Electrooptical device, method of manufacturing the same, and electronic equipment
원문보기
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
G02F-001/136
G02F-001/1335
출원번호
US-0198751
(1998-11-24)
우선권정보
JP-0344403 (1997-11-28)
발명자
/ 주소
Higuchi, Masayuki
Murakami, Satoshi
Nakazawa, Misako
출원인 / 주소
Semiconductor Energy Laboratory Co., Ltd.
대리인 / 주소
Cook, Alex, McFarron, Manzo, Cummings &
인용정보
피인용 횟수 :
53인용 특허 :
94
초록▼
An AMLCD having high fineness and high contrast is realized. First, an interlayer film is provided on an element electrode, and an opening portion is formed in the interlayer film. Next, after a first metal layer is formed, an embedded insulating layer is formed. The embedded insulating layer is ret
An AMLCD having high fineness and high contrast is realized. First, an interlayer film is provided on an element electrode, and an opening portion is formed in the interlayer film. Next, after a first metal layer is formed, an embedded insulating layer is formed. The embedded insulating layer is retreated by a means, such as an etch back method, to realize a state in which only the opening portion is filled with the embedded insulating layer. By this, electric connection between the element electrode and a second metal layer becomes possible while keeping the flatness.
대표청구항▼
1. A display device comprising a pixel matrix circuit comprising a plurality of pixels each including at least one TFT and a pixel electrode connected to the TFT,wherein the pixel electrode includes a lamination structure of a first metal layer and a second metal layer; wherein the first metal layer
1. A display device comprising a pixel matrix circuit comprising a plurality of pixels each including at least one TFT and a pixel electrode connected to the TFT,wherein the pixel electrode includes a lamination structure of a first metal layer and a second metal layer; wherein the first metal layer is in contact with the second metal layer, an insulating layer is put between the first metal layer and the second metal layer at a contact portion where the first metal layer is connected with the TFT, and wherein the insulating layer comprises a light absorbing layer comprising a resin in which a pigment or a carbon-based material is contained. 2. A display device according to claim 1, wherein at least one of the first and the second metal layer has a single layer structure or a lamination structure.3. A display device according to claim 1, wherein the first metal layer is made of a material selected from the group consisting of Ti, Cr, Ta, W, Mo, Nb and Si, and the second metal layer is made of a material selected from the group consisting of Al, Cu, Ag, and metal films mainly containing those elements.4. A display device according to claim 1, wherein the insulating layer is an organic resin film of at least one material selected from the group consisting of polyimide, polyamide, polyimide amide, and acryl.5. An electronic equipment comprising a display device according to claim 1, as a display.6. A display device according to claim 1 wherein said device is a portable telephone.7. A display device according to claim 1 wherein said device is a video camera.8. A display device according to claim 1 wherein said device is a mobile computer.9. A display device according to claim 1 wherein said device is a rear projector.10. A display device according to claim 1 wherein said device is a front projector.11. A display device comprising a pixel matrix circuit comprising:a TFT; a first insulating layer over the TFT, wherein the first insulating layer comprises a contact hole; a first conductive film over the first insulating film and in the contact hole, wherein the first conductive film is electrically connected to the TFT through the contact hole; a second insulating layer filled in the contact hole, wherein an upper surface of the first conductive film outside the contact hole is not covered by the second insulating layer; a second conductive film on and in contact with the upper surface of the first conductive film and the second insulating layer, wherein the second insulating layer comprises a light absorbing layer comprising a resin in which a pigment or a carbon-based material is contained. 12. A display device according to claim 11, wherein at least one of the first and the second metal layer has a single layer structure or a lamination structure.13. A display device according to claim 11, wherein the first metal layer is made of a material selected from the group consisting of Ti, Cr, Ta, W, Mo, Nb, and Si, and the second metal layer is made of a material selected from the group consisting of Al, Cu, Ag, and metal films mainly containing those elements.14. A display device according to claim 11, wherein the insulating layer is an organic resin film of at least one material selected from the group consisting of polyamide, polyamide, polyimide amide, and acryl.15. An electronic equipment comprising a display device according to claim 11, as a display.16. A display device according to claim 11 wherein said device is a portable telephone.17. A display device according to claim 11 wherein said device is a video camera.18. A display device according to claim 11 wherein said device is a mobile computer.19. A display device according to claim 11 wherein said device is a rear projector.20. A display device according to claim 11 wherein said device is a front projector.21. A display device according to claim 11, wherein the first conductive film is electrically connected to the TFT through one of a source electrode and a drain electrode thereof.
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