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A detection system for detecting contaminant gases includes a converter, a detector, a primary channel for delivering a target gas sample through the converter to the detector, and at least two scrubbing channels for delivering a reference gas sample through the converter to the detector. Each of th

A detection system for detecting contaminant gases includes a converter, a detector, a primary channel for delivering a target gas sample through the converter to the detector, and at least two scrubbing channels for delivering a reference gas sample through the converter to the detector. Each of the scrubbing channels includes a scrubber for removing basic nitrogen compounds from the reference gas sample, while the primary channel preferably transmits the target gas sample without scrubbing. The converter converts gaseous nitrogen compounds in the target gas sample to an indicator gas, such as nitric oxide (NO), and a control system directs the flow of a gas sample among the primary channel and the scrubbing channels. In accordance with one aspect of the invention, the basic-nitrogen-compound concentration can be measured by comparing the concentration of the indicator gas detected in the reference sample with the detected indicator-gas concentration in the target sample. The use of multiple scrubbing channels enables the detection to operate continuously since each scrubber can be alternately purged while another is scrubbing.

대표청구항 ▼

1. A continuous-operation scrubber system to remove contaminants in a gas in a semiconductor processing tool comprising:a semiconductor processing tool; a pair of channels connected in parallel to a supply line of the semiconductor processing tool; a pair of scrubbers, each scrubber being coupled wi

1. A continuous-operation scrubber system to remove contaminants in a gas in a semiconductor processing tool comprising:a semiconductor processing tool; a pair of channels connected in parallel to a supply line of the semiconductor processing tool; a pair of scrubbers, each scrubber being coupled with a respective one of the pair of channels, such that each of the scrubbers removes a gas contaminant from the respective channel to deliver a scrubbed gas through the supply line to the semiconductor processing tool; and a purge system coupled with each scrubber for purging the removed gas contaminant from each scrubber. 2. The continuous-operation scrubber system of claim 1 further comprising a control system for directing a flow of gas through the channels.3. The system of claim 1 wherein the purge system is coupled to at least one of the scrubbers for purging reversibly-bound basic nitrogen compounds from the scrubber.4. The system of claim 1 wherein at least one of the scrubbers includes a cation exchange medium.5. The system of claim 1 further comprising a converter and a flow controller that selectively controls which of the scrubbing channels the gas can flow through to the converter.6. The system of claim 5 further comprising a detector wherein the flow controller is governed by a control system that is programmed to transfer the flow of a reference gas reaching the detector from a scrubbing channel with a contaminated scrubber to a scrubbing channel with a purged scrubber and to then direct a purge gas through the contaminated scrubber.7. The system of claim 6 wherein the control system is progranuned to transfer the flow of the reference gas away from one of the scrubbing channels and to purge the scrubber of that scrubbing channel before a weak-base nitrogen compound can penetrate through the scrubber.8. The system of claim 7 further comprising a primary channel wherein the control system is progranimed to alternately transfer the flow of a gas between the primary channel and one of the scrubbing channels.9. The system of claim 1 further comprising a detector and a pressure reducer located between the detector and the scrubbers.10. A method for continuously scrubbing a gas in a semiconductor processing tool comprising the steps of:delivering a gas to a scrubber system for a semiconductor processing tool including a first scrubber and a second scrubber connected in parallel; directing the gas through the first scrubber; purging the first scrubber while directing the gas through the second scrubber; and purging the second scrubber while directing the gas through the first scrubber, the scrubbed gas from the first scrubber and the second scrubber being delivered to a semiconductor processing tool. 11. The method of claim 10 wherein flow of the gas alternates between passing through the first scrubber and passing through the second scrubber.12. The method of claim 10 further comprising the steps of:passing a first reference gas through the first scrubber to remove basic nitrogen compounds from a first reference gas; and passing a second reference gas through a second scrubber to remove basic nitrogen compounds from the second reference gas. 13. The method of claim 10 further comprising purging the first scrubber to remove reversibly-bound basic nitrogen compounds while passing a second reference gas through the second scrubber.14. The method of claim 10 further comprising passing a first reference gas and a second reference gas through a converter which converts gaseous nitrogen compounds in first and second reference gases into an indicator gas after the first reference gas passes through the first scrubber and the second reference gas passes through the second scrubber.15. The method of claim 14 further comprising directing the first and second reference gases to a detector which detects a concentration of the indicator gas in the first or second reference gas after the said reference gas is passed through the converter.16. The method of claim 15 further comprising passing a target gas through the converter which converts gaseous nitrogen compounds in the target gas into the indicator gas; andpassing the target gas through the detector which detects the concentration of the indicator gas in the target gas after the target gas passes through the converter. 17. The method of claim 16 further comprising determining a total basic-nitrogen-compound contamination concentration by comparing a detected concentration of the indicator gas in the target gas with a detected concentration of the indicator gas in the reference gas.18. The method of claim 10 further comprising alternately detecting a concentration of an indicator gas in a reference gas flowing through the first scrubber and a concentration of the indicator gas in a reference gas flowing through the second scrubber.19. The method of claim 10 further comprising the step of alternately purging the first and second scrubbers while maintaining flow of the gas to a converter and to a detector.20. The method of claim 10 further comprising providing a detector and a processor connected to the detector.