with said elastic pad; a first pressure chamber defined in said contact member; a second pressure chamber defined outside of said contact member; and a fluid source for independently supplying a fluid into, or creating a vacuum in, said first pressure chamber and said second pressure chamber, wherein said elastic membrane partially includes an inelastic member. 11. The substrate holding apparatus according to claim 1, wherein said support member is made of an insulating material.12. A substrate holding apparatus for holding a substrate to be polished and pressing the substrate against a polishing surface, said substrate holding apparatus comprising:a top ring body for holding a substrate; a support member having a contact member mounted on a lower surface thereof, said contact member being disposed in a space formed by the substrate, when held by said top ring body, and said support member, and said contact member having an elastic membrane for being brought into contact with the substrate; a first pressure chamber defined in said contact member; a second pressure chamber defined outside of said contact member; a fluid source for independently supplying a fluid into, or creating a vacuum in, said first pressure chamber and said second pressure chamber; and a retainer ring, fixed to or integrally formed with said top ring body, for holding a peripheral portion of the substrate, said retainer ring defining a central opening and having a through hole extending through said retainer ring from an outer surface to an inner surface of said retainer ring. 13. A substrate holding apparatus for holding a substrate to be polished and pressing the substrate against a polishing surface, said substrate holding apparatus comprising:a top ring body for holding a substrate; a support member having a contact member mounted on a lower surface thereof, said contact member being disposed in a space formed by the substrate, when held by said top ring body, and said support member, and said contact member having an elastic membrane for being brought into contact with the substrate; a first pressure chamber defined in said contact member; a second pressure chamber defined outside of said contact member; and a fluid source for independently supplying a fluid, controlled in terms of temperature, into said first pressure chamber and said second pressure chamber, respectively. 14. The substrate holding apparatus according to claim 12, further comprising:a communicating portion, for allowing the fluid supplied into said first pressure chamber to contact a contact surface of the substrate, in a lower surface of said elastic membrane. 15. The substrate holding apparatus according to claim 12, wherein said contact member includes a holding member for detachably holding said elastic membrane.16. The substrate holding apparatus according to claim 15, wherein said holding member is detachably mounted on said support member.17. The substrate holding apparatus according to claim 12, further comprising:a protrusion, radially extending from a circumferential edge of said elastic membrane, on a lower surface of said elastic membrane. 18. The substrate holding apparatus according to claim 12, wherein said contact member includes a central contact member disposed at a position corresponding to a central portion of the substrate when held by said top ring body, and an outer contact member disposed outside of said central contact member.19. The substrate holding apparatus according to claim 18, wherein said outer contact member is disposed at a position corresponding to an outer peripheral portion of the substrate when held by said top ring body.20. A substrate holding apparatus for holding a substrate to be polished and pressing the substrate against a polishing surface, said substrate holding apparatus comprising:a top ring body for holding a substrate; a support member having a contact member mounted on a lower surface thereof, said contact member being disposed in a space formed by the substrate, when held by said top ring body, and said support member, and said contact member having an elastic membrane for being brought into contact with the substrate; a first pressure chamber defined in said contact member; a second pressure chamber defined outside of said contact member; a fluid source for independently supplying a fluid into, or creating a vacuum in, said first pressure chamber and said second pressure chamber; and a retainer ring, fixed to or integrally formed with said top ring body, for holding a peripheral portion of the substrate, wherein said top ring body includes a cleaning liquid passage defined therein for supplying a cleaning liquid into a gap defined between an outer circumferential surface of the substrate, when held by said top ring body, and said retainer ring. 21. A substrate holding apparatus for holding a substrate to be polished and pressing the substrate against a polishing surface, said substrate holding apparatus comprising:a top ring body for holding a substrate; a support member having a contact member mounted on a lower surface thereof, said contact member being disposed in a space formed by the substrate, when held by said top ring body, and said support member, and said contact member having an elastic membrane for being brought into contact with the substrate; a first pressure chamber defined in said contact member; a second pressure chamber defined outside of said contact member; a fluid source for independently supplying a fluid into, or creating a vacuum in, said first pressure chamber and said second pressure chamber; and a retainer ring, fixed to or integrally formed with said top ring body, for holding a peripheral portion of the substrate, wherein said retainer ring is fixed to or integrally formed with said top ring body without interposing an elastic member between said retainer ring and said top ring body. 22. A substrate holding apparatus for holding a substrate to be polished and pressing the substrate against a polishing surface, said substrate holding apparatus comprising:a top ring body for holding a substrate; a support member having a contact member mounted on a lower surface thereof, said contact member being disposed in a space formed by the substrate, when held by said top ring body, and said support member, and said contact member having an elastic membrane for being brought into contact with the substrate; a first pressure chamber defined in said contact member; a second pressure chamber defined outside of said contact member; and a fluid source for independently supplying a fluid into, or creating a vacuum in, said first pressure chamber and said second pressure chamber, wherein said elastic membrane differing thicknesses. 23. A substrate holding apparatus for holding a substrate to be polished and pressing the substrate against a polishing surface, said substrate holding apparatus comprising:a top ring body for holding a substrate; a support member having a contact member mounted on a lower surface thereof, said contact member being disposed in a space formed by the substrate, when held by said top ring body, and said support member, and said contact member having an elastic membrane for being brought into contact with the substrate; a first pressure chamber defined in said contact member; a second pressure chamber defined outside of said contact member; and a fluid source for independently supplying a fluid into, or creating a vacuum in, said first pressure chamber and said second pressure chamber, wherein said elastic membrane partially includes an inelastic member. 24. The substrate holding apparatus according to claim 12, wherein said support member is made of an insulating material.25. A substrate holding apparatus for holding a substrate to be polished and pressing the substrate against a polishing surface, said substrate holding apparatus comprising:a top ring body for holding a substrate; an elastic pad for being brought into contact with the substrate; a support member for supporting said elastic pad; contact members mounted on a lower surface of said support member, said contact members each having an elastic membrane for being brought into contact with said elastic pad and being independently pressed against said elastic pad; and a retainer ring, fixed to or integrally formed with said top ring body, for holding a peripheral portion of said substrate, said retainer ring defining a central opening and having a through hole extending through said retainer ring from an outer surface to an inner surface of said retainer ring. 26. The substrate holding apparatus according to claim 25, wherein said contact members are spaced from one another at a predetermined interval.27. A substrate holding apparatus for holding a substrate to be polished and pressing the substrate against a polishing surface, said substrate holding apparatus comprising:a top ring body for holding a substrate; an elastic pad for being brought into contact with the substrate; a support member for supporting said elastic pad; contact members mounted on a lower surface of said support member, said contact members each having an elastic membrane for being brought into contact with said elastic pad and independently pressed against said elastic pad; a first pressure chamber; a second pressure chamber; and a fluid source for independently supplying a fluid, controlled in terms of temperature, into said first pressure chamber and said second pressure chamber, respectively. 28. A substrate holding apparatus for holding a substrate to be polished and pressing the substrate against a polishing surface, said substrate holding apparatus comprising:a top ring body for holding a substrate; a support member; contact members mounted on a lower surface of said support member, said contact members each having an elastic membrane for being brought into contact with the substrate and independently pressed against the substrate; a first pressure chamber; a second pressure chamber; and a fluid source for independently supplying a fluid into, or creating a vacuum in, said first pressure chamber and said second pressure chamber; and a communicating portion, for allowing the fluid supplied into said first pressure chamber to contact a contact surface of the substrate, in a lower surface of said elastic membrane of at least one of said contact members. 29. The substrate holding apparatus according to claim 25, wherein at least one of said contact members includes a holding member for detachably holding said elastic membrane of said at least one of said contact members.30. The substrate holding apparatus according to claim 29, wherein said holding member is detachably mounted on said support member.31. A substrate holding apparatus for holding a substrate to be polished and pressing the substrate against a polishing surface, said substrate holding apparatus comprising:a top ring body for holding a substrate; an elastic pad for being brought into contact with the substrate; a support member for supporting said elastic pad; contact members mounted on a lower surface of said support member, said contact members each having an elastic membrane for being brought into contact with said elastic pad and independently pressed against said elastic pad; and a protrusion, radially extending from a circumferential edge of said elastic membrane of at least one of said contact members, on a lower surface of said elastic membrane. 32. The substrate holding apparatus according to claim 25, wherein said contact members include a central contact member disposed at a position corresponding to a central portion of the substrate when held by said top ring body, and an outer contact member disposed outside of said central contact member.33. The substrate holding apparatus according to claim 32, wherein said outer contact member is mounted at a position corresponding to an outer peripheral portion of the substrate when held by said top ring body.34. A substrate holding apparatus for holding a substrate to be polished and pressing the substrate against a polishing surface, said substrate holding apparatus comprising:a top ring body for holding a substrate; an elastic pad for being brought into contact with the substrate; a support member for supporting said elastic pad; contact members mounted on a lower surface of said support member, said contact members each having an elastic membrane for being brought into contact with said elastic pad and independently pressed against said elastic pad; and a retainer ring, fixed to or integrally formed with said top ring body, for holding a peripheral portion of the substrate, wherein one of said contact members is a central contact member disposed at a position corresponding to a central portion of the substrate when held by said top ring body, wherein another of said contact members is an outer contact member disposed at a position corresponding to an outer peripheral portion of the substrate when held by said top ring body, and disposed outside of said central contact member, and wherein said top ring body includes a cleaning liquid passage defined therein for supplying a cleaning liquid into a gap defined between an outer circumferential surface of said elastic pad and said retainer ring. 35. A substrate holding apparatus for holding a substrate to be polished and pressing the substrate against a polishing surface, said substrate holding apparatus comprising:a top ring body for holding a substrate; an elastic pad for being brought into contact with the substrate; a support member for supporting said elastic pad; contact members mounted on a lower surface of said support member, said contact members each having an elastic membrane for being brought into contact with said elastic pad and independently pressed against said elastic pad; and a retainer ring, fixed to or integrally formed with, said top ring body for holding a peripheral portion of the substrate, wherein one of said contact members is a central contact member disposed at a position corresponding to a central portion of the substrate when held by said top ring body, wherein another of said contact members is an outer contact member disposed at a position corresponding to an outer peripheral portion of the substrate when held by said top ring body, and disposed outside of said central contact member, and wherein said retainer ring is fixed to or integrally formed with said top ring body without interposing an elastic member between said retainer ring and said top ring body. 36. A substrate holding apparatus for holding a substrate to be polished and pressing the substrate against a polishing surface, said substrate holding apparatus comprising:a top ring body for holding a substrate; an elastic pad for being brought into contact with the substrate; a support member for supporting said elastic pad; and contact members mounted on a lower surface of said support member, said contact members each having an elastic membrane for being brought into contact with said elastic pad and independently pressed against said elastic pad, wherein said elastic membrane of at least one of said contact members has differing thicknesses. 37. A substrate holding apparatus for holding a substrate to be polished and pressing the substrate against a polishing surface, said substrate holding apparatus comprising:a top ring body for holding a substrate; an elastic pad for being brought into contact with the substrate; a support member for supporting said elastic pad; and contact members mounted on a lower surface of said support member, said contact members each having an elastic membrane for being brought into contact with said elastic pad and independently pressed against said elastic pad, wherein said elastic membrane of at least one of said contact members partially includes an inelastic member. 38. The substrate holding apparatus according to claim 25, wherein said support member is made of an insulating material.39. A polishing apparatus for polishing a substrate, comprising:a polishing table having a polishing surface; and a substrate holding apparatus for holding a substrate to be polished and pressing the substrate against said polishing surface, said substrate holding apparatus including: (i) a top ring body for holding the substrate; (ii) an elastic pad for being brought into contact with the substrate; (iii) a support member for supporting said elastic pad; (iv) a contact member mounted on a lower surface of said support member and disposed in a space formed by said elastic pad and said support member, said contact member having an elastic membrane for being brought into contact with said elastic pad; (v) a first pressure chamber defined in said contact member; (vi) a second pressure chamber defined outside of said contact member; (vii) a fluid source for independently supplying a fluid into, or creating a vacuum in, said first pressure chamber and said second pressure chamber; and (viii) a retainer ring, fixed to or integrally formed with said top ring body, for holding a peripheral portion of the substrate, said retainer ring defining a central opening and having a through hole extending through said retainer ring from an outer surface to an inner surface of said retainer ring. 40. A polishing apparatus for polishing a substrate, comprising:a polishing table having a polishing surface; and a substrate holding apparatus for holding a substrate to be polished and pressing the substrate against said polishing surface, said substrate holding apparatus including: (i) a top ring body for holding the substrate; (ii) a support member having a contact member mounted on a lower surface thereof, said contact member being disposed in a space formed by the substrate, when held by said top ring body, and said support member, and said contact member having an elastic membrane for being brought into contact with the substrate; (iii) a first pressure chamber defined in said contact member; (iv) a second pressure chamber defined outside of said contact member; (v) a fluid source for independently supplying a fluid into, or creating a vacuum in, said first pressure chamber and said second pressure chamber; and (vi) a retainer ring, fixed to or integrally formed with said top ring body, for holding a peripheral portion of the substrate, said retainer ring defining a central opening and having a through hole extending through said retainer ring from an outer surface to an inner surface of said retainer ring.