초록 ▼

A high flow rate bubbler system and method are provided for producing a stable, easily controllable source of chemical vapors to a downstream process. The bubbler system is equipped with a vaporizer unit connected to its gas outlet tube. This vaporizer unit slows the gas velocity to enhance settling

A high flow rate bubbler system and method are provided for producing a stable, easily controllable source of chemical vapors to a downstream process. The bubbler system is equipped with a vaporizer unit connected to its gas outlet tube. This vaporizer unit slows the gas velocity to enhance settling of entrained droplets and contacts the exiting gas with a high thermal mass, heated surfaces to promote heat transfer and evaporation of the entrained droplets.

대표청구항 ▼

1. A high flow rate bubbler system comprising:a bubbler chamber containing a liquid chemical; a gas inlet for delivering a carrier gas to the liquid chemical inside said bubbler chamber a gas outlet for conveying the carrier gas and chemical vapors out of said bubbler chamber; and a vaporizer unit t

1. A high flow rate bubbler system comprising:a bubbler chamber containing a liquid chemical; a gas inlet for delivering a carrier gas to the liquid chemical inside said bubbler chamber a gas outlet for conveying the carrier gas and chemical vapors out of said bubbler chamber; and a vaporizer unit through which carrier gas and chemical vapors exiting said bubbler chamber pass, said vaporizer unit comprising one or more heated surfaces of substantial thermal mass oriented such that gases passing through said vaporizer unit contact said heated surfaces for a sufficient time to remove entrained liquid droplets, and said vaporizer unit having a substantial cross sectional area perpendicular to the direction of gas flow such that the gas velocity is substantially slowed; wherein the vaporizer unit comprises a flow chamber and a gas outlet tube having a first end and a second end, said first end is connected to and penetrates through said gas outlet into said bubbler chamber, said second end penetrates a bottom end wall of the flow chamber to provide a flow path for said carrier gas and chemical vapors to pass from said bubbler chamber into said flow chamber, and said first end is protected by a baffling device; wherein said baffling device comprises at least a first cup having an open end and a closed end, said first cup being aligned axially and concentrically with said gas outlet tube and positioned with the open end facing upward such that the first end of said gas outlet tube passes through the open end of said first cup but does not touch the closed end of said first cup; and at least a second cup having an open end and a closed end, said second cup being aligned axially and concentrically with said gas outlet tube and positioned with the open end facing downward such that the open end of said first cup passes through the open end of said second cup but does not touch the closed end of said second cup. 2. The high flow rate bubbler system of claim 1 where said bubbler chamber further comprises:a top wall piece, a bottom wall piece, and one or more side wall pieces sufficient to enclose an interior volume. 3. The high flow rate bubbler system of claim 2 wherein:said interior volume contains a volume of the liquid chemical and a volume of gas separated by a liquid-gas interface, and said volume of the liquid chemical is sufficiently smaller than said interior volume of said bubbler chamber to provide a substantial headspace between the liquid-gas interface and said top wall piece. 4. The high flow rate bubbler of claim 3 further comprising:a liquid chemical inlet tube penetrating said top wall piece, said liquid chemical inlet tube extending into said interior volume sufficiently to terminate below the liquid-gas interface; said liquid chemical inlet tube providing the liquid chemical from a liquid chemical source to said interior volume. 5. The high flow rate bubbler system of claim 3 wherein said gas inlet further comprises:a gas inlet tube penetrating said top wall piece, said gas inlet tube providing carrier gas from a gas source to said interior volume, said gas inlet tube being attached to a gas dispersal device disposed proximate said bottom wall piece of said bubbler chamber within said interior volume. 6. The high flow rate bubbler system of claim 5 wherein said gas dispersal device comprises a plate formed of a porous material, said porous plate providing a plurality of flow paths for carrier gas and dispensing carrier gas into the liquid chemical in the form of a plurality of bubbles.7. The high flow rate bubbler system of claim 3 wherein said gas outlet further comprises:a vapor outlet tube having a first end and a second end, said vapor outlet tube penetrating said top wall piece such that said first end is positioned within said bubbler chamber terminating above the liquid-gas interface in the headspace and said second end protrudes outside of said bubbler chamber, said vapor outlet tube providing a flow path to exhaust carrier gas and chemical vapors out of said interior volume. 8. The high flow rate bubbler system of claim 1 wherein said flow chamber further comprises:a plurality of baffle plates disposed perpendicularly to the direction in which carrier gas flows through said vaporizer unit, said baffle plates having one or more offset penetrating holes that allow gas to flow through said flow chamber; and an evaporator outlet flow tube, said evaporator outlet flow tube penetrating a top end wall of the flow chamber to provide an outlet flow path for carrier gas exiting said flow chamber. 9. The bubbler system of claim 8 wherein said flow chamber and said baffle plates are formed of a heat conducting material and are thermally coupled to a temperature-controlled heat source, said temperature-controlled heat source maintaining said top end wall, said bottom end wall, said at least one side wall and said baffle plates at an elevated temperature.10. The bubbler system of claim 9 wherein said elevated temperature is less than 250° C.11. The bubbler system of claim 9 wherein said elevated temperature is between 85° C. and 200° C.12. The bubbler system of claim 9 wherein said temperature-controlled heat source is controlled in response to one or more thermocouples thermally attached to said flow chamber.13. The bubbler system of claim 12 wherein a first of said or more thermocouples is thermally attached to said flow chamber proximate said top wall and a second of said one or more thermocouples is thermally attached to said flow chamber proximate said bottom wall.14. The bubbler system of claim 13 wherein said temperature-controlled heat source provides heat to said flow chamber such that the temperatures measured by said first thermocouple and said second thermocouple do not differ by more than approximately 50° C.15. The bubbler system of claim 8 wherein said flow chamber further comprises an open volumetric head space downstream of said baffle plates.16. The bubbler system of claim 4 further comprising:a device for determining the amount of liquid remaining in the bubbler chamber and generating an output signal responsive to said amount; and a liquid chemical controller operatively coupled to said bubbler and said liquid chemical inlet tube for filling and continuously maintaining a level of the liquid chemical said chamber responsive to said output signal. 17. The bubbler system of claim 1 wherein said enclosed bubbler chamber is formed to enclose an interior volume with the shape of a cylindrical prism.18. A chemical vapor deposition system wherein precursor chemical vapors are provided by the bubbler system of claim 1.19. A chemical vapor deposition system wherein precursor chemical vapors are provided by the bubbler system of claim 8.