Control feedback system and method for bulk material industrial processes using automated object or particle analysis
원문보기
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
G06F-019/00
G01D-021/00
출원번호
US-0194587
(2002-07-12)
발명자
/ 주소
Lieber, Kenneth John
Browne, Ian B.
Tuttle, John
출원인 / 주소
Advanced Vision Particle Measurement, Inc.
대리인 / 주소
Blakely Sokoloff Taylor &
인용정보
피인용 횟수 :
1인용 특허 :
23
초록▼
A control feedback system and method for industrial processes using automated particle or object analysis is disclosed. The control feedback system and method includes a particle characteristic measuring unit to obtain first measured characteristics of a first sample and second measured characterist
A control feedback system and method for industrial processes using automated particle or object analysis is disclosed. The control feedback system and method includes a particle characteristic measuring unit to obtain first measured characteristics of a first sample and second measured characteristics of a second sample, the first sample having a substantially different characteristic than the second sample; an optimal characteristic definition for comparison with the first and second measured characteristics; a corrective action database to define and select actions to be taken in response to a comparison of the first and second measured characteristics with the optimal characteristic definition; and a control line network to transfer control signal to a plurality of processing units in response to a selected action to be taken. Other methods and apparatuses are also described.
대표청구항▼
1. A process control system, comprising:a particle characteristic measuring unit to obtain first measured characteristics of a first sample and second measured characteristics of a second sample, the first sample having a substantially different characteristic than the second sample; an optimal char
1. A process control system, comprising:a particle characteristic measuring unit to obtain first measured characteristics of a first sample and second measured characteristics of a second sample, the first sample having a substantially different characteristic than the second sample; an optimal characteristic definition for comparison with the first and second measured characteristics; a corrective action database to define and select actions to be taken in response to a comparison of the first and second measured characteristics with the optimal characteristic definition; and a control line network to transfer control signal to a plurality of processing units in response to a selected action to be taken. 2. The process control system of claim 1, wherein the particle characteristic measuring unit further comprises a sampling device for diverting a preselected amount of particle material from a conveyor.3. The process control system of claim 1, wherein the particle characteristic measuring unit further comprises a sample separator for separating the second sample from the first sample.4. The process control system of claim 1, wherein the particle characteristic measuring unit further comprises a feeder to separate particles of the first and second samples into an approximate monolayer.5. The process control system of claim 1, wherein the first sample is a coarse sample having a size ranging from 2.36 to 75 millimeters, and wherein the second sample is a fine sample having a size ranging from 75 microns to less than 2.36 millimeters.6. The process control system of claim 1, wherein the first measured characteristics and the second measured characteristics are obtained simultaneously, and wherein the actions to be taken are selected based on the first measured characteristics and the second measured characteristics simultaneously.7. The process control system of claim 1, wherein the first and the second measured characteristics are obtained sequentially, and wherein the actions to be taken are selected based on the first and the second measured characteristics.8. The process control system of claim 1, wherein the particle characteristic measuring unit further comprises:a first sample measuring unit to measure characteristics of the first sample; a second sample measuring unit to measure characteristics of the second sample; and a sample separator for separating the second sample from the first sample, the second sample being fed from the sample separator to the second sample measuring unit. 9. The process control system of claim 1, wherein the particle characteristic measuring unit measures at least one characteristic selected from the group consisting of size, shape, volume, weight, density, temperature, moisture content, texture, reflectivity, color, opacity, and chemical composition, of the first and second samples.10. The process control system of claim 1, wherein the optimal characteristic definition includes at least one definition of desired characteristics selected from the group consisting of size, shape, volume, weight, density, temperature, moisture content, texture, reflectivity, color, opacity, and chemical composition.11. The process control system of claim 1, wherein the corrective action database includes control information for generating control signals to control or configure one or more processing units of the plurality of processing units based on a comparison of the measured characteristics with the optimal characteristic definition.12. The process control system of claim 1, wherein the corrective action database includes control information for generating control signals to control or configure a crusher based on a comparison of the measured characteristics with the optimal characteristic definition.13. The process control system of claim 1, wherein the corrective action database includes control information for generating control signals to control or configure a raw material source based on a comparison of the measured characteristics with the optimal characteristic definition.14. The process control system of claim 1, wherein the corrective action database includes control information for generating control signals to control or configure an accumulator based on a comparison of the measured characteristics with the optimal characteristic definition.15. The process control system of claim 1, wherein the corrective action database includes control information for generating control signals to control or configure a finish processing unit based on a comparison of the measured characteristics with the optimal characteristic definition.16. The process control system of claim 1, wherein the particle characteristic measuring unit includes a rotary sample divider (RSD).17. A process, comprising:obtaining first characteristics of a first sample and second characteristics of a second sample, the first sample having substantially different size than the second sample; comparing the first and second characteristics with a first and second optimal characteristic definitions respectively; selecting actions to be taken from a database, in response to the comparison of the first and second characteristics with the first and second optimal characteristic definitions; and transmitting a control signal to a plurality of processing units through a network, in response to a selected action to be taken. 18. The process of claim 17, further comprising separating the second sample from the first sample.19. The process of claim 17, wherein the first characteristics and the second characteristics are obtained simultaneously, and wherein the actions to be taken are selected based on the first characteristics and the second characteristics simultaneously.20. The process control system of claim 17, wherein the first and the second measured characteristics are obtained sequentially, and wherein the actions to be taken are selected based on the first and the second measured characteristics.21. The process of claim 17, wherein the first and second characteristics include at least one characteristic selected from the group consisting of size, shape, volume, weight, density, temperature, moisture content, texture, reflectivity, color, opacity, and chemical composition, of the first and second samples.22. The process of claim 17, wherein the optimal characteristic definition includes at least one definition of desired characteristics selected from the group consisting of size, shape, volume, weight, density, temperature, moisture content, texture, reflectivity, color, opacity, and chemical composition.23. A process control system, comprising:a particle characteristic measuring unit to obtain measured characteristics of at least two samples, each of the at least two samples having a different characteristic defined by predetermined categories; an optimal characteristic definition for comparison with the measured characteristics of the at least two samples; a corrective action database to define and select actions to be taken in response to a comparison of the measured characteristics with the optimal characteristic definition simultaneously; and a control line network to transfer control signal to a plurality of processing units in response to a selected action to be taken. 24. The process control system of claim 23, wherein the measured characteristics of at least two samples are obtained simultaneously.
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이 특허에 인용된 특허 (23)
Grannes Steven G. (St. Paul MN), Apparatus and method for computer vision measurements.
Lieber, Kenneth John; Browne, Ian B., Control feedback system and method for bulk material industrial processes using automated object or particle analysis.
Cavallaro William A. ; Fugere Jeffrey P. ; O'Neil Todd Edwin ; Kaplan John ; Franklin Stephen M., Method and apparatus for measuring the size of drops of a viscous material dispensed from a dispensing system.
Merz Georg (Gedern-Wenings DEX) Gehrmann Heinz (Biebergemuend-Bieber DEX), Method for the analytic determination of physical characteristics of a material.
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